Device and method for wet treating disc-shaped articles
In a spin-chuck with plural collector levels, a separate exhaust controller is provided for each level. This permits selectively varying gas flow conditions among the collector levels, so that the ambient pressure at one level does not adversely affect device performance in an adjacent level.
1. Device for wet treating a substrate, comprising:
a spin chuck for holding and rotating the substrate about a rotation axis;
at least one dispenser for dispensing a liquid onto at least one surface of said substrate;
a liquid collector circumferentially surrounding said spin chuck for collecting liquid, which is spun off the substrate during rotation, with at least two collector levels for separately collecting liquids in different collectors;
lifting means for moving said spin chuck relative to said liquid collector substantially along said rotation axis;
at least two exhaust levels for separately collecting gas from the interior of the liquid collector;
at least one exhaust influencing means, which is associated with said at least two exhaust levels, for selectively varying gas flow conditions in said at least two exhaust levels; and
a computer that automatically sets an exhaust flow for each of said at least two exhaust levels based on a vertical position of said spin chuck relative to said liquid collector.
2. The device according to claim 1 , wherein said at least one exhaust influencing means is a flow control modulating valve.
3. The device according to claim 1 , wherein said at least one exhaust influencing means is a closing valve, whereby one of said at least two exhaust levels can be closed.
4. The device according to claim 1 , wherein suction orifices of at least one of said at least two exhaust levels are connected to one of said two collector levels.
5. The device according to claim 1 , wherein at least one of said at least two exhaust levels is arranged above or below one of said at least two collector levels.