IP Library Granted Patent US 8,373,097
Granted Patent B2
US 8,373,097 · App. 12/713,982 · Granted Feb 12, 2013

Apparatus for thermally processing substrate

Inventors: Heung-Yeol Na (Yongin, KR); Min-Jae Jeong (Yongin, KR); Jong-Won Hong (Yongin, KR); Eu-Gene Kang (Yongin, KR); Seok-Rak Chang (Yongin, KR); Ki-Yong Lee (Yongin, KR); Jin-Wook Seo (Yongin, KR); Tae-Hoon Yang (Yongin, KR); Yun-Mo Chung (Yongin, KR); Byung-Soo So (Yongin, KR); Byoung-Keon Park (Yongin, KR); Dong-Hyun Lee (Yongin, KR); Kil-Won Lee (Yongin, KR); Won-Bong Baek (Yongin, KR); Jong-Ryuk Park (Yongin, KR); Bo-Kyung Choi (Yongin, KR); Ivan Maidanchuk (Yongin, KR); Jae-Wan Jung (Yongin, KR)
Assignee: Samsung Display Co., Ltd.
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Quick Facts
Patent No.
US 8,373,097
App. No.
12/713,982
Granted
Feb 12, 2013
Kind
B2
Abstract

An apparatus for thermally processing a plurality of substrates including a process chamber into which a boat having a plurality of substrates stacked thereon is loaded, and a heater chamber separate from the process chamber and having a plurality of heaters to apply heat to the process chamber. Here, the heaters are installed to correspond to all sides of the plurality of substrates. Therefore, it is possible to minimize a temperature distribution in the process chamber and uniformly supply heat to the entire region of the plurality of substrates.

Claims (24)

1. An apparatus for thermally processing a plurality of substrates, comprising:

a process chamber configured to receive a boat having a plurality of stacked substrates; and

a heater chamber enclosing the process chamber, the heater chamber comprising a plurality of heaters to apply heat to the process chamber, the plurality of heaters being disposed to correspond to all sides of the plurality of substrates,

wherein the plurality of substrates have a rectangular shape comprising four sides and four corners, and distances from peripheries of the substrates to the plurality of heaters are equal to each other with respect to a center of each one of the plurality of substrates,

wherein the process chamber has a tubular shape, and

wherein at least one of the plurality of heaters located on edges of the process chamber have a semicircular shape and a remaining plurality of heaters located on sides of the process chamber have a rectangular shape.

2. The apparatus of claim 1 , wherein distances from a periphery of each one of the plurality of substrates to each one of the plurality of heaters disposed corresponding to all sides of the plurality of substrates are equal to each other with respect to a center of each one of the plurality substrates.

3. The apparatus of claim 1 , wherein the plurality of heaters are divided in a longitudinal direction of the heater chamber.

4. The apparatus of claim 3 , wherein the plurality of heaters are installed at an upper part, a center part and a lower part of the heater chamber.

5. The apparatus of claim 1 , wherein the plurality of heaters are elongated in a longitudinal direction of the heater chamber.

6. The apparatus of claim 1 , further comprising a temperature measurement part to measure a temperature in the process chamber,

wherein the temperature measurement part comprises detection sensors disposed on an inner wall of the process chamber and a control unit connected to the detection sensors and controlling operations of the plurality of heaters.

7. The apparatus of claim 6 , wherein the temperature measurement part further comprises a display part connected to the control unit to display the temperature of the process chamber measured by the detection sensors.

8. The apparatus of claim 6 , wherein the detection sensors are installed at an upper part, a center part, and a lower part of the process chamber.

9. The apparatus of claim 1 , wherein the plurality of heaters are disposed in the heater chamber or on an inner wall of the heater chamber.

10. The apparatus of claim 1 , wherein the plurality of heaters are grouped to correspond to the four sides and the four corners of the plurality of substrates.

11. An apparatus for thermally processing a plurality of substrates, the apparatus comprising:

a heater chamber comprising a plurality of heaters disposed thereon; and

a process chamber configured to receive a boat having a plurality of substrates placed inside the heater chamber, wherein distances between a periphery of each one of the plurality of substrates and a periphery of each one of the plurality of heaters disposed on the heater chamber is equal with respect to a center of each one of the plurality of substrates,

wherein the plurality of substrates have a rectangular shape comprising four sides and four corners, and

wherein the process chamber has a tubular shape, the heaters located on edges of the process chamber have a semicircular shape, and the heaters located on sides of the process chamber have a rectangular shape.

12. The apparatus of claim 11 , wherein the plurality of heaters are divided in a longitudinal direction of the heater chamber.

13. The apparatus of claim 11 , wherein the plurality of heaters are disposed on an upper part, a center part, and a lower part of the heater chamber.

14. The apparatus of claim 11 , wherein the plurality of heaters are elongated in a longitudinal direction of the heater chamber.

Assignments (2)
MERGER Recorded Aug 29, 2012
From: SAMSUNG MOBILE DISPLAY CO., LTD.
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 028868/0413 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 26, 2010
From: NA, HEUNG-YEOL; JEONG, MIN-JAE; HONG, JONG-WON; KANG, EU-GENE; CHANG, SEOK-RAK; LEE, KI-YONG; SEO, JIN-WOOK; YANG, TAE-HOON; CHUNG, YUN-MO; SO, BYUNG-SOO; PARK, BYOUNG-KEON; LEE, DONG-HYUN; LEE, KIL-WON; BAEK, WON-BONG; PARK, JONG-RYUK; CHOI, BO-KYUNG; MAIDANCHUK, IVAN; JUNG, JAE-WAN
To: SAMSUNG MOBILE DISPLAY CO., LTD.
Reel/Frame 024003/0778 →
Priority Claims (1)
KR 10-2009-0103683 · Oct 29, 2009 · national
Continuity (1)
Related Publication 20110100973A1 · May 5, 2011