IP Library Granted Patent US 8,174,890
Granted Patent B2
US 8,174,890 · App. 12/721,001 · Granted May 8, 2012

Non-volatile semiconductor storage device

Assignee: Kabushiki Kaisha Toshiba
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Quick Facts
Patent No.
US 8,174,890
App. No.
12/721,001
Granted
May 8, 2012
Kind
B2
Abstract

A memory cell array has plural memory strings arranged therein, each of which including a plurality of electrically-rewritable memory transistors and selection transistors. Each memory string includes a body semiconductor layer including four or more columnar portions, and a joining portion formed to join the lower ends thereof. An electric charge storage layer is formed to surround a side surface of the columnar portions. A first conductive layer is formed to surround a side surface of the columnar portions as well as the electric charge storage layer. A plurality of second conductive layers are formed on side surfaces of the joining portion via an insulation film, and function as control electrodes of a plurality of back-gate transistors formed at a respective one of the joining portions.

Claims (54)

1. A non-volatile semiconductor storage device comprising:

a memory cell array including a plurality of memory strings arranged therein, each of the memory strings including a plurality of electrically rewritable memory transistors and selection transistors operative to select the memory transistors; and

a control unit configured to control voltage supplied to respective control electrodes of the memory transistors and the selection transistors,

each of the memory strings comprising:

a body semiconductor layer including four or more columnar portions extending in a vertical direction to a substrate, and a joining portion formed to join the lower ends of the columnar portions;

an electric charge storage layer formed to surround a side surface of a respective one of the columnar portions;

a first conductive layer formed to surround a side surface of a respective one of the columnar portions as well as the electric charge storage layer, and functioning as a control electrode of a respective one of the memory transistors; and

a plurality of second conductive layers formed on a side surface of the joining portion via an insulation film, and functioning as control electrodes of a plurality of back-gate transistors formed at a respective one of the joining portions.

2. The non-volatile semiconductor storage device according to claim 1 , wherein

in reading data from one of the memory transistors,

the control unit controls conduction states of the selection transistors and the back-gate transistors so that a reading current flows through one of the columnar portions including a selected one of the memory transistors, the joining portion, and through a plurality of the columnar portions other than the columnar portion including the selected memory transistor, in parallel.

3. The non-volatile semiconductor storage device according to claim 2 , wherein

the number of the columnar portions in one of the memory string is an even number, and wherein

one half of a plurality of the columnar portions connected to a respective one of the joining portions are connected to a bit line, and the remaining half of the columnar portions are connected to a source line.

4. The non-volatile semiconductor storage device according to claim 3 , wherein

when one of the memory transistors formed in the columnar portions connected to the bit line is selected to read data therefrom, the control unit switches one of the selection transistors to a conductive state that is formed in one of the columnar portions including the selected memory transistor, and maintains the other selection transistors in non-conductive states that are formed in the other columnar portions connected to the bit line, while switching a plurality of the selection transistors to conductive states that are formed in a plurality of the columnar portions connected to the source line, whereas

when one of the memory transistors formed the columnar portions connected to the source line is selected to read data therefrom, the control unit switches one of the selection transistors to a conductive state that is formed in one of the columnar portions including the selected memory transistor, and maintains the other selection transistors in non-conductive states that are formed in the other columnar portions connected to the source line, while switching a plurality of the selection transistors to conductive states that are formed in a plurality of the columnar portions connected to the bit line.

5. The non-volatile semiconductor storage device according to claim 3 , wherein

when one of the memory transistors formed in the columnar portions connected to the bit line is selected to write data thereto, the control unit switches one of the selection transistors to a conductive state that is formed in a first columnar portion including the selected memory transistor, maintains one of the selection transistors in non-conductive states that is formed in a second columnar portion, the second columnar portion being adjacent to the first columnar portion and connected to the source line, and controls conduction states of the back-gate transistors so that the first columnar portion is electrically connected to the second columnar portion, and so that the other columnar portions are electrically disconnected from the first columnar portion, whereas

when one of the memory transistors formed in the columnar portions connected to the source line is selected to write data thereto, the control unit switches one of the selection transistors to a conductive state that is formed in a fourth columnar portion, the fourth columnar portion being adjacent to a third columnar portion and connected to the bit line, the third columnar portion including the selected memory transistor, maintains one of the selection transistors in non-conductive states that is formed in the third columnar portion, and controls conduction states of the back-gate transistors so that the third columnar portion is electrically connected to the fourth columnar portion, and so that the other columnar portions are electrically disconnected from the third columnar portion.

6. The non-volatile semiconductor storage device according to claim 1 , wherein

the number of the columnar portions in one of the memory string is an even number, and wherein

one half of a plurality of the columnar portions connected to a respective one of the joining portions are connected to a bit line, and the remaining half of the columnar portions are connected to a source line.

