Method of inspecting defects in circuit pattern of substrate
View Patent ↗Disclosed herein is a method of inspecting defects in a circuit pattern of a substrate. At least one laser beam radiation unit for radiating a laser beam onto an inspection target circuit pattern of a substrate in a non-contact manner is prepared. A probe beam radiation unit for radiating a probe beam onto a connection circuit pattern to be electrically connected to the inspection target circuit pattern in a non-contact manner is prepared. The laser beam is radiated onto the inspection target circuit pattern using the laser beam radiation unit. The probe beam is radiated onto the connection circuit pattern using the probe beam radiation unit, thus measuring information about whether the probe beam is diffracted, and a diffraction angle. Accordingly, the method can solve problems such as erroneous measurements caused by contact pressure and can reduce the time required for measurements.
1. A method of inspecting defects in a circuit pattern of a substrate in a non contact manner, comprising:
preparing at least one laser beam radiation unit for radiating a laser beam onto an inspection target circuit pattern of a substrate in a non-contact manner;
preparing a probe beam radiation unit for radiating a probe beam onto a connection circuit pattern, wherein, the connection circuit pattern is supposed to be electrically connected to the inspection target circuit pattern through a via that passes through an inner layer of the substrate between the inspect target circuit pattern and the connection circuit pattern;
radiating the laser beam onto the inspection target circuit pattern using the laser beam radiation unit, the radiating of the laser beam causing first surface acoustic waves to be generated on the inspection target circuit pattern's surface, and, if the via connects the inspection target circuit pattern to the connection circuit pattern, acoustic energy propagates through the via to generate second surface acoustic waves on the connection circuit pattern's surface; and
radiating the probe beam onto the connection circuit pattern using the probe beam radiation unit, and, if the via connects the inspection target circuit pattern to the connection circuit pattern, then, the second surface acoustic waves on the connection circuit pattern's surface causes detectable variation of a diffraction angle of the probe beam, and, to determine in a non contact manner whether the via connects the inspection target circuit pattern to the connection circuit pattern, measuring information about whether the probe beam is diffracted, and a diffraction angle of the probe beam.
2. The method as set forth in claim 1 , wherein the substrate is a printed circuit board or a semiconductor wafer.
3. The method as set forth in claim 1 , wherein the laser beam radiation unit comprises a plurality of laser beam radiation units, thus radiating laser beams onto one location of the inspection target circuit pattern of the substrate so that the laser beams meet at the location.
4. The method as set forth in claim 1 , wherein the laser beam radiated by the laser beam radiation unit is a femtosecond laser beam.