Foreign matter inspection method and foreign matter inspection apparatus
View Patent ↗In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.
1. An inspection apparatus which inspects a substrate comprising:
an irradiating unit for irradiating inspection light on an inspection area of said substrate;
a detecting unit for detecting scattered light from said substrate;
a first processing unit which calculates a threshold value;
a second processing unit which inspects a foreign matter of said substrate based on said threshold value; and
a first display unit which displays a distribution image of said threshold value on said substrate,
wherein said first processing unit calculates a standard deviation based on said inspection area, and calculates said threshold value by multiplying a coefficient by said standard deviation.
2. An inspection apparatus according to claim 1 ,
wherein said first processing unit calculates said standard deviation by overlapping a plurality of images of a plurality of inspection areas.
3. An inspection apparatus according to claim 1 , further comprising,
a third processing unit which makes a detection sensitivity image of said distribution image.
4. An inspection apparatus according to claim 3 , further comprising,
a second display unit which displays said detection sensitivity image of said threshold value.
5. A method for inspecting a substrate comprising:
an irradiating step of irradiating an inspection light on an inspection area of said substrate;
a detecting step of detecting light from said substrate;
a first processing step which calculates a threshold value;
a second processing step which inspects a foreign matter of said substrate based on said threshold value; and
a first display step which displays a distribution image of said threshold value on said substrate,
wherein in said first processing step a standard deviation is calculated based on said inspection area, and said threshold value is calculated by multiplying a coefficient by said standard deviation.
6. The method according to claim 5 ,
wherein in said first processing step said standard deviation is calculated by overlapping a plurality of images of a plurality of inspection areas.
7. The method according to claim 5 , further comprising,
a third processing step of making a detection sensitivity image of said distribution image.
8. The method according to claim 7 , further comprising,
a second display step of displaying said detection sensitivity image of said threshold value.