Antireflective compositions and methods of using same
View Patent ↗A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, wherein U 1 and U 2 are independently a C 1 -C 10 alkylene group; V is selected from a C 1 -C 10 alkylene, arylene and aromatic alkylene; W is selected from H, C 1 -C 10 alkyl, aryl, alkylaryl and V—OH; Y is selected from H, W, and U 3 C(O)OW, wherein U 3 is independently a C 1 -C 10 alkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes.
1. An antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, and (c) at least one polymer,
wherein U 1 and U 2 are independently a C 1 -C 10 alkylene group; V is selected from a C 1 -C 10 alkylene, arylene and aromatic alkylene; W is selected from H, alkyl, aryl, alkylaryl and V—OH; Y is selected from H, W, and U 3 C(O)OW, wherein U 3 is independently a C 1 -C 10 alkylene group, and m is 1.
2. The antireflective coating composition of claim 1 , where the polymer is a crosslinker polymer.
3. The antireflective coating composition of claim 1 , where the polymer is a crosslinkable polymer.
4. The antireflective coating composition of claim 1 , further comprising a crosslinker.
5. The antireflective coating composition of claim 1 , where the polymer is polymeric glycoluril.
6. The antireflective coating composition of claim 1 , wherein the thermal acid generator is selected from iodonium salts, tosylates, derivatives of benzene sulfonic acid salts, and derivatives of naphthalene sulfonic acid salts.
7. The antireflective coating composition of claim 4 , wherein the crosslinker is selected from melamines, methylols, glycolurils, polymeric glycolurils, hydroxy alkyl amides, epoxy and epoxy amine resins, blocked isocyanates, and divinyl monomers.
8. The antireflective coating composition of claim 1 , wherein the refractive index value of the composition at 0.193 nm is 1.9 or above.
9. The antireflective coating composition of claim 1 , wherein the refractive index value of the composition at 193 nm is in the range of about of 1.9 to about 2.0.
10. The antireflective coating composition of claim 1 , wherein the refractive index value of the composition at 193 nm is at about 1.91, 1.92, 1.93, 1.94, 1.95, 1.96 or 1.97.
11. The antireflective coating composition of claim 1 , where the absorption parameter k value as measured by ellipsometry is in the range of about 0.2 to about 0.7.
12. A process for forming an image on a photoresist comprising:
(a) coating and baking a substrate with the anti-reflective coating composition of claim 1 ;
(b) coating and baking a layer of photoresist film on top of the anti-reflective coating;
(c) image-wise exposing the photoresist with exposure equipment to radiation;
(d) developing an image in the photoresist; and
(e) optionally, baking the substrate after the exposing step.
13. The process of claim 12 , where the photoresist is image-wise exposed at wavelengths between 13 nm to 250 nm.
14. The process of claim 12 , where the photoresist is image-wise exposed at a wavelength of 193 nm.
15. The process of claim 12 , where the antireflective coating is baked at temperatures greater than 90 C and less than 300° C.