IP Library › Granted Patent US 9,675,930
Granted Patent B2
US 9,675,930 · App. 12/752,537 · Granted Jun 13, 2017

Control method of plasma by magnetic field in an exhaust gas treating apparatus and an exhaust gas treating apparatus using the same

Inventors: Toshio Awaji (Sakai, JP); Takashi Nakayama (Izumisano, JP); Toshio Tanaka (Hiroshima, JP)
Assignee: CLEAN TECHNOLOGY CO., LTD.
B01D53/32H05H1/50B01D2257/204B01D2257/2066B01D2258/0216B01D2259/818H05H2245/1215
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Quick Facts
Patent No.
US 9,675,930
App. No.
12/752,537
Granted
Jun 13, 2017
Kind
B2
Abstract

A plasma control method for an exhaust gas treating apparatus includes providing an exhaust gas treating apparatus having a plasma discharge space, a coil disposed on an outer circumference of the plasma discharge space, an upper electrode, and a lower electrode; generating plasma in the plasma discharge space; controlling the state of the plasma generated in the plasma discharge space by generating a magnetic field in the plasma discharge space between the upper electrode and the lower electrode; and cooling the reaction tube using a water cooled jacket disposed around the reaction tube. The magnetic field is generated by applying a current to the coil.

Claims (15)

1. An exhaust gas treating apparatus for decomposing and treating an exhaust gas, the apparatus comprising:

a reaction tube into which the exhaust gas is introduced and in which plasma is generated, the reaction tube being formed of a heat-resistant material and having an upper opening for receiving the exhaust gas and a lower opening for discharging the exhaust gas;

an upper electrode disposed in the upper opening of the reaction tube;

a lower electrode disposed in the lower opening of the reaction tube;

a water cooled jacket disposed around the reaction tube for cooling the reaction tube; and

a coil arranged so as to:

wind around a full length of the reaction tube directly on an outer circumferential surface of the reaction tube and within the water-cooled jacket; and also

wind around an outer circumferential surface of the water-cooled jacket and directly on the outer circumferential surface of the water-cooled jacket, the coil being further configured to generate a magnetic field between the upper electrode and the lower electrode when a current is applied to the coil,

wherein the plasma is generated in the reaction tube between the upper electrode and the lower electrode, and

wherein the coil is configured such that the state of the plasma generated in the reaction tube is controlled by generating the magnetic field in the reaction tube.

2. The apparatus of claim 1 , further comprising a spray nozzle for spraying an electrolyte solution into the reaction tube.

3. The apparatus of claim 2 , wherein the upper electrode is formed as the spray nozzle such that the spray nozzle and the upper electrode have a one-piece construction.

4. The apparatus of claim 1 , wherein the heat-resistant material of the reaction tube is a ceramic material.

5. The apparatus of claim 1 , wherein the heat-resistant material of the reaction tube is a synthetic resin.

6. The apparatus of claim 1 , wherein the coil is wound around the reaction tube so as to surround both the upper opening of the reaction tube and the lower opening of the reaction tube.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 4, 2010
From: AWAJI, TOSHIO; NAKAYAMA, TAKASHI; TANAKA, TOSHIO
To: CLEAN TECHNOLOGY CO., LTD.
Reel/Frame 024332/0553 →
Priority Claims (1)
JP 2009-090066 · Apr 2, 2009 · national
Continuity (1)
Related Publication 20100252411A1 · Oct 7, 2010