Patterning via optical-saturable transitions
An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the spectrally selective reversible transitions with an optical node retaining a single molecule in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern.
1. An optical structure comprising:
one or more material layers having spectrally selective reversible and irreversible transitions at a plurality of wavelengths including uniform illumination by saturating one of the spectrally selective reversible transitions with an optical node in selectively retaining a single molecule, with sufficient exposure time, from a layer of photosensitive molecules in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern, said photosensitive molecules display an increase in conjugation length upon illumination with a first wavelength and a decrease in conjugation length upon illumination with a second wavelength, said optical node being positioned at a location of desired exposure, said pattern comprises a three dimensional nanopattern, wherein said exposure time depends on actual intensity in said node, slope of said intensity of said node, and desired spatial resolution.
2. The optical material system of claim 1 , wherein said one or more material systems comprises one material layer.
3. The optical material system of claim 2 , wherein said spectrally selective reversible transition comprises a single reversible transition and single irreversible transition.
4. The optical material system of claim 1 , wherein said one or more material systems comprises three material layers.
5. The optical material system of claim 4 , wherein said spectrally selective reversible transition comprises a two reversible transitions and a single irreversible transition.
6. The optical material system of claim 1 , wherein said pattern comprises a two dimensional nanopattern.
7. An optical system for nanopatterning comprising:
a plurality of light sources for providing spectral energy having a plurality of different wavelengths;
an optical structure comprising one or more material layers having spectrally selective reversible and irreversible transitions associated with said different wavelengths including uniform illumination, said light sources for providing spectral energy saturates one of the spectrally selective reversible transitions with an optical node in selectively retaining a single molecule, with sufficient exposure time and as long as said node is sufficiently dark, from a layer of photosensitive molecules in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern, said photosensitive molecules display an increase in conjugation length upon illumination with a first wavelength and a decrease in conjugation length upon illumination with a second wavelength, said optical node being positioned at a location of desired exposure, said pattern comprises a three dimensional nanopattern, wherein said exposure time depends on actual intensity in said node, slope of said intensity of said node, and desired spatial resolution.
8. The optical system of claim 7 , wherein said one or more material systems comprises one material layer.
9. The optical system of claim 8 , wherein said spectrally selective reversible transition comprises a single reversible transition and single irreversible transition.
10. The optical system of claim 7 , wherein said one or more material systems comprises three material layers.
11. The optical system of claim 10 , wherein said spectrally selective reversible transition comprises a two reversible transitions and a single irreversible transition.
12. The optical system of claim 7 , wherein said pattern comprises a two dimensional nanopattern.