Fabrication method of a flexible capacitive pressure sensor
The invention relates to a capacitive pressure sensor and a method for fabricating thereof. The capacitive pressure sensor comprises a cover, a plurality of first electrode, a substrate and a plurality of second electrode. The cover owns an upper wall and a plurality of side walls. The plurality of first electrode is disposed on the inside of the upper wall of the cover. The side walls of the cover are connected to the substrate to form a space. The plurality of second electrode is disposed on the substrate. The plurality of first electrode and the plurality of second electrode are both in the space. In the invention, the material for cover, the plurality of first electrodes and the substrate are all flexible polymeric material.
1. A capacitive pressure sensor, comprising:
a cover having an upper wall a plurality of side wall;
a plurality of first electrode disposed on the inside of the upper wall of the cover;
a substrate connected to the side walls to form a space; and
a plurality of second electrode disposed on the substrate, the plurality of first electrode and the plurality of second electrode being both in the space, and one of the plurality of first electrode corresponding to one of the plurality of second electrode in order to form a plurality of sensing capacity; wherein a material for the cover, the plurality of first electrode and the plurality of substrate being a flexible polymeric material.
2. The apparatus according to claim 1 , further comprising a stress layer, wherein the stress layer being connected to the outside of the upper wall of the cover.
3. The apparatus according to claim 2 , wherein the stress layer comprises a convex part, which makes the capacitive pressure sensor to accept the front normal stress and the side shear stress.
4. The apparatus according to claim 2 , wherein the material of the stress layer comprises flexible polymeric material.
5. The apparatus according to claim 2 , wherein the material of the stress layer comprises polydimethyl siloxane.
6. The apparatus according to claim 1 , wherein the plurality of first electrode and the plurality of second electrode are parallel.
7. The apparatus according to claim 1 , wherein the plurality of first electrode and the plurality of second electrode are symmetrical which provides the measurement of the front normal stress and the side shear stress.
8. The apparatus according to claim 1 , wherein the cover comprises a support pillar, which connects the substrate, and divides the space into a first space and a second space.
9. The apparatus according to claim 8 , wherein the support pillar supports the upper wall of the cover in order to measure the front normal stress and the side shear stress.
10. The apparatus according to claim 1 , wherein the material of the cover comprises polydimethyl siloxane.
11. The apparatus according to claim 1 , wherein the material of the substrate comprises polyimide.
12. A method for fabricating the capacitive pressure sensor, comprising:
providing a cover having an upper wall and a plurality of side wall;
disposing a plurality of first electrode on the inside of the upper wall of the cover;
disposing a plurality of second electrode on the substrate; and
connecting a plurality of side wall of the cover and the substrate, so that one of the comprising the plurality of first electrode corresponding to one of the plurality of second electrode in order to form a plurality of sensing capacity; wherein the material of the cover, the plurality of first electrode and the substrate being a flexible polymeric material.
13. The method according to claim 12 , further comprising:
providing a stress layer; and
connecting the stress layer to an outside of the upper wall of the cover.
14. The method according to claim 13 , wherein the stress layer comprises a convex part, which makes the capacitive pressure sensor to accept the front normal stress and the side shear stress.
15. The method according to claim 13 , wherein the material of the stress layer comprises polydimethyl siloxane.
16. The method according to claim 12 , wherein the plurality of first electrode comprises disposed on the inside of the upper wall of the cover by the sputtering and a vapor deposition.
17. The method according to claim 12 , wherein the plurality of second electrode comprises disposed on the substrate by the etching process.
18. The method according to claim 12 , wherein the material of the cover comprises polydimethyl siloxane.
19. The method according to claim 12 , wherein the material of the substrate comprises polyimide.