Vacuum arc vaporisation source and also a vacuum arc vaporisation chamber with a vacuum arc vaporisation source
The invention relates to a vacuum arc source ( 1 ), including ring-like magnetic field source ( 2 ) and a cathode body ( 3 ) with an vaporization material ( 31 ) as a cathode ( 32 ) for the production of an arc discharge on an vaporization surface ( 33 ) of the cathode ( 32 ). In this arrangement the cathode body ( 3 ) is bounded in an axial direction in a first axial direction by a cathode base ( 34 ) and in a second axial direction by the vaporization surface ( 33 ) and the ring-like magnetic ( 2 ) is arranged polarised parallel or anti-parallel and concentric to a surface normal ( 300 ) of the vaporization surface ( 33 ). In accordance with the invention a magnetic field enhancement ring ( 4 ) is arranged on a side remote from the vaporization surface ( 33 ) at a pre-determinable second spacing (A 2 ) in front of the cathode base ( 34 ). The invention further relates to an arc vaporization chamber ( 10 ) with an arc vaporization source ( 1 ).
1. A vacuum arc vaporization source comprising:
a ring-shaped magnetic field source;
a cathode body, comprising a vaporization material, being structured and arranged as a cathode for production of an arc discharge on a vaporization surface of the cathode, wherein the cathode body is axially bounded in a first axial direction by a cathode base and in a second axial direction by the vaporization surface;
the ring-shaped magnetic field source being arranged polarized parallel to or anti-parallel to a surface normal of the vaporization surface, concentric to the surface normal of the vaporization surface, and spaced at a predeterminable first distance from the vaporization surface on a side of the cathode body remote from the cathode base;
a magnetic field enhancement ring being arranged on a side of the cathode body remote from the vaporization surface and spaced at a predeterminable second distance from the cathode base,
wherein an internal diameter of the magnetic field enhancement ring amounts up to 50% of a diameter of the cathode.
2. The vacuum arc vaporization source in accordance with claim 1 wherein the magnetic field enhancement ring is polarised parallel to or anti-parallel to the surface normal and/or is arranged concentric to the surface normal.
3. The vacuum arc vaporization source in accordance with claim 1 wherein a width of the magnetic field enhancement ring is up to 10% of a diameter of the cathode.
4. The vacuum arc vaporization source in accordance with claim 1 wherein at least one magnetic correction ring is arranged on the side remote from the vaporization surface and spaced at a predeterminable third distance from the cathode base.
5. The vacuum arc vaporization source in accordance with claim 4 wherein the magnetic correction ring is arranged polarised parallel to or anti-parallel to the surface normal and/or concentric to the surface normal.
6. The vacuum arc vaporization source in accordance with claim 4 wherein the magnetic field enhancement ring and/or the magnetic correction ring is aligned not concentric to the surface normal and/or the magnetic field enhancement ring and/or the magnetic correction ring has a non-circular cross-sectional area.
7. The vacuum arc vaporization source in accordance with claim 4 , wherein the first spacing and /or the second spacing and/or a third spacing is adjustable, in dependence on the vaporization material and/or on a state of erosion of the cathode and/or is controllable or regulatable in dependence on another operating parameter of the vacuum arc vaporization source.
8. The vacuum arc vaporization source in accordance with claim 7 wherein the first spacing and/or the second spacing and/or the third spacing lies in a range from zero to 200 mm.
9. The vacuum arc vaporization source in accordance with claim 1 wherein the ring-shaped magnetic field source and/or the magnetic field enhancement ring and/or a magnetic correction ring includes a plurality of permanent magnets aligned parallel to the surface normal.
10. The vacuum arc vaporization source in accordance with claim 1 wherein the ring-shaped magnetic field source and/or the magnetic field enhancement ring and/or a magnetic correction ring includes a ring magnet.
11. The vacuum arc vaporization source in accordance with claim 1 wherein the ring-shaped magnetic field source and/or the magnetic field enhancement ring and/or a magnetic correction ring includes an electromagnet.
12. The vacuum arc vaporization source in accordance with claim 1 wherein a magnetic field strength of the ring-shaped magnetic field source and/or a magnetic field strength of the magnetic field enhancement ring and/or a magnetic field strength of a magnetic correction ring can be altered and/or controlled and/or regulated, in particular in dependence on the vaporization material and/or on the state of erosion of the cathode and/or can be controlled or regulated in dependence on another operating parameter of the vacuum arc vaporization source.
