IP Library Granted Patent US 8,305,671
Granted Patent B2
US 8,305,671 · App. 12/819,264 · Granted Nov 6, 2012

Biaxial scanning mirror for image forming apparatus and method for operating the same

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,305,671
App. No.
12/819,264
Granted
Nov 6, 2012
Kind
B2
Abstract

A biaxial scanning mirror is disclosed in the present invention. The mirror includes: a first wafer having several cavities forming a first row and a second row, several permanent magnets each installed in one of the cavities, a spacer and a second wafer. The second wafer includes: a mirror unit, rotating around a first axis, for reflecting light beams; and a rotating unit, formed around the mirror unit, for rotating the mirror unit around a second axis which is perpendicular to the first axis. At least one coil substrate having a planar coil is assembled in the rotating unit.

Claims (55)

1. A biaxial scanning mirror for an image forming apparatus, comprising:

a first wafer having a plurality of cavities forming a first row and a second row;

a plurality of permanent magnets each installed in one of the plurality of cavities, two adjacent permanent magnets of the same row having an air gap formed therebetween;

a second wafer, comprising:

a mirror unit, rotatable around a first axis, for reflecting light beams; and

a rotating unit, formed around the mirror unit, for rotating the mirror unit around a second axis which is perpendicular to the first axis;

at least one coil substrate having a planar coil, assembled in the rotating unit, wherein the planner coil is partially inserted into the air gap formed between the two adjacent permanent magnets; and

a spacer, formed between the first wafer and the second wafer, for separating the first wafer and the second wafer.

2. The biaxial scanning mirror according to claim 1 , wherein the mirror unit is driven by a comb drive actuator.

3. The biaxial scanning mirror according to claim 1 , wherein the mirror unit is actuated by rotation of the rotating unit around the second axis.

4. The biaxial scanning mirror according to claim 1 , wherein resonant frequency of the mirror unit around the first axis is higher than that of the rotating unit around the second axis.

5. The biaxial scanning mirror according to claim 1 , wherein the coil substrate has a thickness smaller than 150 μm.

6. The biaxial scanning mirror according to claim 1 , wherein the rotating unit has at least one slot for vertically receiving the coil substrate.

7. The biaxial scanning mirror according to claim 1 , wherein the air gap has a width smaller than 250 μm.

8. The biaxial scanning mirror according to claim 1 , wherein the air gap has a magnetic flux larger than 0.82 Tesla.

9. The biaxial scanning mirror according to claim 1 , wherein the coil substrate is formed by micro-electro-mechanical systems (MEMS) process.

10. A method of operating a biaxial scanning mirror according to claim 1 , comprising the steps of:

a) generating a first magnetic field by the permanent magnets in the first row;

b) generating a second magnetic field of which direction is opposite to that of the first magnetic field by the permanent magnets in the second row;

c) providing a first signal to the planar coil for triggering the mirror unit to rotate around the first axis; and

d) providing a second signal to the planar coil for triggering the rotating unit to rotate around the second axis.

11. The method according to claim 10 , wherein the first signal is sinusoidal with a frequency larger than 18 KHz and the second signal has a waveform of saw-tooth with a frequency of 60 Hz.

12. A method of operating a biaxial scanning mirror according to claim 1 , comprising the steps of:

a) generating a first magnetic field by the permanent magnets in the first row;

b) generating a second magnetic field of which direction is opposite to that of the first magnetic field by the permanent magnets in the second row;

c) providing a first signal to the mirror unit for triggering the mirror unit to rotate around the first axis; and

d) providing a second signal to the planar coil for triggering the rotating unit to rotate around the second axis.

13. The method according to claim 12 , wherein the first signal is sinusoidal with a frequency larger than 18 KHz and the second signal has a waveform of saw-tooth with a frequency of 60 Hz.

14. The method according to claim 12 , wherein the first signal is provided to the mirror unit via a comb drive actuator.

15. The method according to claim 12 , wherein the mirror unit is electrostatically triggered and the rotating unit is magnetically triggered.

16. A biaxial scanning mirror for an image forming apparatus, comprising:

a first wafer having a plurality of cavities forming one or more rows;

a plurality of permanent magnets each installed in one of the plurality of cavities, two adjacent permanent magnets of a same row having an air gap formed therebetween;

a second wafer, comprising:

a mirror unit, rotatable around a first axis, for reflecting light beams; and

a rotating unit, formed around the mirror unit, for rotating the mirror unit around a second axis which is perpendicular to the first axis; and

at least one coil substrate having a planar coil, connected to the rotating unit, wherein the planner coil is partially inserted into the air gap formed between the two adjacent permanent magnets.

17. A method for forming a biaxial scanning mirror for an image forming apparatus, comprising:

providing a first wafer having a plurality of cavities forming a first row and a second row;

installing a plurality of permanent magnets, each in one of the plurality of cavities, wherein two adjacent permanent magnets of the same row form an air gap therebetween;

providing a second wafer, comprising:

a mirror unit, rotatable around a first axis, for reflecting light beams; and

a rotating unit, formed around the mirror unit, for rotating the mirror unit around a second axis which is perpendicular to the first axis;

assembling at least one coil substrate having a planar coil in the rotating unit; and

placing the second wafer over the first wafer and partially inserting the planner coil into the air gap formed between the two adjacent permanent magnets.

18. A method of operating a biaxial scanning mirror formed by the method of claim 17 , comprising:

a) generating a first magnetic field by the permanent magnets in the first row;

b) generating a second magnetic field of which direction is opposite to that of the first magnetic field by the permanent magnets in the second row;

c) providing a first signal to the planar coil for triggering the mirror unit to rotate around the first axis; and

d) providing a second signal to the planar coil for triggering the rotating unit to rotate around the second axis.

19. A method of operating a biaxial scanning mirror formed by the method of claim 17 , comprising:

a) generating a first magnetic field by the permanent magnets in the first row;

b) generating a second magnetic field of which direction is opposite to that of the first magnetic field by the permanent magnets in the second row;

c) providing a first signal to the mirror unit for triggering the mirror unit to rotate around the first axis; and

d) providing a second signal to the planar coil for triggering the rotating unit to rotate around the second axis.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 2, 2014
From: TOUCH MICRO-SYSTEM TECHNOLOGY CORP.
To: GREDMANN TAIWAN LTD.
Reel/Frame 033009/0642 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 28, 2014
From: TOUCH MICRO-SYSTEM TECHNOLOGY CORP.
To: GREDMAN TAIWAN LTD.
Reel/Frame 032978/0275 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 21, 2010
From: LIN, HUNG YI
To: TOUCH MICRO-SYSTEM TECHNOLOGY CORP.
Reel/Frame 024564/0528 →