Method for forming transparent conductive oxide
Embodiments disclosed herein generally relate to a process of depositing a transparent conductive oxide layer over a substrate. The transparent oxide layer is sometimes deposited onto a substrate for later use in a solar cell device. The transparent conductive oxide layer may be deposited by a “cold” sputtering process. In other words, during the sputtering process, a plasma is ignited in the processing chamber which naturally heats the substrate. No additional heat is provided to the substrate during deposition such as from the susceptor. After the transparent conductive oxide layer is deposited, the substrate may be annealed and etched, in either order, to texture the transparent conductive oxide layer. In order to tailor the shape of the texturing, different wet etch chemistries may be utilized. The different etch chemistries may be used to shape the surface of the transparent conductive oxide and the etch rate.
1. A method, comprising:
forming a transparent conductive oxide layer over a substrate;
etching the formed transparent conductive oxide layer to form a roughened surface, the etching comprising exposing the formed transparent conductive oxide layer to a wet etchant composition selected from the group consisting of:
a mixture of HCl, H 2 O 2 and de-ionized water having a concentration ratio of HCl and H 2 O 2 relative to the de-ionized water of about 0.25 percent to about 10 percent;
a mixture of HCl and de-ionized water having a concentration ratio of HCl relative to the de-ionized water of about 0.25 percent to about 10 percent;
a mixture of HNO 3 and de-ionized water having a concentration ratio of HNO 3 relative to the de-ionized water of about 0.25 percent to about 10 percent; and
a mixture of H 2 SO 4 and de-ionized water having a concentration ratio of H 2 SO 4 relative to the de-ionized water of about 0.25 percent to about 10 percent;
quenching the etched transparent conductive oxide layer by exposing the transparent conductive oxide layer to a basic solution having a pH of greater than about 10; and
annealing the etched transparent conductive oxide layer.
2. The method of claim 1 , wherein forming the transparent conductive oxide layer comprises sputter depositing the transparent conductive oxide layer.
3. The method of claim 1 , further comprising:
depositing a p-doped semiconductor layer over the annealed transparent conductive oxide layer;
depositing an intrinsic semiconductor layer over the p-doped semiconductor layer; and
depositing an n-doped semiconductor layer over the intrinsic semiconductor layer.
4. A method, comprising:
forming a transparent conductive oxide layer over a substrate;
etching the formed transparent conductive oxide layer to form a roughened surface, the etching comprising exposing the formed transparent conductive oxide layer to a wet etchant composition selected from the group consisting of:
a mixture of HCl, H 2 O 2 and de-ionized water having a concentration ratio of HCl and H 2 O 2 relative to the de-ionized water of about 0.25 percent to about 10 percent;
a mixture of HCl and de-ionized water having a concentration ratio of HCl relative to the de-ionized water of about 0.25 percent to about 10 percent;
a mixture of HNO 3 and de-ionized water having a concentration ratio of HNO 3 relative to the de-ionized water of about 0.25 percent to about 10 percent; and
a mixture of H 2 SO 4 and de-ionized water having a concentration ratio of H 2 SO 4 relative to the de-ionized water of about 0.25 percent to about 10 percent;
quenching the etched transparent conductive oxide layer by exposing the transparent conductive oxide layer to a basic solution having a pH of greater than about 10;
rinsing the quenched transparent conductive oxide layer with de-ionized water; and
annealing the etched transparent conductive oxide layer.
5. The method of claim 4 , wherein the quenching comprises spraying the basic solution onto the transparent conductive oxide layer or dipping the transparent conductive oxide layer into the basic solution.
6. The method of claim 5 , wherein the basic solution comprises ammonium hydroxide.
7. The method of claim 5 , wherein the basic solution comprises potassium hydroxide.
8. The method of claim 5 , wherein forming the transparent conductive oxide layer comprises sputter depositing the transparent conductive oxide layer.
9. The method of claim 1 , wherein the annealing comprises:
thermal treating the transparent conductive oxide layer at a first temperature; and
thermal quenching the thermally treated transparent conductive oxide layer at a second temperature lower than the first temperature.
10. A method, comprising:
forming a transparent conductive oxide layer over a substrate;
etching the formed transparent conductive oxide layer to form a roughened surface, the etching comprising exposing the formed transparent conductive oxide layer to a wet etchant composition selected from the group consisting of:
a mixture of HCl, H 2 O 2 and de-ionized water having a concentration ratio of HCl and H 2 O 2 relative to the de-ionized water of about 0.25 percent to about 10 percent;
a mixture of HCl and de-ionized water having a concentration ratio of HCl relative to the de-ionized water of about 0.25 percent to about 10 percent;
a mixture of HNO 3 and de-ionized water having a concentration ratio of HNO 3 relative to the de-ionized water of about 0.25 percent to about 10 percent; and
a mixture of H 2 SO 4 and de-ionized water having a concentration ratio of H 2 SO 4 relative to the de-ionized water of about 0.25 percent to about 10 percent;
annealing the etched transparent conductive oxide layer;
thermal treating the transparent conductive oxide layer at a first temperature; and
thermal quenching the thermally treated transparent conductive oxide layer at a second temperature lower than the first temperature, wherein the thermal quenching comprises reducing the temperature of the thermally treated transparent conductive oxide layer from the first temperature to the second temperature in a substantially oxygen free atmosphere.
