IP Library Granted Patent US 8,237,166
Granted Patent B2
US 8,237,166 · App. 12/848,671 · Granted Aug 7, 2012

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Assignees: Canon Kabushiki Kaisha; Tokyo Institute of Technology
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Quick Facts
Patent No.
US 8,237,166
App. No.
12/848,671
Granted
Aug 7, 2012
Kind
B2
Abstract

An active matrix display comprising a light control device and a field effect transistor for driving the light control device. The active layer of the field effect transistor comprises an amorphous.

Claims (69)

1. An active matrix display comprising:

an electroluminescent device; and

a field effect transistor for driving the electroluminescent device having an active layer,

wherein the active layer of the field effect transistor comprises an amorphous oxide wherein:

(a) the amorphous oxide of the active layer is selected from the group consisting of an oxide containing In, Ga and Zn, an oxide containing In, Zn and Sn, an oxide containing In and Zn, an oxide containing In and Sn, and an oxide containing In; and wherein

(b) the amorphous oxide has an electron carrier concentration of 10 12 /cm 3 or more and less than 10 18 /cm 3 , and wherein a current between drain and source terminals of the field effect transistor when no gate voltage is applied is less than 10 microamperes; and wherein

(c) the amorphous oxide has an oxygen defect density decreased by treatment in an atmosphere containing oxygen at a predetermined pressure upon or after film formation thereof.

2. The active matrix display according to claim 1 , wherein the field effect transistor is such that a current and a voltage between the drain and source terminals when no gate voltage is applied and (transistor length/transistor width) satisfy I DS <(W/L)×V DS ×(1.0×10 −5 /24) [A] when V GS =0 [V], where L is a channel length and W is a channel width, and wherein the amorphous oxide has a halo pattern and shows no specific diffraction ray in an X-ray diffraction spectrum.

3. The active matrix display according to claim 2 , wherein the current and the voltage between the drain and source terminals when no gate voltage is applied and (transistor length/transistor width) satisfy I DS <(W/L)×V DS ×(5.0×10 −8 /24) [A] when V GS =0 [V], where L is the channel length and W is the channel width.

4. The active matrix display according to claim 1 , wherein the amorphous oxide has an observable halo pattern, and shows no specific diffraction ray in an X-ray diffraction spectrum.

5. The active matrix display according to claim 1 , wherein an electron mobility of the active layer tends to increase with increasing electron carrier concentration.

6. An active matrix display comprising:

an electroluminescent device; and

a field effect transistor for driving the electroluminescent device,

wherein an active layer of the field effect transistor comprises an amorphous oxide of a compound having

(a) a composition when in a crystalline state represented by In 2−x M3 x O 3 (Zn 1−y M2 y O) m , wherein M2 is Mg or Ca; M3 is B, Al, Ga or Y; 0≦x≦2; 0≦y≦1; and m is zero or a natural number less than 6, or a mixture of said compounds;

(b) an electron carrier concentration of 10 12 /cm 3 or more and less than 10 18 /cm 3 , wherein a current between drain and source terminals of the field effect transistor when no gate voltage is applied is less than 10 microamperes; and

(c) oxygen defect density decreased by treatment in an atmosphere containing oxygen at a predetermined pressure upon or after film formation thereof.

7. The active matrix display according to claim 6 , wherein the amorphous oxide additionally contains at least one of Sn and a Group IV element selected from Si, Ge or Zr.

8. The active matrix display according to claim 6 , wherein the amorphous oxide comprises an oxide containing In, Ga, and Zn.

9. The active matrix display according to claim 6 , wherein the electroluminescent device is arranged on a flexible resin substrate.

10. The active matrix display according to claim 6 , wherein the electroluminescent device is arranged on a light transmissive substrate.

11. The active matrix display according to claim 6 , wherein the amorphous oxide has an observable halo pattern, and shows no specific diffraction ray in an X-ray diffraction spectrum.

12. The active matrix display according to claim 6 , wherein an electron mobility of the active layer tends to increase with increasing electron carrier concentration.

