System for analyzing a low-pressure gas by optical emission spectroscopy
The object of the invention is a system for analyzing gases which are at a pressure on the order of a secondary vacuum. The system includes a gas ionization device that includes a cathode having conducting walls defining a cylindrical volume and a disc including at least one central through hole, an anode placed substantially at the center of the hole, a plasma source, the plasma being generated in the cylindrical volume by the combined action of an electric field and a magnetic field, orthogonal to the electric field, a system for collecting the light radiation emitted by the plasma, a cylindrical cavity coaxial to the anode having a conductance lower than that of the cylindrical volume and arranged between the ionization device and the collector system, and an analysis device for the ionized gases including an optical spectrometer for analyzing the evolution of the radiating spectrum. Preferably, the end of the cavity opposite the cylindrical volume is closed by a window that is transparent to the light radiation emitted by the plasma.
1. A gas-analyzing system for analyzing gases under pressure on the order of a secondary vacuum, comprising:
a gas-ionization device comprising:
a cathode having conducting walls defining a cylindrical volume and a disc including at least one central through hole;
an anode placed substantially at the centre of the hole; and
a plasma source formed of the anode and the cathode, the plasma being generated in the cylindrical volume by the combined action of an electric field and a magnetic field orthogonal to the electric field;
a system for collecting the light radiation emitted by the plasma;
a cylindrical cavity coaxial to the anode, having a conductance lower than that of the cylindrical volume, arranged between the ionization device and the collecting system; and
an analysis device for the ionized gases including an optical spectrometer for analyzing the evolution of the radiating spectrum.
2. A system according to claim 1 , wherein the cathode comprises a perforated disc comprising peripheral transverse holes surrounding a transverse central hole.
3. A system according to claim 1 , wherein the diameter d of the cavity is less than the diameter D of the cylindrical volume, the diameter d being adjustable depending on the pressure of the gases to be analyzed.
4. A system according to claim 1 , wherein the anode is insulated from the cathode by a mount made of dielectric material inserted in the central hole of the disc of the cathode.
5. System according to claim 4 , further comprising a regulating device making it possible to control the supply voltage of the anode upon variation of pressure of the gases to be analyzed.
6. A system according to claim 1 , wherein the collecting system comprises at least converging lens, whereby the optical axis and the axis of the electrodes are one and the same.
7. A system according to claim 1 , wherein the end of the cavity opposite the cylindrical volume is blocked by a window transparent to the light radiation emitted by the plasma.
8. A system according to claim 1 , wherein the end of the cavity opposite the cylindrical volume is blocked by a lens transparent to the light radiation emitted by the plasma.
9. A system according to claim 1 , wherein the cavity is disposed on the end of the cylindrical volume such that the pathway of the light radiation is in the same direction, opposite the flow of the pumped gases.
10. A plasma-based semiconductor fabrication machine comprising at least one enclosure containing gases kept in a secondary vacuum, connected to a gas-analyzing system comprising:
a gas-ionization device comprising:
a cathode having conducting walls defining a cylindrical volume and a disc including at least one central through hole;
an anode placed substantially at the centre of the hole; and
a plasma source, the plasma being generated in the cylindrical volume by the combined action of an electric field and a magnetic field orthogonal to the electric field;
a system for collecting the light radiation emitted by the plasma;
a cylindrical cavity coaxial to the anode, having a conductance lower than that of the cylindrical volume, arranged between the ionization device and the collector system; and
an analysis device for the ionized gases including an optical spectrometer for analyzing the evolution of the radiating spectrum;
wherein the ionized gas analysis device comprises an optical emission spectrometer associated with a computer, the optical emission spectrometer and the computer being placed within a shared casing so as to constitute a compact integrated control system, and connected to the machine in order to interact with it depending on the results of the gas analysis.