11. The method of claim 10 , wherein the thermal quenching further comprises exposing the thermally treated transparent conductive oxide layer to a gas selected from the group consisting of:
N 2 /H 2 mixture;
Ar/H 2 mixture; or
N 2 .
12. The method of claim 11 , wherein forming the transparent conductive oxide layer comprises sputter depositing the transparent conductive oxide layer.
13. A method, comprising:
forming a transparent conductive oxide layer over a substrate;
etching the formed transparent conductive oxide layer to form a roughened surface, the etching comprising exposing the formed transparent conductive oxide layer to a wet etchant composition selected from the group consisting of:
a mixture of HCl, H 2 O 2 and de-ionized water having a concentration ratio of HCl and H 2 O 2 relative to the de-ionized water of about 0.25 percent to about 10 percent;
a mixture of HCl and de-ionized water having a concentration ratio of HCl relative to the de-ionized water of about 0.25 percent to about 10 percent;
a mixture of HNO 3 and de-ionized water having a concentration ratio of HNO 3 relative to the de-ionized water of about 0.25 percent to about 10 percent; and
a mixture of H 2 SO 4 and de-ionized water having a concentration ratio of H 2 SO 4 relative to the de-ionized water of about 0.25 percent to about 10 percent;
annealing the etched transparent conductive oxide layer;
thermal treating the transparent conductive oxide layer at a first temperature; and
thermal quenching the thermally treated transparent conductive oxide layer at a second temperature lower than the first temperature, wherein the transparent conductive oxide layer is maintained in a substantially oxygen free environment during the thermal treating, the thermal quenching, and during any time between the thermal treating and thermal quenching.
14. The method of claim 13 , wherein forming the transparent conductive oxide layer comprises sputter depositing the transparent conductive oxide layer.
15. The method of claim 9 , wherein the thermal quenching comprises reducing the temperature of the thermally treated transparent conductive oxide layer from the first temperature to the second temperature in an environment having a partial pressure of oxygen that is below the partial pressure of oxygen present in air.
16. A method, comprising:
forming a transparent conductive oxide layer over a substrate;
etching the formed transparent conductive oxide layer to form a roughened surface, the etching comprising exposing the formed transparent conductive oxide layer to a wet etchant composition selected from the group consisting of:
a mixture of HCl, H 2 O 2 and de-ionized water having a concentration ratio of HCl and H 2 O 2 relative to the de-ionized water of about 0.25 percent to about 10 percent;
a mixture of HCl and de-ionized water having a concentration ratio of HCl relative to the de-ionized water of about 0.25 percent to about 10 percent;
a mixture of HNO 3 and de-ionized water having a concentration ratio of HNO 3 relative to the de-ionized water of about 0.25 percent to about 10 percent; and
a mixture of H 2 SO 4 and de-ionized water having a concentration ratio of H 2 SO 4 relative to the de-ionized water of about 0.25 percent to about 10 percent;
annealing the etched transparent conductive oxide layer;
thermal treating the transparent conductive oxide layer at a first temperature; and
thermal quenching the thermally treated transparent conductive oxide layer at a second temperature lower than the first temperature, wherein the transparent conductive oxide layer is maintained in an environment having a partial pressure of oxygen that is below the partial pressure of oxygen present in air during the thermal treating, the thermal quenching, and during any time between the thermal treating and thermal quenching.
17. The method of claim 1 , further comprising depositing a sacrificial protective layer over the transparent conductive oxide layer prior to annealing.
18. A method, comprising:
sputter depositing a transparent conductive oxide layer over a substrate;
etching the sputter deposited transparent conductive oxide layer to form a roughened surface, the etching comprising exposing the sputter deposited transparent conductive oxide layer to a wet etchant composition selected from the group consisting of:
a mixture of HCl, H 2 O 2 and de-ionized water having a concentration ratio of HCl and H 2 O 2 relative to the de-ionized water of about 0.25 percent to about 10 percent; and
a mixture of HCl and de-ionized water having a concentration ratio of HCl relative to the de-ionized water of about 0.25 percent to about 10 percent;
quenching the etched transparent conductive oxide layer by exposing the transparent conductive oxide layer to a basic solution having a pH of greater than about 10;
rinsing the quenched transparent conductive oxide layer with de-ionized water;
annealing the rinsed transparent conductive oxide layer at a first temperature; and
thermal quenching the annealed transparent conductive oxide layer at a second temperature lower than the first temperature in a substantially oxygen free environment.
19. The method of claim 18 , wherein the quenching comprises spraying the basic solution onto the transparent conductive oxide layer or dipping the transparent conductive oxide layer into the basic solution.
20. The method of claim 19 , wherein the basic solution comprises ammonium hydroxide.