IP Library Granted Patent US 7,978,820
Granted Patent B2
US 7,978,820 · App. 12/604,305 · Granted Jul 12, 2011

X-ray diffraction and fluorescence

Assignee: Panalytical B.V.
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Quick Facts
Patent No.
US 7,978,820
App. No.
12/604,305
Granted
Jul 12, 2011
Kind
B2
Abstract

An instrument capable of both X-ray diffraction, XRD, and X-ray fluorescence measurements, XRF, arranges an X-ray source 10 creating an incident X-ray beam directed to a sample on a sample stage. An X-ray detection system is mounted at a fixed angle 2θ for high energy energy dispersive XRD For XRF, an X-ray detection system is used.

Claims (25)

1. A combined X-ray diffraction, XRD, and X-ray fluorescence apparatus, XRF, comprising:

an X-ray source which provides radiation simultaneously over a continuous range of wavelengths, the radiation including a plurality of characteristic lines;

a beam conditioner system arranged to define an incident X-ray beam in the diffraction plane in an incident beam direction;

a sample holder arranged to hold a sample in the incident X-ray beam, the sample holder defining a sample plane;

an XRF port positioned for measuring X-rays off the sample with an X-ray detection system mounted on the port to do fluorescence analysis;

an XRD port arranged at a fixed 2 θ angle to the incident beam direction for measuring diffracted X-rays, where 2 θ is in the range 0.1° to 20°; and

a beam conditioner system placed in alignment with the XRD port to select diffracted X-rays with an angle of 2 θ to the incident beam direction.

2. A combined X-ray diffraction and X-ray fluorescence apparatus according to claim 1 , wherein the X-ray source is adapted to provide X-rays over a range of wavelengths being at least 10 keV wide and extending above 10 keV.

3. A combined X-ray diffraction and X-ray fluorescence apparatus according to claim 1 , wherein the fixed angle 2 θ is in the range 5° to 12°.

4. A combined X-ray diffraction and X-ray fluorescence apparatus according to claim 1 , wherein the fixed angle 2 θ is in the range 0.1° to 5°.

5. A combined X-ray diffraction and X-ray fluorescence apparatus according to claim 1 comprising an energy dispersive XRD detection system mounted on the XRD port, and an energy dispersive XRF detection system mounted on the XRF port.

6. A combined X-ray diffraction and X-ray fluorescence apparatus according to claim 5 wherein the XRD detection system comprises a goniometer, at least one crystal and at least one detector.

7. A combined X-ray diffraction and X-ray fluorescence apparatus according to claim 5 , wherein XRD detection system comprises a wavelength dispersive element and a detector.

8. A combined X-ray diffraction and X-ray fluorescence apparatus according to claim 7 , wherein the detector is a position-sensitive detector.

9. A combined X-ray diffract on and X-ray fluorescence apparatus according to claim 5 , wherein the XRD detection system comprises an energy selective detector which is tunable to detect energies at a selected energy.

10. A combined X-ray diffraction and X-ray fluorescence apparatus according to claim 1 comprising a plurality of XRF ports.

11. A combined X-ray diffraction and X-ray fluorescence apparatus according to claim 1 , comprising a plurality of XRD ports, wherein the XRF detection system comprises a goniometer, at least one crystal and at least one detector.

12. A combined X-ray diffraction and X-ray fluorescence apparatus according to claim 1 , claim 2 , claim 3 , claim 4 , claim 5 , claim 6 , claim 7 , claim 8 , claim 9 , claim 10 , or claim 11 , comprising a plurality of XRD ports.

13. A method of operation of a combined X-ray diffraction and X-ray fluorescence apparatus comprising an X-ray source, a beam conditioner system, a sample holder, an X-ray fluorescence (XRF) port and an X-ray diffraction (XRD) port, the method comprising

mounting a sample to the sample holder;

providing radiation from the X-ray source simultaneously over a continuous range of wavelengths, the radiation including a plurality of characteristic lines;

defining an incident X-ray beam incident on the sample in an incident beam direction in the diffraction plane;

measuring X-rays at the XRF port for fluorescence analysis;

selecting diffracted X-rays with a fixed angle of 2 θ to the incident beam direction; and

measuring the intensity of selected diffracted X-rays as a function of energy.

Assignments (2)
CHANGE OF NAME Recorded Jan 15, 2018
From: PANALYTICAL B.V.
To: MALVERN PANALYTICAL B.V.
Reel/Frame 045765/0354 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 8, 2010
From: KHARCHENKO, ALEXANDER; MEIER, ROGER; VAN DEN HOOGENHOF, WALTER
To: PANALYTICAL B.V.
Reel/Frame 024504/0316 →
Continuity (1)
Related Publication 20110096898A1 · Apr 28, 2011