IP Library Granted Patent US 8,946,904
Granted Patent B2
US 8,946,904 · App. 12/869,844 · Granted Feb 3, 2015

Substrate vias for heat removal from semiconductor die

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Quick Facts
Patent No.
US 8,946,904
App. No.
12/869,844
Granted
Feb 3, 2015
Kind
B2
Abstract

A substrate comprising a plurality of layers, a first side and a second side; and a via extending through the substrate from the first side to the second side. The via comprises:a first substrate via extending through a first layer of the plurality of layers, the first substrate via having a first cross-sectional area; a first capture pad disposed under the first substrate via, wherein the first capture pad physically contacts the first substrate via; a second substrate via extending through a second layer of the plurality of layers, the second substrate via physically contacting the first capture pad, the second substrate via having a second cross-sectional area that is greater than the first cross-sectional area; and a second thermal and electrical contact pad disposed under the second dielectric layer, wherein the second contact pad physically contacts the second substrate via.

Claims (55)

1. A semiconductor package, comprising:

a substrate comprising a plurality of layers, a first side and a second side; and a via extending through the substrate from the first side to the second side, the via comprising:

a first substrate via extending through a first layer of the plurality of layers, the first substrate via having a first cross-sectional area;

a first capture pad disposed under the first substrate via, wherein the first capture pad physically contacts the first substrate via on a first side and is adapted to electrically contact a semiconductor die disposed over a top of a second side opposing the first side;

a second substrate via extending through a second layer of the plurality of layers, the second substrate via physically contacting the first capture pad, the second substrate via having a second cross-sectional area that is greater than the first cross-sectional area; and

a second capture pad disposed under the second substrate via, the second capture pad having a second cross-sectional area that is greater than the first cross-sectional area, wherein the second capture pad physically contacts the second substrate via;

a third substrate via extending through a third layer of the plurality of layers, the third substrate via having a third cross-sectional area that is greater than the second cross-sectional area, wherein the third substrate via physically contacts the second capture pad; and

a third capture pad disposed under the third layer, wherein the third capture pad physically contacts the third substrate via.

2. A semiconductor package as claimed in claim 1 , wherein the first capture pad has a first cross-sectional areal dimension and the second capture pad has a second cross-sectional areal dimension, which is greater than the first cross-sectional areal dimension, and the third capture pad has a third cross-sectional areal dimension that is greater than the second cross-sectional area dimension.

3. A semiconductor package as claimed in claim 1 , wherein each of the plurality of layers comprises a dielectric material.

4. A semiconductor package as claimed in claim 1 , wherein each of the plurality of layers comprises a ceramic material.

5. A semiconductor package as claimed in claim 1 , further comprising a contact pad disposed over the first side of the substrate.

6. A semiconductor package as claimed in claim 5 , further comprising a solder bump disposed over the contact pad.

7. A semiconductor package as claimed in claim 6 , wherein the die is disposed over the solder bump.

8. A semiconductor package as claimed in claim 5 , wherein the die is disposed over the contact pad.

9. A substrate, comprising:

a plurality of layers, a first side and a second side; and a via extending through the plurality of layers from the first side to the second side, the via comprising:

a first substrate via extending through a first layer of the plurality of layers, the first substrate via having a first cross-sectional area;

a first capture pad disposed under the first substrate via, wherein the first capture pad physically contacts the first substrate via on a first side and is adapted to electrically contact a semiconductor die disposed over a top of a second side opposing the first side;

a second substrate via extending through a second layer of the plurality of layers, the second substrate via physically contacting the first capture pad, the second substrate via having a second cross-sectional area that is greater than the first cross-sectional area; and

a second capture pad disposed under the second layer, the second capture pad having a second cross-sectional area that is greater than the first cross-sectional area, wherein the second capture pad physically contacts the second substrate via;

a third substrate via extending through a third layer of the plurality of layers, the third substrate via having a third cross-sectional area that is greater than the second cross-sectional area, wherein the third substrate via physically contacts the second capture pad; and

a third capture pad disposed under the third layer, wherein the third capture pad physically contacts the third substrate via.

