Substrate processing apparatus and substrate processing method

1. A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device that applies exposure processing to the substrate by a liquid immersion method, and includes first, second and third processing units, comprising the steps of:

forming a photosensitive film made of a photosensitive material on an upper surface of the substrate by said first processing unit before the exposure processing by said exposure device;

rotating the substrate about a vertical axis while holding the substrate substantially horizontally in said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device;

supplying a washing liquid onto the photosensitive film, formed on the upper surface of the substrate being rotated in said second processing unit;

forming a liquid layer of the washing liquid having an upper surface that is exposed to atmosphere and in a free state, on the photosensitive film formed on the upper surface of the substrate by adjusting a rotation speed of the substrate in said second processing unit, the liquid layer of the washing liquid being formed to cover the entire upper surface of the substrate;

stopping the supply of the washing liquid after forming the liquid layer of the washing liquid;

supplying an inert gas from a nozzle for drying processing to a center of the liquid layer on the photosensitive film on the substrate such that the washing liquid at the center of the photosensitive film on the substrate is moved to a peripheral portion of the substrate in said second processing unit while the upper surface of the liquid layer on the photosensitive film on the substrate is exposed to atmosphere and is in a free state, after the supply of the washing liquid is stopped, an opening formed in the liquid layer being enlarged by a centrifugal force without the nozzle for drying processing being moved;

removing the liquid layer on the photosensitive film on the substrate by increasing the rotation speed of the substrate after the opening formed in the liquid layer is enlarged such that the liquid layer is present only on the peripheral portion of the substrate;

transporting the substrate after the washing processing to said exposure device;

transporting the substrate from said exposure device; and

applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.

2. The substrate processing method according to claim 1 , wherein

said substrate processing apparatus further comprises a first transport unit including first and second holders,

said step of transporting the substrate to said exposure device includes the step of holding and transporting the substrate with said first holder of said first transport unit to said exposure device, and

said step of transporting the substrate from said exposure device includes the step of holding and transporting the substrate from said exposure device with said second holder of said first transport unit.

3. The substrate processing method according to claim 2 , wherein

said step of holding and transporting the substrate from said exposure device includes the step of holding and transporting the substrate with said second holder that is provided below said first holder.

4. The substrate processing method according to claim 2 , wherein

said substrate processing apparatus further includes a second transport unit and a platform,

said method further comprises the step of transporting the substrate by said second transport unit after the washing processing by said second processing unit and before the exposure processing by said exposure device to said platform, and

said step of holding and transporting the substrate to said exposure device includes the step of holding and transporting the substrate before the exposure processing, mounted on said platform, with said first holder of said first transport unit to said exposure device.

5. The substrate processing method according to claim 4 , wherein

said step of holding and transporting the substrate from said exposure device includes the step of holding and transporting the substrate after the exposure processing by said exposure device from said exposure device to said platform with said second holder of said first transport unit, and

said method further includes the step of transporting the substrate after the exposure processing, mounted on said platform, by said second transport unit.

6. The substrate processing method according to claim 5 , wherein

said second transport unit includes third and fourth holders,

said step of transporting the substrate before the exposure processing to said platform by said second transport unit includes the step of holding and transporting the substrate after the washing processing by said second processing unit and before the exposure processing by said exposure device to said platform, with said third holder of said second transport unit, and

said step of transporting the substrate after the exposure processing by said second transport unit includes the step of holding and transporting the substrate after the exposure processing, mounted on said platform, with said fourth holder of said second transport unit.

7. The substrate processing method according to claim 6 , wherein

said step of transporting the substrate after the exposure processing by said second transport unit includes the step of holding and transporting the substrate after the exposure processing, mounted on said platform, with said fourth holder provided below said third holder of said second transport unit.

8. The substrate processing method according to claim 7 , wherein

said platform includes first and second substrate platforms,

said step of transporting the substrate before the exposure processing to said platform by said second transport unit includes the step of holding and transporting the substrate after the washing processing by said second processing unit and before the exposure processing by said exposure device to said first substrate platform, with said third holder of said second transport unit,

said step of transporting the substrate before the exposure processing, mounted on said platform to said exposure device includes the step of holding and transporting the substrate mounted on said first substrate platform to said exposure device, with said first holder of said first transport unit,

said step of transporting the substrate after the exposure processing from said exposure device to said platform includes the step of transporting the substrate after the exposure processing from said exposure device to said second substrate platform by said second holder of said first transport unit, and

said step of transporting the substrate after the exposure processing, mounted on said platform includes the step of holding and transporting the substrate after the exposure processing, mounted on said second substrate platform, with said fourth holder of said second transport unit.

