IP Library Granted Patent US 9,681,501
Granted Patent B2
US 9,681,501 · App. 12/809,539 · Granted Jun 13, 2017

Multi layer for encapsulation comprising a planarizing organic thin layer and a conformal organic thin layer

Inventors: Sangcheol Nam (Seoul, KR); Hoyoung Park (Seoul, KR); Yongchang Lim (Seoul, KR); Kichang Lee (Seoul, KR); Kyugil Choi (Seoul, KR); Hosung Hwang (Yongin-si, KR); Giback Park (Bucheon-si, KR); Jimin Kim (Seoul, KR)
Assignee: Applied Materials, Inc.
H05B33/04H01L51/448H01L51/5256H01M2/0287Y02E10/549Y10T428/239
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Quick Facts
Patent No.
US 9,681,501
App. No.
12/809,539
Granted
Jun 13, 2017
Kind
B2
Abstract

A multi layer encapsulating film includes at least one planarizing organic thin film, at least one conformal organic thin film, and at least one inorganic thin film. The thin films are laminated in order of (a) a planarizing organic thin film, an inorganic thin film, a conformal organic thin film, and an inorganic thin film, (b) a conformal organic thin film, an inorganic thin film, a planarizing organic thin film, and an inorganic thin film, (c) a planarizing organic thin film, a conformal organic thin film, and an inorganic thin film, or (d) a conformal organic thin film, a planarizing organic thin film, and an inorganic thin film. The multi layer encapsulating film according to the invention can improve the surface roughness by using the planarizing organic thin film, and can enable particles to uniformly cover the device by using the conformal organic thin film.

Claims (31)

1. A multi layer encapsulating film comprising:

at least one planarizing organic thin film;

at least one conformal organic thin film; and

at least one inorganic thin film,

wherein

the multi layer encapsulating film is on a substrate and on a top of a device that is directly on the substrate, to seal the device, and

the thin films are laminated in the following sequence:

a planarizing organic thin film directly on the device,

a conformal organic thin film directly touching the planarizing organic film, and

an inorganic thin film directly touching the conformal organic film.

2. The multi layer encapsulating film as set forth in claim 1 , wherein at least one planarizing organic thin film or at least one two-layered thin film having a conformal organic thin film and an inorganic thin film in that order is further laminated on the outermost inorganic thin film of the laminated thin films.

3. The multi layer encapsulating film as set forth in claim 1 , wherein at least one three-layered thin film having a planarizing organic thin film, a conformal organic thin film, and an inorganic thin film in that order or at least one three-layered thin film having a conformal organic thin film, a planarizing organic thin film, and an inorganic thin film in that order is further laminated on the inorganic thin film of the laminated thin films.

4. The multi layer encapsulating film as set forth in claim 1 , wherein at least one planarizing organic thin film or at least one two-layered thin film having a conformal organic thin film and an inorganic thin film in that order is further laminated on the inorganic thin film of the laminated thin films.

5. The multi layer encapsulating film as set forth in claim 1 , wherein the planarizing organic thin film comprises one or more materials selected from a group consisting of diazo resin, azide resin, acryl resin, polyamide resin, polyester resin, epoxide resin, polyether resin, and urethane resin, all of which are photopolymerizable.

6. The multi layer encapsulating film as set forth in claim 1 , wherein the conformal organic thin film comprises one or more materials selected from a group consisting of polystyrene resin, acryl resin, urea resin, isocyanate resin, and xylene resin, in which radicals are generated by heat and then polymerization is initiated.

7. The multi layer encapsulating film as set forth in claim 1 , wherein a material of the inorganic thin film comprises one or more materials selected from a group consisting of silicon nitride, aluminum nitride, zirconium nitride, titanium nitride, hafnium nitride, tantalum nitride, silicon oxide, aluminum oxide, zirconium oxide, magnesium oxide, titanium oxide, tin oxide, cerium oxide, and silicon oxynitride (SiON).

8. The multi layer encapsulating film as set forth in claim 1 , wherein at least two inorganic thin films are formed in the multi layer encapsulating film, the inorganic thin films are formed of a same type of inorganic thin film or two or more different types of the inorganic thin films.

9. The multi layer encapsulating film as set forth in claim 1 , wherein the planarizing organic thin film is laminated by forming an organic material by way of one or more of evaporation, silk screen, coating, or polymerizing using one or more of ultraviolet rays or visible rays.

10. The multi layer encapsulating film as set forth in claim 1 , wherein the conformal organic thin film is laminated by forming an organic material by way of one or more of evaporation, CVD or thermal polymerization.

11. The multi layer encapsulating film as set forth in claim 1 , wherein the inorganic thin film is laminated by way of one or more of sputtering, CVD, e-beam, thermal deposition, or IBAD (Thermal Ion Beam Assisted Deposition).

12. The multi layer encapsulating film as set forth in claim 1 , wherein the multi layer encapsulating film is on sides and a bottom of the substrate to enclose and seal the substrate and the device.

13. A multi layer encapsulating film comprising:

at least one planarizing organic thin film;

at least one conformal organic thin film; and

at least one inorganic thin film,

wherein

the multi layer encapsulating film is on a substrate and on a top of a device that is directly on the substrate, to seal the device, and

the thin films are laminated in the following sequence:

a conformal organic thin film directly on the device,

a planarizing organic thin film directly touching the conformal organic thin film, and

an inorganic thin film directly touching the planarizing organic thin film.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 15, 2016
From: GS ENERGY CORPORATION
To: APPLIED MATERIALS, INC.
Reel/Frame 040327/0938 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 4, 2013
From: GS NANOTECH CO., LTD.
To: GS ENERGY CORPORATION
Reel/Frame 031715/0144 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 18, 2010
From: NAM, SANGCHEOL; PARK, HOYOUNG; LIM, YONGCHANG; LEE, KICHANG; CHOI, KYUGIL; HWANG, HOSUNG; PARK, GIBACK; KIM, JIMIN
To: GSNANOTECH, CO., LTD.
Reel/Frame 024561/0703 →
Priority Claims (1)
KR 10-2007-0135017 · Dec 21, 2007 · national
Continuity (1)
Related Publication 20100272945A1 · Oct 28, 2010