Packaged device and producing method thereof
A packaged device includes a device substrate and a packaging unit. The device substrate includes a first surface and a device formed in the device substrate. The packaging unit includes an insulating layer which faces the device substrate. The insulating layer includes a second surface bonded to the first surface. A metal concentration of at least part of a peripheral surface in the insulating layer is higher than a metal concentration of an end surface on the device substrate side in the insulating layer. An outline of the first surface is retreated inward from an outline of the second surface.
1. A packaged device comprising:
a device substrate including a first surface and a device formed in the device substrate; and
a packaging unit including an insulating layer facing the device substrate, the insulating layer including a second surface bonded to the first surface,
wherein a metal concentration of at least part of a peripheral surface in the insulating layer is higher than a metal concentration of an end surface of the insulating layer on a side facing the device substrate, and an outline of the first surface is retreated inward from an outline of the second surface,
wherein the device substrate includes a third surface facing a portion of the second surface, the portion not being in contact with the first surface and being located at an inward-retreated portion of the first surface from the outline of the second surface.
2. The packaged device according to claim 1 , wherein a length by which the outline of the first surface is retreated inward from the outline of the second surface is 10 μm or more.
3. The packaged device according to claim 1 , wherein the device substrate includes a partial structure including a fourth surface bonded to the second surface, and
an outline of the fourth surface is retreated inward from the outline of the second surface.
4. The packaged device according to claim 3 , wherein a length by which the outline of the third surface is retreated inward from the outline of the second surface is 10 μm or more.
5. The packaged device according to claim 1 , wherein the insulating layer has a thickness of 50 nm or more.
6. A method for fabricating a packaged device comprising:
preparing a device substrate including a first surface and a device formed in the device substrate;
preparing a packaging unit including an insulating layer with a second surface to be bonded to the first surface; and
bonding the first surface and the second surface by a room-temperature bonding method,
wherein the first surface and the second surface are bonded to each other such that an outline of the first surface is retreated inward from an outline of the second surface,
wherein the device substrate includes a third surface facing a portion of the second surface, the portion not being in contact with the first surface and being located at an inward-retreated portion of the first surface from the outline of the second surface.
7. The method according to claim 6 , wherein a length by which the outline of the first surface is retreated inward from the outline of the second surface is 10 μm or more.
8. The method according to claim 6 , wherein the insulating layer has a thickness of 50 nm or more.