IP Library Granted Patent US 9,222,199
Granted Patent B2
US 9,222,199 · App. 12/748,515 · Granted Dec 29, 2015

Crystal manufacturing apparatus

Inventors: Seiji Sarayama (Miyagi, JP); Hirokazu Iwata (Miyagi, JP)
Assignee: RICOH COMPANY, LTD.
C30B29/403C30B9/10C30B29/406Y10S117/90Y10T117/10Y10T117/1016Y10T117/1024Y10T117/1064
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Quick Facts
Patent No.
US 9,222,199
App. No.
12/748,515
Granted
Dec 29, 2015
Kind
B2
Abstract

A crystal manufacturing apparatus for manufacturing a group III nitride crystal includes a crucible that holds a mixed molten liquid including an alkali metal and a group III metal; a reaction vessel accommodating the crucible in the reaction vessel; a heating device that heats the crucible with the reaction vessel; a holding vessel having a lid that is capable of opening and closing, accommodating the reaction vessel and the heating device in the holding vessel; a sealed vessel accommodating the holding vessel in the sealed vessel, having an operating device that enables opening the lid of the holding vessel for supplying source materials into the crucible and taking out a manufactured GaN crystal under a sealed condition, and closing the lid of the holding vessel that is sealed in the sealed vessel, the sealed vessel including an inert gas atmosphere or a nitrogen atmosphere; and a gas supplying device for supplying a nitrogen gas to the mixed molten liquid through each of the vessels.

Claims (8)

1. A crystal manufacturing method, comprising:

holding a mixed molten liquid that includes an alkali metal and a group III metal in a crucible;

accommodating the crucible in a reaction vessel, and providing the reaction vessel with a lid for sealing the reaction vessel;

using the lid to seal the reaction vessel, and supplying nitrogen gas into the reaction vessel, such that the nitrogen gas is supplied to the mixed molten liquid while the crucible and the nitrogen gas are sealed within the reaction vessel;

positioning a heating device at a predetermined location relative to the reaction vessel and heating the crucible through the reaction vessel; and

accommodating the reaction vessel in a sealed vessel, and supplying source materials into the crucible, and taking out a manufactured group III nitride crystal from the crucible, wherein the supplying the source materials and the taking out the manufactured group III nitride crystal are performed in the sealed vessel without exposing the crucible in the sealed vessel to outside air.

2. The crystal manufacturing method of claim 1 , wherein an atmosphere in the sealed vessel is an inert gas atmosphere or a nitrogen atmosphere.

3. The crystal manufacturing method of claim 1 , wherein the atmosphere in the sealed vessel has a pressure higher than standard atmospheric pressure.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 18, 2020
From: SCIOCS COMPANY LIMITED
To: SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 053526/0021 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 21, 2019
From: RICOH COMPANY, LTD.
To: SCIOCS COMPANY LIMITED
Reel/Frame 048391/0473 →
Priority Claims (2)
JP 2007-056859 · Mar 7, 2007 · national
JP 2007-320289 · Dec 12, 2007 · national
Continuity (2)
Division 12042964 · Mar 5, 2008
Related Publication 20100229787A1 · Sep 16, 2010