IP Library Granted Patent US 8,076,195
Granted Patent B2
US 8,076,195 · App. 12/656,720 · Granted Dec 13, 2011

Resistive memory architectures with multiple memory cells per access device

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Quick Facts
Patent No.
US 8,076,195
App. No.
12/656,720
Granted
Dec 13, 2011
Kind
B2
Abstract

A resistive memory structure, for example, phase change memory structure, includes one access device and two or more resistive memory cells. Each memory cell is coupled to a rectifying device to prevent parallel leak current from flowing through non-selected memory cells. In an array of resistive memory bit structures, resistive memory cells from different memory bit structures are stacked and share rectifying devices.

Claims (9)

1. A method of fabricating a resistive memory structure, the method comprising:

forming an access device with a source, drain and gate, the source and drain being doped to a first dopant type;

depositing inter-level dielectrics on top of the access device;

etching a via through the inter-level dielectrics to either the doped source or drain;

doping a bottom of the via with a second dopant type to form a rectifying device at the bottom of the via, wherein doping the bottom of each via results in a doped region shared by more than one via;

filling the via; and

forming a resistive memory cell above the via so that the cell is electrically coupled to the access device through the via and the rectifying device.

2. The method of claim 1 , wherein more than one rectifying device is formed within the source or drain of the access device.

3. The method of claim 1 , wherein the rectifying device formed is either a p-n junction diode or a Schottky diode.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 1, 2016
From: MICRON TECHNOLOGY, INC
To: OVONYX MEMORY TECHNOLOGY, LLC
Reel/Frame 039974/0496 →