Semiconductor memory device with spacer shape floating gate and manufacturing method of the semiconductor memory device

1. A manufacturing method of a semiconductor memory device, comprising:

forming a nitride pattern on a semiconductor substrate;

forming a floating gate in a spacer shape at a side wall of the nitride pattern;

forming a first oxide layer at a side wall of the floating gate;

removing the nitride pattern;

forming a dielectric layer spacer at an exposed side wall of the floating gate, the exposed side wall of the floating gate being exposed by the removing of the nitride pattern;

forming a third oxide layer over the first oxide layer, the dielectric layer, and the semiconductor substrate;

forming a polysilicon layer over the third oxide layer; and

etching portions of the polysilicon layer, the third oxide layer, and the first oxide layer to form a control gate over the floating gate, the dielectric layer spacer, and a part of the first oxide layer.

2. The manufacturing method of the semiconductor memory device according to claim 1 , wherein the forming of the floating gate comprises:

forming a first polysilicon, layer on the semiconductor substrate including the nitride pattern; and

etching the polysilicon layer using a blanket etch method.

3. The manufacturing method of the semiconductor memory device according to claim 1 , wherein the forming of the first oxide layer at the side wall of the floating gate comprises:

forming the first oxide layer on the semiconductor substrate including on the nitride pattern and the floating gate; and

planarizing the first oxide layer until the nitride pattern is exposed.

4. The manufacturing method of the semiconductor memory device according to claim 3 , wherein at least one of the polysilicon layer and the first oxide layer are formed using a CVD method.

5. The manufacturing method of the semiconductor memory device according to claim 1 , wherein the forming of the dielectric layer spacer comprises:

forming a second oxide layer over the first oxide layer, the floating gate, and the semiconductor substrate; and

etching the second oxide layer using a blanket etch method.

6. The manufacturing method of the semiconductor memory device according to claim 1 , wherein the semiconductor memory device is a silicon storage technology (SST) flash non-volatile memory (NVM).

7. A semiconductor memory device comprising:

a floating gate formed on a semiconductor substrate, the floating gate having a sidewall spacer shape;

a dielectric layer spacer formed at one side wall of the floating gate;

a third oxide layer formed over the floating gate and the dielectric layer; and

a control gate formed over the third oxide layer;

wherein shapes of the floating gate and the dielectric layer spacer are symmetric.

8. The semiconductor memory device according to claim 7 , further comprising:

a first oxide layer formed at a second side wall of the floating gate, the second side wall being opposite the one side wall having the dielectric layer spacer,

wherein the third oxide layer extends over an upper surface of the first oxide layer.

9. The semiconductor memory device according to claim 7 , wherein the third oxide layer extends onto a portion of the semiconductor substrate at a side of the dielectric layer spacer.

10. The semiconductor memory device according to claim 7 , wherein the floating gate and the control gate each comprise polysilicon material.

11. The semiconductor memory device according to claim 7 , wherein the dielectric layer comprises an oxide.

12. The semiconductor memory device according to claim 7 , wherein the semiconductor memory device is a silicon storage technology (SST) flash non-volatile memory (NVM).

13. The semiconductor memory device according to claim 8 , wherein the first oxide layer and the dielectric layer spacer have different shapes, respectively.