Semiconductor device and method of manufacturing the same
View Patent ↗A method includes burying a conductive pattern in an insulating film made of SiOH, SiCOH or organic polymer, treating surfaces of the insulating film and the conductive pattern with plasma which includes a hydrocarbon gas as a treatment gas, and forming a diffusion barrier film, which is formed of an SiCH film, an SiCHN film, an SiCHO film or an SiCHON film, over the insulating film and the conductive pattern with performing a plasma CVD by adding an Si-containing gas to the treatment gas while increasing an addition amount gradually or in a step by step manner.
1. A semiconductor device comprising:
an insulating film made of SiOH, SiCOH or organic polymer;
a conductive pattern buried in said insulating film; and
a diffusion barrier film which is located over said insulating film and said conductive pattern and is formed of an SiCH film, an SiCHN film, an SiCHO film or an SiCHON film,
wherein said diffusion barrier film includes an Si concentration which increases in an upward direction gradually or in a step by step manner.
2. The semiconductor device as set forth in claim 1 ,
wherein a CH film or a CHN film is provided between said insulating film and said conductive pattern, and said diffusion barrier film.
3. The semiconductor device as set forth in claim 1 ,
wherein said insulating film is a porous film including a plurality of holes.
4. The semiconductor device as set forth in claim 1 ,
wherein a relative permittivity of said insulating film is equal to or less than 2.7.
5. The semiconductor device as set forth in claim 1 ,
wherein a surface layer of said conductive pattern contains C.