Method for manufacturing stacked contact plugs
View Patent ↗A semiconductor device manufacturing method including: forming a first interlayer insulating film on a semiconductor substrate; forming a first hole in the first interlayer insulating film; forming a barrier film inside the first hole; filling a conductive material in the first hole to form a first plug; forming a second interlayer insulating film on the first interlayer insulating film; forming a second hole reaching the first plug in the second interlayer insulating film; selectively etching an upper end of the barrier film inside the second hole; and forming a second plug for connection to the first plug inside the second hole.
1. A semiconductor device manufacturing method comprising:
forming a first interlayer insulating film over a semiconductor substrate;
forming a first hole in the first interlayer insulating film;
forming a barrier film inside the first hole;
filling a conductive material in the first hole to form a first plug;
forming a second interlayer insulating film over the first interlayer insulating film;
forming a second hole reaching the first plug in the second interlayer insulating film by using a first etching gas;
selectively etching an upper end of the barrier film inside the second hole by using a second etching gas that is different from the first etching gas; and
forming a second plug for connection to the first plug inside the second hole.
2. A semiconductor device manufacturing method comprising:
forming a first interlayer insulating film over a semiconductor substrate;
forming a first hole in the first interlayer insulating film;
forming a barrier film containing titanium inside the first hole;
filling a conductive material in the first hole to form a first plug;
forming a second interlayer insulating film over the first interlayer insulating film;
performing dry etching using a first etching gas containing a fluorine atom-containing component to form a second hole reaching the first plug in the second interlayer insulating film;
selectively etching using a second etching gas that is different from the first etching gas to remove an altered layer formed as the result of an upper end of the barrier film being transformed inside the second hole; and
forming a second plug for connection to the first plug inside the second hole.
3. The semiconductor device manufacturing method according to claim 1 , wherein the selective etching is performed so that the upper end of the barrier film is recessed with respect to the upper end of the conductive material.
4. The semiconductor device manufacturing method according to claim 2 , wherein the selective etching is performed so that the upper end of the barrier film is recessed with respect to the upper end of the conductive material.
5. The semiconductor device manufacturing method according to claim 1 , wherein the selective etching is dry etching using the second etching gas containing at least one of chlorine, boron trichloride and hydrogen chloride.
6. The semiconductor device manufacturing method according to claim 2 , wherein the selective etching is dry etching using the second etching gas containing at least one of chlorine, boron trichloride and hydrogen chloride.
7. The semiconductor device manufacturing method according to claim 1 , wherein the barrier film is a titanium nitride film.
8. The semiconductor device manufacturing method according to claim 2 , wherein the barrier film is a titanium nitride film.
9. The semiconductor device manufacturing method according to claim 1 , wherein the conductive material is a metal.
10. The semiconductor device manufacturing method according to claim 2 , wherein the conductive material is a metal.
11. The semiconductor device manufacturing method according to claim 1 , wherein the conductive material is tungsten.
12. The semiconductor device manufacturing method according to claim 2 , wherein the conductive material is tungsten.