Semiconductor device and method for manufacturing same
View Patent ↗A semiconductor device includes: a semiconductor structure unit; an interconnect layer provided on the major surface side of the semiconductor structure unit; an electrode pad provided on a surface of the interconnect layer on a side opposite to a surface on which the semiconductor structure unit is provided, and the electrode pad electrically connected to the interconnect layer; a plurality of metal pillars joined to the electrode pad separately from each other; and an external terminal provided commonly at tips of the plurality of metal pillars, the metal pillars having an area in a plan view smaller than an area in a plan view of the external terminal.
1. A semiconductor device comprising:
a semiconductor structure unit including a major surface;
an interconnect layer provided on the major surface side of the semiconductor structure unit;
an electrode pad provided on a surface of the interconnect layer on a side opposite to a surface on which the semiconductor structure unit is provided, and the electrode pad electrically connected to the interconnect layer;
a plurality of metal pillars joined to the electrode pad separately from each other; and
an external terminal provided commonly at tips of the plurality of metal pillars,
the metal pillars having an area in a plan view smaller than an area in a plan view of the external terminal,
wherein the semiconductor structure unit includes a light-emitting layer.
2. The device according to claim 1 , wherein a pad commonly connected to the plurality of metal pillars is provided at the tips of the metal pillars, and the external terminal is joined to the pad.
3. The device according to claim 1 , wherein the tips of the plurality of metal pillars are entered into the external terminal, and the external terminal covers a periphery of the tips of the plurality of metal pillars.
4. The device according to claim 3 , wherein the metal pillars are made of a material having a higher coefficient of thermal conductivity than the external terminal.
5. The device according to claim 1 , wherein a periphery of the metal pillars is covered with a resin.
6. The device according to claim 1 , wherein the plurality of metal pillars are laid out equally in a planar direction of the corresponding electrode pad.
7. A method for manufacturing a semiconductor device comprising:
forming an interconnect layer on a major surface of a semiconductor structure unit;
forming an electrode pad on a surface of the interconnect layer on a side opposite to a surface on which the semiconductor structure unit is provided;
forming an insulating member covering the electrode pad;
forming a plurality of holes penetrating through the insulating member to reach the electrode pad in the insulating member;
forming metal pillars in the holes; and
providing an external terminal commonly joined to tips of the plurality of metal pillars and the external terminal having an area in a plan view larger than an area in a plan view of each of the metal pillars.
8. The method according to claim 7 , wherein
the forming the metal pillars includes forming the metal pillars so that the tips of the metal pillars are protruded from the insulating member, and
the providing the external terminal includes providing the external terminal so that the external terminal covers the protruding metal pillars.
9. The method according to claim 7 , wherein
the forming the metal pillars includes forming a metal film on an exposed surface of the insulating member including inside of the holes by plating.
10. The method according to claim 9 , wherein, after forming the metal film, selective pattern plating is performed to form the external terminal at a portion opposed to the metal pillars.
11. The method according to claim 9 , wherein a portion of the metal film opposed to the electrode pad via the metal pillars is formed in a plate shape.
12. The method according to claim 7 , wherein pattern plating is performed in a state where a plating resist is selectively formed on a surface of the insulating member to form the metal pillars in the holes.
13. The method according to claim 12 , wherein
the forming the plating resist includes:
forming a resist film over a substantially entire surface of the insulating member; and
forming an opening communicating with the holes at a portion of the resist film opposed to the holes, and
the metal pillars are formed also in the opening of the resist film.
14. The method according to claim 13 , wherein, after forming the metal pillars, plating solution is changed to perform plating while leaving the plating resist to form the external terminal at the tips of the metal pillars.
15. The method according to claim 13 , wherein
the forming the metal pillars includes:
forming the metal pillars in the holes and in the opening so that the tips of the metal pillars exist within the opening; and
removing the plating resist to protrude the tips of the metal pillars from the insulating member.
16. The method according to claim 14 , wherein, after forming the external terminal, the plating resist is removed and the external terminal is melted to adhere the external terminal also to a periphery of the tips of the plurality of metal pillars.
17. The method according to claim 7 , including forming a semiconductor layer including a light-emitting layer on a substrate as the semiconductor structure unit.
18. The method according to claim 17 , including:
forming a dividing trench penetrating through the insulating member, the interconnect layer, and the semiconductor layer to reach the substrate; and
removing the substrate after forming the external terminal.
19. The method according to claim 18 , wherein an interface between the substrate and the semiconductor layer is irradiated with laser light to separate the substrate and the semiconductor layer.