IP Library Granted Patent US 8,058,699
Granted Patent B2
US 8,058,699 · App. 12/754,702 · Granted Nov 15, 2011

Area sensor and display apparatus provided with an area sensor

Assignee: Semiconductor Energy Laboratory Co., Ltd.
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Quick Facts
Patent No.
US 8,058,699
App. No.
12/754,702
Granted
Nov 15, 2011
Kind
B2
Abstract

An area sensor of the present invention has a function of displaying an image in a sensor portion by using light-emitting elements and a reading function using photoelectric conversion devices. Therefore, an image read in the sensor portion can be displayed thereon without separately providing an electronic display on the area sensor. Furthermore, a photoelectric conversion layer of a photodiode according to the present invention is made of an amorphous silicon film and an N-type semiconductor layer and a P-type semiconductor layer are made of a polycrystalline silicon film. The amorphous silicon film is formed to be thicker than the polycrystalline silicon film. As a result, the photodiode according to the present invention can receive more light.

Claims (48)

1. A semiconductor device comprising:

a substrate;

an adhesive provided over the substrate; and

a plurality of pixels over the adhesive, each of the pixels comprising a first circuit and a second circuit,

wherein the first circuit comprises a photodiode and a thin film transistor,

wherein the second circuit comprises an electroluminescence element,

wherein the photodiode comprises a photoelectric conversion layer, a P-type semiconductor layer and an N-type semiconductor layer,

wherein the photoelectric conversion layer is thicker than the P-type semiconductor layer and the N-type semiconductor layer,

wherein the photodiode is electrically connected to one of a source and a drain of the thin film transistor, and

wherein the first circuit is electrically connected to a constant current power source.

2. A semiconductor device comprising:

a substrate;

an adhesive provided over the substrate; and

a plurality of pixels over the adhesive, each of the pixels comprising a circuit comprising a photodiode and a thin film transistor,

wherein the photodiode comprises a photoelectric conversion layer, a P-type semiconductor layer and an N-type semiconductor layer,

wherein the photoelectric conversion layer is thicker than the P-type semiconductor layer and the N-type semiconductor layer,

wherein the photodiode is electrically connected to one of a source and a drain of the thin film transistor, and

wherein the circuit is electrically connected to a constant current power source.

3. A semiconductor device according to claim 1 ,

wherein the electroluminescence element is electrically connected to a first gate signal line, and

wherein the photodiode is electrically connected to a second gate signal line.

4. A semiconductor device according to claim 2 , further comprising an electroluminescence element in each of the pixels,

wherein each electroluminescence element is connected to a gate signal line.

5. A semiconductor device according to claim 1 , further comprising a second transistor in each of the pixels,

wherein one of a source and a drain of the second transistor is electrically connected to the electroluminescence element of the same pixel.

6. A semiconductor device according to claim 2 , further comprising an electroluminescence element and a second transistor in each of the pixels,

wherein one of a source and a drain of the second transistor is electrically connected to the electroluminescence element of the same pixel.

7. A semiconductor device according to claim 1 , wherein the photodiode and the electroluminescence element do not overlap when viewed from above the substrate.

8. A semiconductor device according to claim 4 , wherein the photodiode and the electroluminescence element do not overlap when viewed from above the substrate.

9. A semiconductor device according to claim 6 , wherein the photodiode and the electroluminescence element do not overlap when viewed from above the substrate.

10. A semiconductor device according to claim 1 , wherein the substrate is one selected from the group consisting of an elastic plastic film, a glass substrate, a quartz substrate, a plastic substrate, a silicon substrate, and a ceramic substrate.

11. A semiconductor device according to claim 2 , wherein the substrate is one selected from the group consisting of an elastic plastic film, a glass substrate, a quartz substrate, a plastic substrate, a silicon substrate, and a ceramic substrate.

12. A semiconductor device according to claim 1 , wherein the adhesive comprises a material selected from polyimide, acrylic resin, polyamide, epoxy resin and a silicon oxide film.

13. A semiconductor device according to claim 2 , wherein the adhesive comprises a material selected from polyimide, acrylic resin, polyamide, epoxy resin and a silicon oxide film.

14. A semiconductor device according to claim 1 , wherein the photoelectric conversion layer comprises an amorphous semiconductor film.

15. A semiconductor device according to claim 2 , wherein the photoelectric conversion layer comprises an amorphous semiconductor film.

16. A semiconductor device according to claim 1 , wherein a portion of the photoelectric conversion layer is formed on the P-type semiconductor layer, and another portion of the photoelectric conversion layer is formed on the N-type semiconductor layer.

17. A semiconductor device according to claim 2 , wherein a portion of the photoelectric conversion layer is formed on the P-type semiconductor layer, and another portion of the photoelectric conversion layer is formed on the N-type semiconductor layer.

18. A semiconductor device according to claim 1 , further comprising

a second adhesive over the plurality of pixels, and

a second substrate over the second adhesive.

19. A semiconductor device according to claim 2 , further comprising

a second adhesive over the plurality of pixels, and

a second substrate over the second adhesive.

20. A semiconductor device according to claim 1 , further comprising a metal film formed over the photoelectric conversion layer.

21. A semiconductor device according to claim 2 , further comprising a metal film formed over the photoelectric conversion layer.

22. A semiconductor device according to claim 1 , wherein the semiconductor device is included in an electronic equipment selected from a video camera, a digital still camera, a notebook computer, a mobile computer, a mobile phone, a portable game machine and an electronic book.

23. A semiconductor device according to claim 2 , wherein the semiconductor device is included in an electronic equipment selected from a video camera, a digital still camera, a notebook computer, a mobile computer, a mobile phone, a portable game machine and an electronic book.

Priority Claims (1)
JP 2000-242932 · Aug 10, 2000 · national
Continuity (3)
Continuation 11278841 · Apr 6, 2006
Division 09924108 · Aug 8, 2001
Related Publication 20100193788A1 · Aug 5, 2010