Layout decomposition based on partial intensity distribution
View Patent ↗Layout design data are decomposed for double dipole lithography based on partial intensity distribution information. The partial intensity distribution information is generated by performing optical simulations on the layout design data. The layout decomposition may further be adjusted during an optical proximity correction process. The adjustment may utilize the partial intensity distribution information.
1. A method of layout decomposition, comprising:
receiving layout design data;
generating first intensity information by performing an optical simulation on the layout design data with a light source having a dipole oriented in a first direction;
generating second intensity information by performing an optical simulation on the layout design data with a light source having a dipole orientated in a second direction, the second direction being perpendicular to the first direction; and
decomposing, using a computer, the layout design data into a first layout portion and a second layout portion based on one or both of the first intensity information and the second intensity information, the first layout portion being associated with the light source having the dipole oriented in the first direction and the second layout portion being associated with the light source having the dipole oriented in the second direction.
2. The method recited in claim 1 , wherein decomposing the layout design data is further based on additional information.
3. The method recited in claim 2 , wherein the additional information is user-provided.
4. The method recited in claim 2 , wherein the additional information is geometric information.
5. The method recited in claim 1 , further comprising:
performing OPC (optical proximity correction) on one or both of the first layout portion and the second layout, and adjusting layout decomposition based on whether one or more conditions for adjusting layout decomposition are met.
6. The method recited in claim 5 , wherein one of the one or more conditions is that a correction made by the OPC would exceed a threshold value.
7. The method recited in claim 5 , wherein one of the one or more conditions is that a process-window simulation predicts a risk of bridging between a feature and a neighboring feature.
8. The method recited in claim 5 , wherein adjusting layout decomposition includes changing a feature in the layout design data from being a single-exposure feature to being a double-exposure feature or from being a double-exposure feature to being a single-exposure feature.
9. The method recited in claim 5 , wherein adjusting layout decomposition is further based on one or both of the first intensity information and the second intensity information.
10. The method recited in claim 5 , wherein adjusting layout decomposition is further based on information provided by a user.
11. The method recited in claim 1 , further comprising:
grouping features in the layout design data into a plurality of categories based on one or both of the first intensity information and the second intensity information.
12. The method recited in claim 11 , wherein the two or more categories include dipole-strong, dipole-weak, and dipole-neutral categories.
13. The method recited in claim 11 , wherein adjusting layout decomposition is further based on which one of the two or more categories a feature data belongs to.
14. The method recited in claim 1 , wherein the first intensity information and the second intensity information include partial intensity distribution information.
15. The method recited in claim 14 , wherein the partial intensity distribution information includes image contrast information.
16. The method recited in claim 14 , wherein the partial intensity distribution information includes image slope information.
17. A processor-readable device storing processor-executable instructions for causing one or more processors to perform a method of layout decomposition, the method comprising:
receiving layout design data;
generating first intensity information by performing an optical simulation on the layout design data with a light source having a dipole oriented in a first direction;
generating second intensity information by performing an optical simulation on the layout design data with a light source having a dipole orientated in a second direction, the second direction being perpendicular to the first direction; and
decomposing the layout design data into a first layout portion and a second layout portion based on one or both of the first intensity information and the second intensity information, the first layout portion being associated with the light source having the dipole oriented in the first direction and the second layout portion being associated with the light source having the dipole oriented in the second direction.
18. The processor-readable device recited in claim 17 , wherein decomposing the layout design data is further based on additional information.
19. The processor-readable device recited in claim 17 , wherein the method further comprising:
performing OPC (optical proximity correction) on one or both of the first layout portion and the second layout, and adjusting layout decomposition based on whether one or more conditions for adjusting layout decomposition are met.
20. The processor-readable device recited in claim 19 , wherein adjusting layout decomposition is further based on one or both of the first intensity information and the second intensity information.
21. A system comprising one or more processors, the one or more processors programmed to perform a method of layout decomposition, the method comprising:
receiving layout design data;
generating first intensity information by performing an optical simulation on the layout design data with a light source having a dipole oriented in a first direction;
generating second intensity information by performing an optical simulation on the layout design data with a light source having a dipole orientated in a second direction, the second direction being perpendicular to the first direction; and
decomposing the layout design data into a first layout portion and a second layout portion based on one or both of the first intensity information and the second intensity information, the first layout portion being associated with the light source having the dipole oriented in the first direction and the second layout portion being associated with the light source having the dipole oriented in the second direction.
22. The system recited in claim 21 , wherein decomposing the layout design data is further based on additional information.
23. The system recited in claim 21 , wherein the method further comprising:
performing OPC (optical proximity correction) on one or both of the first layout portion and the second layout, and adjusting layout decomposition based on whether one or more conditions for adjusting layout decomposition are met.
24. The system recited in claim 23 , wherein adjusting layout decomposition is further based on one or both of the first intensity information and the second intensity information.