13. The vacuum arc vaporization source in accordance with claim 12 , wherein the magnetic field strength is controllable or regulatable by a control and/or a regulation of an electric current through an electromagnet of the ring-shaped magnetic field source and/or of the magnetic field enhancement ring and/or of the magnetic correction ring.
14. The vacuum arc vaporization source in accordance with claim 12 wherein the magnetic field strength can be adjusted by an exchange of the ring magnet and/or by an additional ring magnet and/or by removal of a ring magnet of the ring-shaped magnetic field source and/or of the magnetic field enhancement ring and/or of the magnetic correction ring.
15. The vacuum arc vaporization source in accordance with claim 12 wherein the magnetic field strength can be adjusted by an alteration of the number of the plurality of the permanent magnets aligned parallel to the surface normal of the ring-shaped magnetic field source and/or of the magnetic field enhancement ring and/or of the magnetic correction ring.
16. The vacuum arc vaporization source in accordance with claim 1 , wherein the ring-shaped magnetic field source and/or the magnetic field enhancement ring and/or a magnetic correction ring are polarised in the same direction in relation to the surface normal.
17. The vacuum arc vaporization source in accordance with claim 1 , wherein the ring-shaped magnetic field source and/or the magnetic field enhancement ring and/or a magnetic correction ring are polarised in opposition in relation to the surface normal.
18. The vacuum arc vaporization source in accordance with claim 1 , wherein a cooling system is provided for the cooling of the arc vaporization source.
19. The vacuum arc vaporization source in accordance with claim 1 , wherein the ring-shaped magnetic field source and/or the magnetic field enhancement ring and/or a magnetic correction ring includes a high temperature magnet.
20. The vacuum arc vaporization source in accordance with claim 1 , wherein the ring-shaped magnetic field source is arranged on a mounting block, and a BN insulation is provided between the mounting bock and the cathode for the restriction of the arc discharge on the vaporization surface of the cathode.
21. The vacuum arc vaporization source in accordance with claim 20 , wherein the mounting block includes a primary anode for the ignition and maintenance of the arc discharge.
22. The vacuum arc vaporization source in accordance with claim 21 , wherein the primary anode is insulated electrically relative to the mounting block.
23. The vacuum arc vaporization source in accordance with claim 20 wherein the BN insulation is in touching contact with the cathode for the ignition and maintenance of the arc discharge.
24. The vacuum arc vaporization source in accordance with claim 1 , wherein the arc vaporization source includes a pivotable trigger device for the ignition of the arc discharge which is either linearly movably or rotatably arranged.
25. An arc vaporization chamber including the vacuum arc source in accordance with claim 1 .
26. The vacuum arc vaporization chamber in accordance with claim 25 wherein the cathode body of the vacuum arc vaporization source and the arc vaporization chamber are connected to an electrical energy supply unit and the arc vaporization chamber is connected electrically as an anode in relation to the cathode body.
27. The arc vaporization chamber in accordance with claim 25 wherein the arc vaporization chamber is electrically connected via an electrical resistance to a primary anode electrically insulated from the mounting block.
28. The arc vaporization chamber in accordance with claim 26 , wherein the primary anode electrically insulated from the mounting block is connected to a positive pole of an auxiliary electrical supply unit and the arc vaporization chamber is connected to a negative pole of the auxiliary electrical supply unit.
29. The arc vaporization chamber in accordance with claim 28 wherein the electrical energy supply unit and/or the auxiliary electrical supply unit is a direct voltage electrical energy source.
30. The arc vaporization chamber in accordance with claim 28 , wherein the electrical energy supply unit and/or the auxiliary electrical supply unit is a pulsed electrical energy source.
31. The vacuum arc vaporization source in accordance with claim 1 , wherein the magnetic field enhancement ring comprises a plurality of permanent magnets.
32. The vacuum arc vaporization source in accordance with claim 19 , wherein the high temperature magnet is made of SmCo.
33. The vacuum arc vaporization source in accordance with claim 20 , wherein the mounting block is made of copper.
34. The vacuum arc vaporization source in accordance with claim 1 , further comprising a magnetic correction ring arranged between the magnetic field enhancing ring and the cathode base.