9. The substrate processing method according to claim 8 , wherein:

said substrate processing apparatus further includes a fourth processing unit, and

said step of holding and transporting the substrate before the exposure processing to said first substrate platform, with said third holder of said second transport unit includes the steps of:

transporting the substrate after the washing processing by said second processing unit and before the exposure processing by said exposure device to said fourth processing unit, by said third holder of said second transport unit,

applying given processing to the substrate before the exposure processing, transported by said second transport unit, by said fourth processing unit, and

transporting the substrate after the processing by said fourth processing unit to said second substrate platform by said third holder of said second transport unit.

10. The substrate processing method according to claim 9 , wherein

said step of applying the given processing by said fourth processing unit includes the step of subjecting a peripheral portion of the substrate to exposure by said fourth processing unit.

11. The substrate processing method according to claim 1 , wherein

said substrate processing apparatus further includes a fifth processing unit, and

said method further includes the step of forming an anti-reflection film on the substrate by said fifth processing unit before the formation of said photosensitive film by said first processing unit.

12. The substrate processing method according to claim 1 , wherein

said step of supplying the inert gas includes the step of increasing the rotation speed of the substrate and moving a nozzle that discharges the inert gas to the liquid layer on the photosensitive film on the substrate from above the center of the substrate to above the peripheral portion of the substrate.

13. The substrate processing method according to claim 1 , wherein said step of supplying the inert gas includes the steps of:

bringing a shield plate having an opening through a center thereof close to an upper surface of the photosensitive film on the substrate; and

supplying the inert gas to clearance between the photosensitive film on the substrate and the shield plate from said opening of the shield plate with the shield plate brought close to the upper surface of the photosensitive film on the substrate.

14. The substrate processing method according to claim 1 , further comprising the step of applying thermal processing to the photosensitive film on the substrate after the formation of the photosensitive film by said first processing unit and before the washing processing by said second processing unit.

15. A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device that applies exposure processing to the substrate by a liquid immersion method, and includes first, second and third processing units, comprising the steps of:

forming a photosensitive film made of a photosensitive material on an upper surface of the substrate by said first processing unit before the exposure processing by said exposure device;

applying thermal processing to the photosensitive film formed on the upper surface of the substrate after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device;

rotating the substrate about a vertical axis while holding the substrate substantially horizontally in said second processing unit after the formation of said photosensitive film by said first processing unit after the thermal processing and before the exposure processing by said exposure device;

supplying a washing liquid onto the photosensitive film formed on the upper surface of the substrate being rotated in said second processing unit;

forming a liquid layer of the washing liquid having an upper surface that is exposed to atmosphere and is in a free state, on a dried surface of the photosensitive film formed on the upper surface of the substrate by adjusting a rotation speed of the substrate in said second processing unit, the liquid layer of the washing liquid being formed to cover the entire upper surface of the substrate;

stopping the supply of the washing liquid after forming the liquid layer of the washing liquid;

supplying an inert gas from a nozzle for drying processing to a center of the liquid layer on the photosensitive film on the substrate such that the washing liquid at the center of the photosensitive film on the substrate is moved to a peripheral portion of the substrate in said second processing unit while the upper surface of the liquid layer on the photosensitive film on the substrate is exposed to atmosphere and is in a free state, after the supply of the washing liquid is stopped, an opening formed in the liquid layer being enlarged by a centrifugal force without the nozzle for drying processing being moved;

removing the liquid layer on the photosensitive film on the substrate by increasing the rotation speed of the substrate after the opening formed in the liquid layer is enlarged such that the liquid layer is present only on the peripheral portion of the substrate;

transporting the substrate after the washing processing to said exposure device;

transporting the substrate from said exposure device; and

applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.

16. The substrate processing method according to claim 15 , wherein

said substrate processing apparatus further includes a fourth processing unit, and

said method further includes the step of forming an anti-reflection film on the substrate by said fourth processing unit before the formation of said photosensitive film by said first processing unit.

17. The substrate processing method according to claim 15 , wherein

said step of supplying the inert gas includes the step of increasing the rotation speed of the substrate and moving a nozzle that discharges the inert gas to the liquid layer on the photosensitive film on the substrate from above the center of the substrate to above the peripheral portion of the substrate.

18. The substrate processing method according to claim 15 , wherein said step of supplying the inert gas includes the steps of:

bringing a shield plate having an opening through a center thereof close to an upper surface of the photosensitive film on the substrate; and

supplying the inert gas to clearance between the photosensitive film on the substrate and the shield plate from said opening of the shield plate with the shield plate brought close to the upper surface of the photosensitive film on the substrate.