Polysilazane-containing composition capable of forming a dense siliceous film
View Patent ↗The present invention provides a polysilazane-containing composition capable of forming a dense siliceous film more rapidly and at a lower temperature than known polysilazane-containing composition. In a process for forming the siliceous film, the composition comprising a polysilazane compound, a particular amine compound and a solvent is coated on a substrate and converted into a siliceous substance. The particular amine compound preferably contains two amine groups separated from each other at the distance corresponding to five C—C bonds or more, and the amine groups preferably have hydrocarbon substituent groups.
1. A polysilazane-containing composition comprising
a polysilazane compound,
an amine compound represented by the following formula (A):
(wherein
each R A independently represents hydrogen or a hydrocarbon group of C 1 to C 3 under the condition that two R A s connecting to the same nitrogen atom are not hydrogen atoms at the same time,
each of L 1 and L 2 independently represents, —NR A1 — (in which R A1 is hydrogen or a hydrocarbon group of C 1 to C 4 ) or —O—,
each of p1 and p3 is independently an integer of 0 to 4, and
p2 is an integer of 1 to 4),
the following formula (B):
(wherein
each R B independently represents hydrogen or a hydrocarbon group of C 1 to C 4 , and where at least one R B hydrocarbon group is present per nitrogen and,
each of q1 and q2 is independently an integer of 1 to 4),
or the following compounds:
and, a solvent having a vapor pressure of 0.8 kPa or less at 20° C. and capable of dissolving said polysilazane compound and said amine compound.
2. The polysilazane-containing composition according to claim 1 , wherein said solvent comprises (b) a saturated hydrocarbon compound, (c) an alicyclic hydrocarbon compound, (d) an ether or (e) a ketone.
3. The polysilazane-containing composition according to claim 1 , wherein said polysilazane compound is perhydropolysilazane.
4. A process for forming a siliceous film, wherein the polysilazane-containing composition according to claim 1 is coated on a substrate and then converted into a siliceous film.
5. The process according to claim 4 for forming a siliceous film, wherein the conversion into a siliceous film is performed under the conditions of a temperature of 100° C. or below and a relative humidity of 40 to 95%.
6. A siliceous film formed by the process according to claim 4 .
7. The polysilazane-containing composition according to claim 1 wherein the solvent has a vapor pressure of 0.5 kPa or less at 20° C.
8. The polysilazane-containing composition according to claim 1 wherein the amine compound is represented by formula (B):
wherein
each R B independently a hydrocarbon group of C 1 to C 4 , and
each of q1 and q2 is independently an integer of 1 to 4.
9. A process for forming a siliceous film, wherein a polysilazane-containing composition having the following components, is coated on a substrate;
a polysilazane compound,
an amine compound represented by the following formula (A):
(wherein
each R A independently represents hydrogen or a hydrocarbon group of C 1 to C 3 under the condition that two R A s connecting to the same nitrogen atom are not hydrogen atoms at the same time,
each of L 1 and L 2 independently represents —CH 2 —, —NR A1 — (in which R A1 is hydrogen or a hydrocarbon group of C 1 to C 4 ) or —O—,
each of p1 and p3 is independently an integer of 0 to 4, and
p2 is an integer of 1 to 4),
or the following formula (B):
(wherein
each R B independently represents hydrogen or a hydrocarbon group of C 1 to C 4 , and where at least one R B hydrocarbon group is present per nitrogen and,
each of q1 and q2 is independently an integer of 1 to 4), and a solvent having a vapor pressure of 0.8 kPa or less at 20° C. and capable of dissolving said polysilazane compound and said amine compound; and then converted into a siliceous film at room temperature and at a relative humidity of 40 to 95%.