Nonvolatile memory device and method of manufacturing the same

1. A nonvolatile memory device comprising:

a first wire extending in a first direction;

a second wire formed at height different from height of the first wire and extending in a second direction; and

a nonvolatile memory cell arranged to be held between the first wire and the second wire in a position where the first wire and the second wire cross, wherein

the nonvolatile memory cell includes a nonvolatile storage layer and a current limiting resistance layer connected in series to the nonvolatile storage layer and having resistance of 1 kilo-ohm to 1 mega-ohm,

the nonvolatile memory cell has a structure in which the nonvolatile storage layer is held between a pair of conductive layers, and

one of the pair of conductive layers or both the pair of conductive layers function as the current limiting resistance layer.

2. The nonvolatile memory device according to claim 1 , wherein

the nonvolatile storage layer is formed of a metal oxide, and

one or both of the conductive layers functioning as the current limiting resistance layer are formed of an oxide of a metal element having an absolute value of standard Gibbs free energy of oxide formation smaller than an absolute value of that of an element of the nonvolatile storage layer and formed in contact with the nonvolatile storage layer.

3. The nonvolatile memory device according to claim 1 , wherein

the nonvolatile storage layer is formed of a metal oxide, and

one or both of the conductive layers functioning as the current limiting resistance layer are formed of a metal nitride and formed in contact with the nonvolatile storage layer.

4. The nonvolatile memory device according to claim 1 , wherein one or both of the conductive layers functioning as the current limiting resistance layer are formed such that a section thereof set in contact with the nonvolatile storage layer has resistance lower than that of other sections.

5. The nonvolatile memory device according to claim 4 , wherein

one or both of the conductive layers functioning as the current limiting resistance layer are formed by stacking a plurality of conductive material layers, and

the conductive material layers have higher resistance further away from a layer set in contact with the nonvolatile storage layer.

6. The nonvolatile memory device according to claim 4 , wherein one or both of the conductive layers functioning as the current limiting resistance layer include one conductive material layer, a composition of which is changed in an inclining manner such that resistance is higher further away from a side set in contact with the nonvolatile storage layer.

7. The nonvolatile memory device according to claim 1 , wherein

the nonvolatile memory cell has a structure in which a stacked member including a rectifying layer and the nonvolatile storage layer, and a cap film formed between the stacked member and the second wire and formed of a conductive material are stacked, and

the current limiting resistance layer is the cap film.

8. The nonvolatile memory device according to claim 1 , wherein

the nonvolatile memory cell has a structure in which a stacked member including a rectifying layer and the nonvolatile storage layer held between the pair of conductive layers, and a cap film formed between the stacked member and the second wire and formed of a conductive material are stacked, and

at least one of the pair of conductive layers and the cap film functions as the current limiting resistance layer.

9. The nonvolatile memory device according to claim 8 , wherein one or both of the conductive layers or the cap film functioning as the current limiting resistance layer are formed of a metal oxide or a metal nitride.