IP Library Granted Patent US 8,450,611
Granted Patent B2
US 8,450,611 · App. 12/607,225 · Granted May 28, 2013

Connecting wire and method for manufacturing same

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Quick Facts
Patent No.
US 8,450,611
App. No.
12/607,225
Granted
May 28, 2013
Kind
B2
Abstract

A connecting wire having an electrically conductive core, preferably provided by a wire or ribbon, with a coating provided on the surface of the core. The coating is composed of a nitrogen-containing tantalum alloy or tungsten alloy, and also optionally contains silicon as an additional alloy component. A manufacturing method for producing such a connecting wire involves passing a wire or ribbon core past a coating source to apply the coating.

Claims (51)

1. A connecting wire having:

a. an electrically conductive core, and

b. a coating provided on the surface of the core, wherein the coating includes one or more of:

(1) a nitrogen-containing alloy of tantalum, and

(2) a nitrogen-containing alloy of tungsten; and

c. a bonding layer provided on the surface of the coating opposite from the core, wherein the bonding layer includes aluminum.

2. The connecting wire of claim 1 wherein at least one of the nitrogen-containing alloys within the coating further contains silicon as an alloy component.

3. The connecting wire of claim 1 wherein the coating includes one or more of

a. TaSiN and

b. WSiN.

4. The connecting wire of claim 1 wherein the coating includes Ta58Si16N26.

5. The connecting wire of claim 1 wherein the coating has a thickness of 2 nm to 100 nm.

6. The connecting wire of claim 1 wherein the coating has a thickness of 5 nm to 50 nm.

7. The connecting wire of claim 1 wherein the bonding layer includes aluminum oxide in its outer surface.

8. The connecting wire of claim 1 wherein the bonding layer has a thickness between 2.5 nm and 50 nm.

9. The connecting wire of claim 1 wherein the bonding layer has a thickness between 6 nm and 40 nm.

10. The connecting wire of claim 1 wherein the bonding layer has a thickness between 7 nm and 35 nm.

11. The connecting wire of claim 1 wherein the core is formed from a wire or a ribbon.

12. The connecting wire of claim 1 wherein:

a. the core is formed from a wire, and

b. the coating has a thickness of 0.025% to 0.075% of the core wire diameter.

13. The connecting wire of claim 1 :

a. wherein the core is formed from a wire, and

b. wherein the bonding layer

has a thickness of 0.0125% to 0.0375% of the diameter of the core wire.

14. The connecting wire of claim 1 wherein:

a. the core is formed from a ribbon, and

b. the coating has a thickness of 0.025% to 0.075% of the thickness of the core ribbon.

15. The connecting wire of claim 1 :

a. wherein the core is formed from a ribbon, and

b. wherein the bonding layer

has a thickness of 0.0125% to 0.0375% of the thickness of the core ribbon.

16. A method for manufacturing a connecting wire having:

I. an electrically conductive core, and

II. a coating provided on the surface of the core, wherein the coating includes one or more of:

A. a nitrogen-containing alloy of tantalum, and

B. a nitrogen-containing alloy of tungsten, the method including the steps of:

a. unwinding the core from a wind-out reel,

b. passing the core past a first coating source, the first coating source applying the coating, and

c. passing the core past a second coating source, the second coating source applying a bonding layer containing aluminum on the surface of the coating opposite from the core.

17. The method of claim 16 wherein the first coating source includes at least one of:

a. a CVD unit, and

b. a PVD unit.

18. The method of claim 16 wherein:

a. the core is provided in the form of a wire or ribbon, and

b. wherein the step of passing the core past a first coating source includes passing the core within one or more of:

c. a tubular or annular sputtering target, and

d. a rectangular sputtering target.

19. The method of claim 16 further including the step of vacuum cleaning of the core before passing the core past the first coating source.

20. The method of claim 19 wherein the vacuum cleaning step includes in situ ion physical cleaning without vacuum interruption.

21. The method of claim 16 further including the step of tempering the coated core.

Assignments (3)
CHANGE OF NAME Recorded May 19, 2015
From: HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG
To: HERAEUS DEUTSCHLAND GMBH & CO. KG
Reel/Frame 035744/0381 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 19, 2012
From: MICRO SYSTEMS ENGINEERING GMBH; TECHNISCHE UNIVERSITAET DRESDEN
To: HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG
Reel/Frame 028398/0444 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 30, 2009
From: DOHLE, RAINER, DR.; RUDOLF, FRANK, DR.; WENZEL, CHRISTIAN, DR.
To: MICRO SYSTEMS ENGINEERING GMBH; TECHNISCHE UNIVERSITAET DRESDEN
Reel/Frame 023576/0652 →