Probes for enhanced magnetic force microscopy resolution
View Patent ↗Magnetic Force Microscopy (MFM) probe tips that provide enhanced spatial resolution and methods of manufacture are provided. In one aspect, two or more magnetically-decoupled layers may be deposited on an AFM probe in order to create an active magnetic region at about the apex of the probe tip with dimensions less than about 10 nanometers. In another aspect, nanoscale patterning techniques may be employed to fabricate probe tips that possess plateau features. These plateau features may serve as substrates for the deposition of magnetic films having properties similar to magnetic recording media. Machining techniques, such as Focused Ion Beam (FIB) may be further employed to reduce the size of the magnetic materials deposited upon the substrate. Beneficially, because the plateaus of the substrate are substantially flat and of known geometry, and the magnetic properties of magnetic films deposited on flat surfaces are similar to those deposited upon the plateau, the magnetization of the MFM probe tips may be determined to high accuracy. In this manner, fine control over the magnetic properties of MFM probe tips may be achieved, providing enhanced MFM resolution.
1. A method of manufacturing a magnetic force microscopy (MFM) probe tip, comprising:
introducing a plateau region into a first end of a generally elongate substrate in a first plurality of patterning operations;
depositing a magnetic material comprising a plurality of magnetic layers that are exchanged decoupled from one another upon at least a portion of the plateau region of the MFM probe tip substrate; and
patterning the magnetic material in a second plurality of patterning operations.
2. The method of claim 1 , wherein the substrate is mounted to a cantilever and wherein the substrate comprises one of silicon, silicon oxide, and silicon nitride.
3. The MFM probe tip of claim 1 , wherein the MFM probe tip substrate comprises one of a cone, a cylinder, and a pyramid.
4. The method of claim 1 , wherein the magnetic material further comprises an adhesion layer, wherein the adhesion layer comprises one of titanium (Ti), tantalum (Ta), chromium (Cr), and palladium (Pa).
5. The method of claim 1 , wherein the magnetic material further comprises a seed layer comprising one of Ruthenium (Ru), Chromium (Cr), Palladium (Pd), Platinum (Pt), Silver (Ag), and Magnesium Oxide (MgO).
6. The method of claim 1 , wherein the magnetic material further comprises a plurality of magnetic layers and a plurality of non-magnetic layers interposed between at least one pair of the plurality of magnetic layers.
7. The method of claim 6 , wherein the non-magnetic layer comprise at least one of MgO, CrRu, Ti, Ta, Pd, and Pt.
8. The method of claim 6 , wherein the magnetic layers comprise substantially continuous magnetic layers.
9. The method of claim 8 , wherein the continuous magnetic layers comprise at least one of cobalt (Co), iron (Fe), nickel (Ni), cobalt/palladium (Co/Pd) multilayers, cobalt/platinum (Co/Pt) multilayers, iron/platinum (Fe/Pt) multilayers, iron/palladium (Fe/Pd) multilayers and L1 0 alloy compositions of cobalt-palladium (CoPd), cobalt-platinum (CoPt), iron-platinum (FePt) and iron-palladium (FePd).
10. The method of claim 6 , wherein the magnetic layers comprise granular magnetic layers.
11. The method of claim 10 , wherein at least one of the magnetic layers comprises a composition given by one of CoCrX and L1 0 FePtX, FePdX CoPdX, CoPtX, where X comprises Cu, Ag, Au, Pd, Pt, Cr, B, C, SiO 2 , TiO 2 .
12. The method of claim 1 , wherein the magnetic material further comprises a protective layer comprising one of Carbon (C), Palladium (Pd), Platinum (Pt), Titanium (Ti), Tantalum (Ta), Palladium (Pd), Gold (Au), Silver (Ag), and Chromium (Cr).
13. The method of claim 1 , wherein the patterning operations are performed by focused ion beam milling, chemical etching, and combinations thereof.
14. The method of claim 1 , wherein the second patterning operation reduces the spatial extent of the plateau.
15. The method of claim 1 , wherein the second plurality of patterning operations comprises:
depositing an adhesion layer on the magnetic material;
depositing a hard mask on the adhesion layer;
patterning the hard mask by focused ion beam milling;
patterning the remaining underlying magnetic material by argon ion milling.
16. The method of claim 15 , wherein the hard mask comprises magnesium oxide (MgO), aluminum oxide (Al 2 O 3 ) silicon nitride (Si 3 N 4 ), Indium Tin Oxide (ITO), Carbon (C), and combinations thereof.
17. A magnetic force microscopy (MFM) probe tip, comprising:
a generally elongate body having a first end and a second end, the second end having a plateau configuration with respect to the body; and
a magnetic material positioned upon the plateau at the second end of the body,
wherein the magnetic material comprises a plurality of magnetic layers and at least one non-magnetic layer interposed between at least one pair of the plurality of magnetic layers and wherein the at least one non-magnetic layer inhibits magnetic exchange coupling between the at least one pair of the plurality of magnetic layers.