13. An active matrix display comprising:

an organic electroluminescent device; and

a field effect transistor for driving the organic electroluminescent device,

wherein an active layer of the field effect transistor comprises an amorphous oxide that

(a) is selected from the group consisting of an oxide containing In, Ga and Zn, an oxide containing In, Zn and Sn, an oxide containing In and Zn, an oxide containing In and Sn, and an oxide containing In; and

(b) has an electron carrier concentration of 10 12 /cm 3 or more and less than 10 18 /cm 3 , wherein a current between drain and source terminals of the field effect transistor when no gate voltage is applied is less than 10 microamperes; and

(c) has an oxygen defect density decreased by treatment in an atmosphere containing oxygen at a predetermined pressure upon or after film formation thereof.

14. The active matrix display according to claim 13 , wherein the field effect transistor is such that a current and a voltage between the drain and source terminals when no gate voltage is applied and (transistor length/transistor width) satisfy I DS <(W/L)×V DS ×(1.0×10 −5 /24) [A] when V GS =0 [V], where L is a channel length and W is a channel width, and wherein the amorphous oxide has a halo pattern and shows no specific diffraction ray in an X-ray diffraction spectrum.

15. The active matrix display according to claim 14 , wherein the current and the voltage between the drain and source terminals when no gate voltage is applied and (transistor length/transistor width) satisfy I DS <(W/L)×V DS ×(5.0×10 −8 /24) [A] when V GS =0 [V], where L is the channel length and W is the channel width.

16. The active matrix display according to claim 13 , wherein the amorphous oxide has an observable halo pattern, and shows no specific diffraction ray in an X-ray diffraction spectrum.

17. The active matrix display according to claim 13 , wherein an electron mobility of the active layer tends to increase with increasing electron carrier concentration.

18. An active matrix display comprising:

a light control device; and

a field effect transistor for driving the light control device,

wherein an active layer of the field effect transistor comprises an amorphous oxide that

(a) is selected from the group consisting of an oxide containing In, Ga and Zn, an oxide containing In, Zn and Sn, an oxide containing In and Zn, an oxide containing In and Sn, and an oxide containing In; and

(b) has an electron carrier concentration of 10 12 /cm 3 or more and less than 10 18 /cm 3 , wherein a current between drain and source terminals of the field effect transistor when no gate voltage is applied is less than 10 microamperes; and

(c) has an oxygen defect density decreased by treatment in an atmosphere containing oxygen at a predetermined pressure upon or after film formation thereof.

19. The active matrix display according to claim 18 , wherein the light control device comprises one of an electroluminescent device, a liquid crystal and an electrophoretic particle.

20. The active matrix display according to claim 18 , wherein the field effect transistor is such that a current and a voltage between the drain and source terminals when no gate voltage is applied and (transistor length/transistor width) satisfy I DS <(W/L)×V DS ×(1.0×10 −5 /24) [A] when V GS =0 [V], where L is a channel length and W is a channel width, and wherein the amorphous oxide has a halo pattern and shows no specific diffraction ray in an X-ray diffraction spectrum.

21. The active matrix display according to claim 20 , wherein the current and the voltage between the drain and source terminals when no gate voltage is applied and (transistor length/transistor width) satisfy I DS <(W/L)×V DS ×(5.0×10 −8 /24) [A] when V GS =0 [V], where L is the channel length and W is the channel width.

22. The active matrix display according to claim 18 , wherein the amorphous oxide has an observable halo pattern, and shows no specific diffraction ray in an X-ray diffraction spectrum.

23. The active matrix display according to claim 18 , wherein an electron mobility of the active layer tends to increase with increasing electron carrier concentration.

