IP Library Granted Patent US 8,273,317
Granted Patent B2
US 8,273,317 · App. 12/841,452 · Granted Sep 25, 2012

Method for manufacturing high purity polycrystalline silicon

Assignee: JNC Corporation
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Quick Facts
Patent No.
US 8,273,317
App. No.
12/841,452
Granted
Sep 25, 2012
Kind
B2
Abstract

An method for manufacturing a high purity polycrystalline silicon is characterized by comprising: supplying a silicon chloride gas from a silicon chloride gas supply nozzle and a zinc gas from a zinc gas supply nozzle into a vertical reactor, and generating downward a polycrystalline silicon agglomerated in an almost tube shape on the leading end part of the silicon chloride gas supply nozzle by the reaction of the silicon chloride gas and the zinc gas.

Claims (22)

1. A method for manufacturing a high purity polycrystalline silicon using an apparatus that comprises:

a vaporizer of silicon chloride,

a fusing evaporator of zinc,

a vertical reactor provided with a heating means on the peripheral face thereof,

a silicon chloride gas supply nozzle disposed to connect the vaporizer of silicon chloride and the vertical reactor and for supplying a silicon chloride gas supplied from the vaporizer of silicon chloride into the vertical reactor,

a zinc gas supply nozzle disposed to connect the fusing evaporator of zinc and the vertical reactor and for supplying a zinc gas supplied from the fusing evaporator of zinc into the vertical reactor, and

an exhaust gas vent pipe connected to the vertical reactor,

wherein the fusing evaporator of zinc comprises:

a zinc evaporator,

a main vertical cylinder part connected to the upper part of the zinc evaporator,

a solid trapping pipe inserted into the main vertical cylinder part,

a zinc introducing pipe connected to the solid trapping pipe at an angle,

a seal pot disposed to surround the lower end opening portion of the solid trapping pipe and for configuring the bottom face of solid trapping pipe,

an induction heater disposed on the peripheral face of the main vertical cylinder part and capable of controlling a temperature, and

a gas vent pipe connected to the side wall of the zinc evaporator,

the method comprising the steps of:

supplying a silicon chloride gas from the silicon chloride gas supply nozzle and a zinc gas from the zinc gas supply nozzle into the vertical reactor; and

generating downward a polycrystalline silicon agglomerated in an almost tube shape on the leading end part of the silicon chloride gas supply nozzle by a reaction of the silicon chloride gas and the zinc gas.

2. The method of claim 1 , wherein in the apparatus used, a reinforcement material is attached to the outside of the zinc evaporator.

3. The method of claim 1 , wherein in the apparatus used, the seal pot is attached to the solid trapping pipe.

4. The method of claim 1 , wherein in the apparatus used, a cut groove is formed at the upper opening end of the seal pot.

5. The method of claim 1 , wherein in the apparatus used, an inert gas introduction pipe is connected to the solid trapping pipe and the main vertical cylinder part.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 27, 2011
From: CHISSO CORPORATION
To: JNC CORPORATION
Reel/Frame 026187/0940 →
Priority Claims (1)
JP 2007-071076 · Mar 19, 2007 · national
Continuity (2)
Division 12049641 · Mar 17, 2008
Related Publication 20100284886A1 · Nov 11, 2010