18. The method of claim 17 , wherein the substrate is mounted to a cantilever and wherein the substrate comprises one of silicon, silicon oxide, and silicon nitride.
19. The MFM probe tip of claim 17 , wherein the MFM probe tip substrate comprises one of a cone, a cylinder, and a pyramid.
20. The method of claim 17 , wherein the magnetic material further comprises an adhesion layer, wherein the adhesion layer comprises one of titanium (Ti), tantalum (Ta), chromium (Cr), and palladium (Pa).
21. The MFM probe tip of claim 17 , wherein the magnetic material further comprises a seed layer comprising one of Ruthenium (Ru), Chromium (Cr), Palladium (Pd), Platinum (Pt), Silver (Ag), and Magnesium Oxide (MgO).
22. The MFM probe tip of claim 17 , wherein the magnetic material further comprises a plurality of magnetic layers and a non-magnetic layer interposed between at least one pair of the plurality of magnetic layers.
23. The MFM probe tip of claim 22 , wherein the non-magnetic layers comprise at least one of MgO, CrRu, Ti, Ta, Pd, and Pt.
24. The MFM probe tip of claim 17 , wherein the magnetic layers comprise substantially continuous magnetic layers.
25. The MFM probe tip of claim 24 , wherein the continuous magnetic layers comprise at least one of cobalt (Co), iron (Fe), nickel (Ni), cobalt/palladium (Co/Pd) multilayers, cobalt/platinum (Co/Pt) multilayers, iron/platinum (Fe/Pt) multilayers, iron/palladium (Fe/Pd) multilayers and L1 0 alloy compositions of cobalt-palladium (CoPd), cobalt-platinum (CoPt), iron-platinum (FePt) and iron-palladium (FePd).
26. The MFM probe tip of claim 17 , wherein the magnetic layers comprise granular magnetic layers.
27. The MFM probe tip of claim 26 , wherein at least one of the magnetic layers comprises a composition given by one of CoCrX and L1 0 FePtX, FePdX CoPdX, CoPtX, where X comprises Cu, Ag, Au, Pd, Pt, Cr, B, C, SiO2, TiO 2 .
28. The method of claim 17 , wherein the magnetic material further comprises a protective layer comprising one of Carbon (C), Palladium (Pd), Platinum (Pt), Titanium (Ti), Tantalum (Ta), Palladium (Pd), Gold (Au), Silver (Ag), and Chromium (Cr).
29. A magnetic force microscopy (MFM) probe tip, comprising:
a substrate comprising an atomic force microscopy (AFM) tip; and
a magnetic material positioned upon at least a portion of the substrate, the magnetic material comprising at least two magnetic layers and at least one non-magnetic layer interposed between at least one pair of the plurality of magnetic layers, wherein the at least one non-magnetic interlayer is configured to inhibit exchange coupling between the at least two magnetic layers;
wherein the magnetic flux in the at least two magnetic layers is configured so as to substantially cancel except within an active magnetic region having a selected dimension.
30. The MFM probe tip of claim 29 , wherein the selected dimension is less than about 10 nm.
31. The method of claim 29 , wherein the magnetic material further comprises an adhesion layer, wherein the adhesion layer comprises one of Ti, Cr, and Ta.
32. The method of claim 29 , wherein the magnetic material further comprises a seed layer comprising one of Ruthenium (Ru), Chromium (Cr), Palladium (Pd), Platinum (Pt), Silver (Ag), and Magnesium Oxide (MgO).
33. The method of claim 29 , wherein the magnetic material further comprises a plurality of magnetic layers and a non-magnetic layer interposed between at least one pair of the plurality of magnetic layers.
34. The method of claim 33 , wherein the non-magnetic layers comprise at least one of MgO, CrRu, Ti, Ta, Pd, and Pt.
35. The method of claim 29 , wherein the magnetic layers comprise substantially continuous magnetic layers.
36. The method of claim 35 , wherein the continuous magnetic layers comprise at least one of cobalt (Co), iron (Fe), nickel (Ni), cobalt/palladium (Co/Pd) multilayers, cobalt/platinum (Co/Pt) multilayers, iron/platinum (Fe/Pt) multilayers, iron/palladium (Fe/Pd) multilayers and L1 0 alloy compositions of cobalt-palladium (CoPd), cobalt-platinum (CoPt), iron-platinum (FePt) and iron-palladium (FePd).
37. The method of claim 29 , wherein the magnetic layers comprise granular magnetic layers.
38. The method of claim 37 , wherein at least one of the magnetic layers comprises a composition given by one of CoCrX and L1 0 FePtX, FePdX CoPdX, CoPtX, where X comprises Cu, Ag, Au, Pd, Pt, Cr, B, C, SiO2, TiO 2 .
39. The method of claim 29 , wherein the magnetic material further comprises a protective layer comprising one of Carbon (C), Palladium (Pd), Platinum (Pt), Titanium (Ti), Tantalum (Ta), Palladium (Pd), Gold (Au), Silver (Ag), and Chromium (Cr).