Substrate processing apparatus

1. A substrate processing apparatus Comprising;

a carrying chamber;

a loadlock chamber capable of accommodating substrates arranged vertically with an interval therebetween;

at least two process chambers; and

a controller configured to control each component of the substrate processing apparatus,

wherein the loadlock chamber and the at least two process chambers are arranged around the carrying chamber and each of the at least two process chambers comprises a first process unit and a second process unit, the second process unit being disposed at a side of the at least two process chambers distant from the carrying chamber with the first process unit disposed therebetween, and

wherein the carrying chamber comprises a substrate carrying unit configured to carry the substrates between the loadlock chamber and the at least two process chambers, the substrate carrying unit comprising: a first arm provided with a first pair of fingers including a first finger and a second finger arranged vertically, each of the first finger and the second finger being fixed to the first arm via a supporting part with a gap therebetween, each of the first finger and the second finger including a wafer resting part configured to carry one of the substrates arranged vertically, the wafer resting part of each of the first finger and the second finger having a leading end extending horizontally, and the wafer resting part of the second finger having a notch at the leading end thereof, the notch overlapping with the leading end of the first finger; and a second arm vertically stacked with respect to the first arm, the second arm provided with a second pair of fingers including a third finger and a fourth finger arranged vertically, each of the third finger and the fourth finger being fixed to the second arm via a support part with a gap therebetween, each of the third finger and the fourth finger including a wafer resting part configured to carry one of the substrates arranged vertically, the wafer resting part of each of the third finger and the fourth finger having a notch at a leading end thereof extending horizontally, the notch of the fourth finger overlapping with the leading end of the third finger,

wherein each of the first finger and the second finger includes a penetration hole extending over the resting part and the supporting part thereof;

a first reflective displacement sensor disposed at one of a top side and a bottom side of the carrying chamber closer to the first arm such that penetration holes of the first finger and the second finger and the supporting part of the third finger are placed along an optical axis of a first light passing through the penetration holes of the first finger and the second finger with the leading ends of the first finger and the second finger facing one of the at least two process chambers during a carrying operation of the substrates; and

a second reflective displacement sensor disposed at one of the top side and the bottom side of the carrying chamber opposite to the first reflective displacement sensor such that the notch of the fourth finger and a backside of the third finger are placed along an optical axis of a second light passing through the notch of the fourth finger with the leading ends of the first finger and the second finger facing the one of the at least two process chambers during the carrying operation of the substrates.

2. The substrate processing apparatus of claim 1 , wherein the controller is configured to: control the first reflective displacement sensor to emit the first light toward the penetration holes of the first finger and the second finger and to receive the first light reflected from the supporting part of the third finger to measure a first distance and the second reflective displacement sensor to emit the second light toward the notch of the fourth finger and the backside of the third finger and to receive the second light reflected from the backside to measure a second distance and the third finger with the leading ends of the first finger and the second finger facing the one of the at least two process chambers during a carrying out operation of processed substrates; determine that the third finger and the fourth finger are without the substrates thereon when a difference between the first distance and a first preset value is within a first tolerance range and a difference between the second distance and a second preset value is with a second tolerance range; and then control the third finger and the fourth finger to carry out the processed substrates from the one of the at least two process chambers.

3. The substrate processing apparatus of claim 1 , wherein the controller is configured to:

control the third finger and the fourth finger to carry out processed substrates form the process chamber into the carrying chamber, the first reflective displacement sensor to emit the first light toward the penetration holes of the first finger and the second finger and to receive the first light reflected form the supporting part of the third finger to measure a first distance and the second reflective displacement sensor to emit the second light toward the notch of the fourth finger and the backside of the third finger and to receive the second light reflected from the backside to measure a second distance with each of the first finger and the second finger holding a non-processed substrate, the processed substrates disposed in the process chamber and the leading ends of the first finger and the second finger facing the one of the at least two process chambers during a carrying in operation of the non-processed substrate;

determine that each of the third finger and the fourth finger is holding the non-processed substrate thereon when a difference between the first distance and a first preset value is out of a first tolerance range and a difference between the second distance and a second preset value is out of a second tolerance range; and

then control each of the first finger and the second finger to carry in the non-processed substrate into the one of the at least two process chambers.

4. The substrate processing apparatus of claim 1 , wherein the wafer resting part of each of the first finger through the fourth finger is grooved for placing one of the substrates thereon.

5. The substrate processing apparatus of claim 1 , wherein a boundary of the wafer resting part and the supporting part of each of the first finger through the fourth finger is curved along a circumference of one of the substrates placed thereon.