Electro-optic device

1. An electro-optic device comprising:

a substrate;

an optical modulator being disposed over the substrate and including a first conductivity type semiconductor layer, a second conductivity type semiconductor layer, and a junction layer disposed between the first conductivity type semiconductor layer and the second conductivity type semiconductor layer; and

a pair of recessed portions each extending from first and second sidewalls of the optical modulator and each having an upper surface disposed below an upper surface of the optical modulator,

wherein a reverse bias voltage is applied to the first conductivity type semiconductor layer and the second conductivity type semiconductor layer.

2. The electro-optic device of claim 1 ,

wherein the second conductivity type semiconductor layer is spaced apart from the substrate with the first conductivity type semiconductor layer disposed therebetween.

3. The electro-optic device of claim 1 ,

wherein an interface between the first conductivity type semiconductor layer and the junction layer, and an interface between the second conductivity type semiconductor layer and the junction layer are each arranged perpendicular to an upper surface of the substrate.

4. The electro-optic device of claim 1 ,

wherein an upper surface of the first conductivity type semiconductor layer is formed at a level higher than upper surfaces of the recessed portions.

5. The electro-optic device of claim 1 ,

wherein the junction layer includes a first surface contacting the first conductivity type semiconductor layer and a second surface contacting the second conductivity type semiconductor layer, and

wherein the first surface is lower than upper surfaces of the recessed portions and the second surface is higher than upper surfaces of the recessed portions.

6. The electro-optic device of claim 1 ,

wherein the pair of recessed portions includes first and second recesses extending from the first and the second sidewalls of the optical modulator, respectively,

wherein a first optical signal enters into the optical modulator through the first recess,

wherein a second optical signal outputs from the optical modulator through the second recess, and

wherein a phase of the second optical signal depends on an intensity of the reverse bias voltage.

7. An electro-optic device comprising:

a substrate;

an optical modulator being disposed over the substrate and including a first conductivity type semiconductor layer, a second conductivity type semiconductor layer, and a junction layer disposed between the first conductivity type semiconductor layer and the second conductivity type semiconductor layer; and

a pair of recessed portions each extending from first and second sidewalls of the optical modulator and being thinner than the optical modulator,

wherein a reverse bias voltage is applied to the first conductivity type semiconductor layer and the second conductivity type semiconductor layer,

wherein the first conductivity type semiconductor layer includes a P-type doped region and the second conductivity type semiconductor layer includes an N-type doped region, and

wherein the doping concentration of the P-type doped region is about 2 to 4 times higher than the doping concentration of the N-type doped region.

8. The electro-optic device of claim 7 , wherein an upper surface of the first conductivity type semiconductor layer is formed at a level thinner lower than upper surfaces of the recessed portions.

9. The electro-optic device of claim 7 ,

wherein the optical modulator includes a light-receiving surface receiving a first optical signal and a light-outputting surface outputting a second optical signal, and

wherein a phase of the second optical signal depends on the level a magnitude of the reverse bias voltage.

10. The electro-optic device of claim 9 , the electro-optic device further comprising;

at least one grating coupler coupled at least one of the light-receiving surface and the light-outputting surface of the optical modulator.

11. The electro-optic device of claim 7 ,

wherein an interface between the first conductivity type semiconductor layer and the junction layer, and an interface between the second conductivity type semiconductor layer and the junction layer are each arranged perpendicular to a surface of the substrate.

12. The electro-optic device of claim 7 ,

wherein the first sidewall and the second sidewall of the optical modulator each extend to a level higher than upper surfaces of the recessed portions, and

wherein the junction layer is disposed between the first sidewall and the second sidewall.

13. The electro-optic device of claim 7 ,

wherein an upper surface of the first conductivity type semiconductor layer is formed at a level higher than upper surfaces of the recessed portions.

14. The electro-optic device of claim 7 ,

wherein the junction layer includes a first surface contacting the first conductivity type semiconductor layer and a second surface contacting the second conductivity type semiconductor layer, and

wherein the first surface is lower than upper surfaces of the recessed portions and the second surface is higher than upper surfaces of the recessed portions.

15. An electro-optic device comprising:

a substrate;

an optical modulator being disposed over the substrate and including a first conductivity type semiconductor layer, a second conductivity type semiconductor layer, and a junction layer disposed between the first conductivity type semiconductor layer and the second conductivity type semiconductor layer; and

a pair of recessed portions each extending from first and second sidewalls of the optical modulator and each having an upper surface disposed below an upper surface of the optical modulator,

wherein a reverse bias voltage is applied to the first conductivity type semiconductor layer and the second conductivity type semiconductor layer, and

wherein an optical absorption factor of the junction layer varies depending on a level of the reverse bias voltage applied to the first and the second conductivity type semiconductor layers.

16. The electro-optic device of claim 15 , the electro-optic device further comprising;

a cladding layer disposed between the substrate and the optical modulator.

17. The electro-optic device of claim 16 ,

wherein the cladding layer is formed by implanting oxygen ions selectively at a portion of the semiconductor substrate to form an optical waveguide over the substrate.

18. The electro-optic device of claim 17 ,

wherein the cladding layer includes a silicon oxide with a concentration in a Gaussian distribution.

19. The electro-optic device of claim 15 ,

wherein the substrate includes a switching region spaced apart from the optical modulator, and

wherein the electro-optic device further comprises:

a gate insulating layer disposed over the switching region of the substrate; and

a gate electrode disposed over the gate insulating layer.