Insulated phase change memory
View Patent ↗A phase change memory may include a plurality of thin layers covering a stack including a chalcogenide and a heater. The thin layers may form a barrier to heat loss. The thin layers may be the same or different materials. The layers may also be chemically or morphologically altered to improve the adverse affect of the interface between the layers on heat transfer.
1. A phase change memory comprising:
a chalcogenide;
a heater positioned to heat the chalcogenide; and
an electrode in electrical contact with the chalcogenide, wherein the heater, chalcogenide, and electrode form a stack; and
an interfacial insulator encasing said stack, wherein the interfacial insulator includes a first dielectric layer encasing the chalcogenide, the heater, and the electrode, and a second dielectric layer encasing the first dielectric layer, the chalcogenide, the heater, and the electrode, wherein the first dielectric layer comprises at least one of a chemically altered surface or a morphologically altered surface in contact with the second dielectric layer.
2. The memory of claim 1 wherein said first and second dielectric layers are less than 20 Angstroms thick.
3. The memory of claim 2 wherein said dielectric layers are different materials.
4. The memory of claim 1 wherein said interfacial insulator covers the stack on three sides.
5. A method comprising:
forming an interfacial insulator around a stack including a chalcogenide material, a heater, and an electrode, wherein the interfacial insulator comprises a first dielectric layer encasing the stack and a second dielectric layer encasing the first dielectric layer, wherein forming the interfacial insulator comprises altering a surface of the first dielectric layer.
6. The method of claim 5 including said dielectric layers have a thickness less than 20 nanometers and are in face-to-face contact with one another.
7. The method of claim 6 including forming said dielectric layers of different materials.
8. The method of claim 5 , wherein altering the surface of the first dielectric layer comprises morphologically altering the surface of the first dielectric layer.
9. The method of claim 5 , wherein altering the surface of the first dielectric layer comprises chemically altering the surface of the first dielectric layer.
10. The method of claim 5 wherein said forming the interfacial insulator comprises covering said stack on three sides with said interfacial insulator.
11. A phase change memory comprising:
at least two memory cells, a memory cell of the at least two memory cells including a chalcogenide material, a heater, and an electrode; and
interfacial insulators encasing respective memory cells of the at lest two memory cells, an interfacial insulator of the interfacial insulators comprising a first dielectric layer encasing the respective memory cells and a second dielectric layer encasing the first dielectric layer and the respective memory cells, wherein the first dielectric layer comprises at least one of a chemically altered surface or a morphologically altered surface in contact with the second dielectric later.
12. The memory of claim 11 wherein said encasing comprises covering said cell on at least three sides.
13. A phase change memory comprising:
at least two memory cells, a memory cell of the at least two memory cells including a chalcogenide material, a heater in electrical contact with the chalcogenide material, and an electrode, wherein the memory cell has a cell size of less than 50 nanometers; and
interfacial insulators encasing respective memory cells of the at least two memory cells, an interfacial insulator of the interfacial insulators comprising a first dielectric layer encasing the respective memory cells and a second dielectric layer encasing the first dielectric layer and the respective memory cells.
14. The memory of claim 1 , wherein a material of the first dielectric layer is common with a material of the second dielectric layer, wherein the first dielectric layer and the second dielectric layer form at least two continuous layers of the common material.
15. The method of claim 5 , wherein a material of the first dielectric layer is common with a material of the second dielectric layers, wherein the first dielectric layer and the second dielectric layer form at least two continuous layers of the common material.
16. The method of claim 5 , wherein forming the interfacial insulator further comprises:
depositing the first dielectric layer; and
depositing the second dielectric layer after altering the surface of the first dielectric layer.
17. The method of claim 16 , wherein the first and second dielectric layers are formed from a same material, and wherein said altering a surface comprises halting deposition of the same material to form an interface between the first and second dielectric layers.
18. The method of claim 5 , wherein said depositing the first dielectric layer, said depositing the second dielectric layer, or both, comprise using atomic layer deposition.
19. The memory of claim 11 , wherein a material of the first dielectric layer is common with a material of the second dielectric layers, wherein the first dielectric layer and the second dielectric layer form at least two continuous layers of the common material.