Metal complex compositions and methods for making metal-containing films
The present invention provides compositions of matter useful as deposition agents for making structures, including thin film structures and hard coatings, on substrates and features of substrates. In an embodiment, for example, the present invention provides metal complexes having one or more diboranamide or diboranaphosphide ligands that are useful as chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) precusors for making thin film structures and coatings. Metal complex CVD precursors are provided that possess volitilities sufficiently high so as to provide dense, smooth and homogenous thin films and coatings.
1. A composition of matter comprising a metal complex having the formula:
(ML x ) z D y (F1)
wherein the metal complex comprises one or more metal atoms, M, wherein each M, independent of other M, is a metal atom selected from the group consisting of: Be, Mg, Ca, Sr, Ba, Ra, Al, Ga, In, Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Hg, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Ac, Th, Pa, U, Np, Pu, Am, and Cm;
wherein each D, independent of other D, is a neutral coordinating ligand;
wherein x is the oxidation state of M;
wherein y is 0, 1, 2, 3 or 4;
wherein z is equal to 1, 2 or 3;
wherein each L, independent of other L, is an anionic ligand, wherein at least one of L is a monoanionic group comprising a diboranamide or diboranaphosphide group having the formula;
wherein: each X is independently N or P;
wherein, independently for each L, R 1 and R 2 are functional groups independently selected from the group consisting of hydrogen, alkyl, haloalkyl, aryl, heteroaryl, trialkylsilyl, alkenyl, alkynyl, halogen, fluoroalkyl, silylalkyl, alkoxy, hydroxyl, amide, boryl, and thiolate.
2. The composition of claim 1 wherein x is 2 and z is 1.
3. The composition of claim 2 wherein ML 2 has a formula selected from the group consisting of: M((BH 3 ) 2 NR 1 R 2 ) 2 and M((BH 3 ) 2 PR 1 R 2 ) 2 .
4. The composition of claim 2 wherein ML 2 has a formula selected from the group consisting of:
5. The composition of claim 1 wherein M is selected from the group consisting of Be, Mg, Ca, Sr, Ra, Ti, V, Nb, Cr, Mo, Mn, Re, Fe, Eu, Yb, Sr, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, and W.
6. The composition of claim 1 wherein M is selected from the group consisting of Mg, Ti, V, Cr, Mo, and Mn.
7. The composition of claim 1 wherein R 1 and R 2 are C 1 to C 10 alkyl groups.
8. The composition of claim 1 wherein R 1 and R 2 are methyl groups.
9. The composition of claim 1 having a formula selected from the group consisting of: Mg(H 3 BNMe 2 BH 3 ) 2 ; Mg(H 3 BNMe 2 BH 3 ) 2 (tetrahydrofuran); Mg(H 3 BNMe 2 BH 3 ) 2 (dimethoxyethane); Ti(H 3 BNMe 2 BH 3 ) 2 ; Cr(H 3 BNMe 2 BH 3 ) 2 ; Mo(H 3 BNMe 2 BH 3 ) 2 and; Mn(H 3 BNMe 2 BH 3 ) 2 .