7. The non-volatile semiconductor storage device according to claim 1 , wherein

when one of the memory transistors formed in the columnar portions connected to a bit line is selected to read data therefrom, the control unit switches one of the selection transistors to a conductive state that is formed in one of the columnar portions including the selected memory transistor, and maintains the other selection transistors in non-conductive states that are formed in the other columnar portions connected to the bit line, while switching a plurality of the selection transistors to conductive states that are formed in a plurality of the columnar portions connected to a source line, whereas

when one of the memory transistors formed in the columnar portions connected to the source line is selected to read data therefrom, the control unit switches one of the selection transistors to a conductive state that is formed in one of the columnar portions including the selected memory transistor, and maintains the other selection transistors in non-conductive states that are formed in the other columnar portions connected to the source line, while switching a plurality of the selection transistors to conductive states that are formed in a plurality of the columnar portions connected to the bit line.

8. The non-volatile semiconductor storage device according to claim 1 , wherein

when one of the memory transistors formed in the columnar portions connected to a bit line is selected to write data thereto, the control unit switches one of the selection transistors to a conductive state that is formed in a first columnar portion including the selected memory transistor, maintains one of the selection transistors in non-conductive states that is formed in a second columnar portion, the second columnar portion being adjacent to the first columnar portion and connected to a source line, and controls conduction states of the back-gate transistors so that the first columnar portion is electrically connected to the second columnar portion, and so that the other columnar portions are electrically disconnected from the first columnar portion, whereas

when one of the memory transistors formed in the columnar portions connected to the source line is selected to write data thereto, the control unit switches one of the selection transistors to a conductive state that is formed in a fourth columnar portion, the fourth columnar portion being adjacent to a third columnar portion and connected to the bit line, the third columnar portion including the selected memory transistor, maintains one of the selection transistors in non-conductive states that is formed in the third columnar portion, and controls conduction states of the back-gate transistors so that the third columnar portion is electrically connected to the fourth columnar portion, and so that the other columnar portions are electrically disconnected from the third columnar portion.

9. The non-volatile semiconductor storage device according to claim 1 , wherein

adjacent two of the columnar portions are configured to share the first conductive layer.

10. The non-volatile semiconductor storage device according to claim 9 , wherein

the number of the columnar portions in one of the memory string is an even number, and wherein

one half of a plurality of the columnar portions connected to a respective one of the joining portions are connected to a bit line, and the remaining half of the columnar portions are connected to a source line.

11. The non-volatile semiconductor storage device according to claim 1 , wherein

the number of the columnar portions connected to a respective one of the joining portions is a power of two.

12. The non-volatile semiconductor storage device according to claim 11 , wherein

in reading data from one of the memory transistors,

the control unit controls conduction states of the selection transistors and the back-gate transistors so that a reading current flows through one of the columnar portions including a selected one of the memory transistors and the joining portion, and through a plurality of the columnar portions other than the columnar portion including the selected memory transistor, in parallel.

13. The non-volatile semiconductor storage device according to claim 11 , wherein

the number of the columnar portions in one of the memory string is an even number, and wherein

one half of a plurality of the columnar portions connected to a respective one of the joining portions are connected to a bit line, and the remaining half of the columnar portions are connected to a source line.

14. The non-volatile semiconductor storage device according to claim 11 , wherein

when one of the memory transistors formed in the columnar portions connected to the bit line is selected to read data therefrom, the control unit switches one of the selection transistors to a conductive state that is formed in one of the columnar portions including the selected memory transistor, and maintains the other selection transistors in non-conductive states that are formed in the other columnar portions connected to the bit line, while switching a plurality of the selection transistors to conductive states that are formed in a plurality of the columnar portions connected to the source line, whereas

when one of the memory transistors formed in the columnar portions connected to the source line is selected to read data therefrom, the control unit switches one of the selection transistors to a conductive state that is formed in one of the columnar portions including the selected memory transistor, and maintains the other selection transistors in non-conductive states that are formed in the other columnar portions connected to the source line, while switching a plurality of the selection transistors to conductive states that are formed in a plurality of the columnar portions connected to the bit line.

15. The non-volatile semiconductor storage device according to claim 1 , wherein

the number of the columnar portions connected to a respective one of the joining portions is four.

16. The non-volatile semiconductor storage device according to claim 15 , wherein

among the four columnar portions, first and fourth columnar portions connected to respective ends of the joining portion are connected to a source line, and second and third columnar portions are connected to a bit line.

17. The non-volatile semiconductor storage device according to claim 16 , wherein

first and second back-gate transistors are formed at respective positions of the joining portion between the second and third columnar portions, the first back-gate transistor being switched to a conductive state by a first signal, and the second back-gate transistor being switched to a conductive state by a second signal, and

third and fourth back-gate transistors are formed at respective positions of the joining portion between the first and second columnar portions and between the third and fourth columnar portions, respectively, the third back-gate transistor being switched to a conductive state by the first signal, and the fourth back-gate transistor being switched to a conductive state by the second signal.

18. The non-volatile semiconductor storage device according to claim 17 , wherein

the second and third columnar portions are configured to share the first conductive layer.

Assignments (5)
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 24, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043709/0035 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 10, 2010
From: MAEDA, TAKASHI; INABA, TSUNEO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 024059/0134 →
Priority Claims (1)
JP 2009-058538 · Mar 11, 2009 · national
Continuity (1)
Related Publication 20100232224A1 · Sep 16, 2010