24. An active matrix display comprising:

a light control device; and

a field effect transistor for driving the light control device,

wherein an active layer of the field effect transistor comprises an amorphous oxide that

(a) has a composition when in a crystalline state represented by In 2−x M3 x O 3 (Zn 1−y M2 y O) m , wherein M2 is Mg or Ca; M3 is B, Al, Ga or Y; 0≦x≦2; 0≦y≦1; and m is zero or a natural number less than 6, or a mixture of said compounds; and

(b) has an electron carrier concentration of 10 12 /cm 3 or more and less than 10 18 /cm 3 , wherein a current between drain and source terminals of the field effect transistor when no gate voltage is applied is less than 10 microamperes; and

(c) has an oxygen defect density decreased by treatment in an atmosphere containing oxygen at a predetermined pressure upon or after film formation thereof.

25. The active matrix display according to claim 24 , wherein the field effect transistor is such that a current and a voltage between the drain and source terminals when no gate voltage is applied and (transistor length/transistor width) satisfy I DS <(W/L)×V DS ×(1.0×10 −5 /24) [A] when V GS =0 [V], where L is a channel length and W is a channel width, and wherein the amorphous oxide has a halo pattern and shows no specific diffraction ray in an X-ray diffraction spectrum.

26. The active matrix display according to claim 25 , wherein the current and the voltage between the drain and source terminals when no gate voltage is applied and (transistor length/transistor width) satisfy I DS <(W/L)×V DS ×(5.0×10 −8 /24) [A] when V GS =0 [V], where L is the channel length and W is the channel width.

27. The active matrix display according to claim 24 , wherein the amorphous oxide has an observable halo pattern, and shows no specific diffraction ray in an X-ray diffraction spectrum.

28. The active matrix display according to claim 24 , wherein an electron mobility of the active layer tends to increase with increasing electron carrier concentration.

29. An active matrix display comprising:

an organic electroluminescent device; and

a field effect transistor for driving the organic electroluminescent device,

wherein an active layer of the field effect transistor comprises an amorphous oxide of a compound having

(a) a composition when in a crystalline state represented by In 2−x M3 x O 3 (Zn 1−y M2 y O) m , wherein M2 is Mg or Ca; M3 is B, Al, Ga or Y; 0≦x≦2; 0≦y≦1; and m is zero or a natural number less than 6, or a mixture of said compounds;

(b) an electron carrier concentration of 10 12 /cm 3 or more and less than 10 18 /cm 3 , wherein a current between drain and source terminals of the field effect transistor when no gate voltage is applied is less than 10 microamperes; and

(c) oxygen defect density decreased by treatment in an atmosphere containing oxygen at a predetermined pressure upon or after film formation thereof.

30. The active matrix display according to claim 29 , wherein the field effect transistor is such that a current and a voltage between the drain and source terminals when no gate voltage is applied and (transistor length/transistor width) satisfy I DS <(W/L)×V DS ×(1.0×10 −5 /24) [A] when V GS =0 [V], where L is a channel length and W is a channel width, and wherein the amorphous oxide has a halo pattern and shows no specific diffraction ray in an X-ray diffraction spectrum.

31. The active matrix display according to claim 30 , wherein the current and the voltage between the drain and source terminals when no gate voltage is applied and (transistor length/transistor width) satisfy I DS <(W/L)×V DS ×(5.0×10 −8 /24) [A] when V GS =0 [V], where L is the channel length and W is the channel width.

32. The active matrix display according to claim 29 , wherein the amorphous oxide has an observable halo pattern, and shows no specific diffraction ray in an X-ray diffraction spectrum.

33. The active matrix display according to claim 29 , wherein an electron mobility of the active layer tends to increase with increasing electron carrier concentration.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 11, 2013
From: CANON KABUSHIKI KAISHA; TOKYO INSTITUTE OF TECHNOLOGY
To: CANON KABUSHIKI KAISHA; TOKYO INSTITUTE OF TECHNOLOGY; JAPAN SCIENCE AND TECHNOLOGY AGENCY
Reel/Frame 030776/0506 →
Priority Claims (1)
JP 2004-326682 · Nov 10, 2004 · national
Continuity (2)
Division 11269767 · Nov 9, 2005
Related Publication 20100295041A1 · Nov 25, 2010