Deflector array, exposure apparatus, and device manufacturing method
View Patent ↗A deflector array includes a plurality of deflectors, which deflect charged particle beams, arrayed on a substrate. Each of the plurality of deflectors includes a single opening formed in the substrate, and each of the plurality of deflectors includes a pair of electrodes that oppose each other through the opening and are configured to deflect a single charged particle beam. The plurality of deflectors are arrayed such that a length of the pair of electrodes in a longitudinal direction thereof is not less than a distance between centers of two of the plurality of deflectors that are located nearest to each other. The plurality of deflectors is arrayed to form a checkerboard lattice, and two openings of the two of the plurality of deflectors overlap in the longitudinal direction.
1. A deflector array comprising:
a plurality of deflectors, which deflect charged particle beams, arrayed on a substrate,
wherein each of said plurality of deflectors includes a single opening formed in the substrate, and each of said plurality of deflectors including a pair of electrodes that oppose each other through the opening and being configured to deflect a single charged particle beam, and
wherein said plurality of deflectors are arrayed such that a length of said pair of electrodes in a longitudinal direction thereof is not less than a distance between centers of two of said plurality of deflectors that are located nearest to each other, said plurality of deflectors being arrayed to form a checkerboard lattice, and two openings of the two of said plurality of deflectors overlapping in the longitudinal direction.
2. The deflector array according to claim 1 , wherein said pair of electrodes are formed such that a distance between said pair of electrodes shortens from centers toward end portions of said pair of electrodes.
3. An exposure apparatus which exposes a wafer with a charged particle beam, the apparatus comprising:
a charged particle source which emits the charged particle beam;
a first electron optical system which forms a plurality of intermediate images of said charged particle source;
a second electron optical system which projects the plurality of intermediate images formed by said first electron optical system onto the wafer; and
a positioning apparatus which holds and positions the wafer,
wherein said first electron optical system includes a deflector array defined in claim 1 .
4. A method of manufacturing a device, the method comprising:
exposing a wafer with a charged particle beam using an exposure apparatus defined in claim 3 ;
developing the exposed wafer; and
processing the developed wafer to manufacture the device.
5. The deflector array according to claim 1 , wherein the deflector array includes deflectors with three rows and three columns.