IP Library Granted Patent US 8,460,462
Granted Patent B2
US 8,460,462 · App. 12/765,896 · Granted Jun 11, 2013

Method and an apparatus for growing a silicon single crystal from a melt

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Quick Facts
Patent No.
US 8,460,462
App. No.
12/765,896
Granted
Jun 11, 2013
Kind
B2
Abstract

Silicon single crystals are grown from the melt by providing the melt in a crucible; imposing a horizontal magnetic field on the melt; directing a gas between the single crystal and a heat shield to a melt free surface, and controlling the gas to flow over a region of the melt free surface extending in a direction substantially perpendicular to the magnetic induction. A suitable apparatus has a crucible for holding the melt; a heat shield surrounding the silicon single crystal having a lower end which is connected to a bottom cover facing a melt free surface and a non-axisymmetric shape with respect to a crucible axis, such that gas which is directed between the crystal and the heat shield to the melt free surface is forced to flow over a region of the melt which extends substantially perpendicular to the magnetic induction.

Claims (12)

1. A method for growing a silicon single crystal from a melt, comprising

providing the melt in a crucible;

imposing a horizontal magnetic field on the melt having a magnetic induction B at a field center C;

directing a gas between the silicon single crystal and a heat shield to a melt free surface, and

controlling the gas such that the gas is forced to flow in a non-axisymmetric way with respect to a center axis M of the crucible over a region of the melt free surface which extends in a direction substantially perpendicular to the magnetic induction B.

2. The method of claim 1 , wherein the region forms a sector of the melt free surface having a center angle α which is not less than 45° and not more than 135° and wherein the sector comprises a center axis D which is aligned perpendicular to the magnetic induction B or in a direction deviating up to −30° or +30° from a perpendicular alignment.

3. The method of claim 1 , comprising controlling the gas to flow over the region of the melt free surface during crystal growth by turning the heat shield.

4. The method of claim 2 , comprising controlling the gas to flow over the region of the melt free surface during crystal growth by turning the heat shield.

5. The method of claim 1 , comprising driving gas out of the crucible in a direction substantially perpendicular to the magnetic induction B.

6. The method of claim 2 , comprising driving gas out of the crucible in a direction substantially perpendicular to the magnetic induction B.

7. The method of claim 3 , comprising driving gas out of the crucible in a direction substantially perpendicular to the magnetic induction B.

8. The method of claim 4 , comprising driving gas out of the crucible in a direction substantially perpendicular to the magnetic induction B.

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE DATE OF THE CHANGE OF ADDRESS FROM 03/12/2020 TO 12/03/2020 PREVIOUSLY RECORDED AT REEL: 056719 FRAME: 0881. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Jul 1, 2021
From: SILTRONIC AG
To: SILTRONIC AG
Reel/Frame 057561/0451 →
CHANGE OF ADDRESS Recorded Jun 30, 2021
From: SILTRONIC AG
To: SILTRONIC AG
Reel/Frame 056719/0881 →