10. A substrate as claimed in claim 9 , wherein the first capture pad has a first cross-sectional areal dimension and the second capture pad has a second cross-sectional areal dimension, which is greater than the first cross-sectional areal dimension, and the third capture pad has a third cross-sectional areal dimension that is greater than the second cross-sectional area dimension.

11. A substrate as claimed in claim 9 , wherein each of the plurality of layers comprises a dielectric material.

12. A substrate as claimed in claim 9 , wherein each of the plurality of layers comprises a ceramic material.

13. A substrate as claimed in claim 9 , further comprising a contact pad disposed over the first side of the plurality of layers.

14. A semiconductor package, comprising:

a substrate comprising a plurality of layers, a first side and a second side; and a via extending through the substrate from the first side to the second side, the via comprising:

a first substrate via extending through a first layer of the plurality of layers, the first substrate via having a first cross-sectional area;

a first capture pad disposed under the first substrate via, wherein the first capture pad physically contacts the first substrate via;

a second substrate via extending through a second layer of the plurality of layers, the second substrate via physically contacting the first capture pad, the second substrate via having a second cross-sectional area that is greater than the first cross-sectional area; and

a second capture pad disposed under the second substrate via, the second capture pad having a second cross-sectional area that is greater than the first cross-sectional area, wherein the second capture pad physically contacts the second substrate via;

a third substrate via extending through a third layer of the plurality of layers, the third substrate via having a third cross-sectional area that is greater than the second cross-sectional area, wherein the third substrate via physically contacts the second capture pad; and

a third capture pad disposed under the third layer, wherein the third capture pad physically contacts the third substrate via, wherein the first capture pad has a first cross-sectional areal dimension and the second capture pad has a second cross-sectional areal dimension, which is greater than the first cross-sectional areal dimension, and the third capture pad has a third cross-sectional areal dimension that is the same as the second cross-sectional areal dimension.

15. A semiconductor package as claimed in claim 14 , wherein each of the plurality of layers comprises a dielectric material.

16. A semiconductor package as claimed in claim 14 , wherein each of the plurality of layers comprises a ceramic material.

17. A semiconductor package as claimed in claim 14 , further comprising a contact pad disposed over the first side of the substrate.

18. A semiconductor package as claimed in claim 17 , further comprising a solder bump disposed over the contact pad.

19. A semiconductor package as claimed in claim 14 , wherein the semiconductor die is disposed over the contact pad.

20. A semiconductor package as claimed in claim 19 , wherein the semiconductor die is disposed over the solder bump.

21. A substrate, comprising:

a plurality of layers, a first side and a second side; and a via extending through the substrate from the first side to the second side, the via comprising:

a first substrate via extending through a first layer of the plurality of layers, the first substrate via having a first cross-sectional area;

a first capture pad disposed under the first substrate via, wherein the first capture pad physically contacts the first substrate via;

a second substrate via extending through a second layer of the plurality of layers, the second substrate via physically contacting the first capture pad, the second substrate via having a second cross-sectional area that is greater than the first cross-sectional area; and

a second capture pad disposed under the second layer, the second capture pad having a second cross-sectional area that is greater than the first cross-sectional area, wherein the second capture pad physically contacts the second substrate via;

a third substrate via extending through a third layer of the plurality of layers, the third substrate via having a third cross-sectional area that is greater than the second cross-sectional area, wherein the third substrate via physically contacts the second capture pad; and

a third capture pad disposed under the third layer, the third capture pad physically contacting the third substrate via, wherein the first capture pad has a first cross-sectional areal dimension and the second capture pad has a second cross-sectional areal dimension, which is greater than the first cross-sectional areal dimension, and the third capture pad has a third cross-sectional areal dimension that is the same as the second cross-sectional areal dimension.

22. A semiconductor package as claimed in claim 21 , wherein each of the plurality of layers comprises a dielectric material.

23. A semiconductor package as claimed in claim 21 , wherein each of the plurality of layers comprises a ceramic material.

24. A semiconductor package as claimed in claim 21 , further comprising a contact pad disposed over the first side of the plurality of layers.

25. A semiconductor package as claimed in claim 24 , further comprising a solder bump disposed over the contact pad.

26. A semiconductor package as claimed in claim 25 , wherein the semiconductor die is disposed over the solder bump.

27. A semiconductor package as claimed in claim 21 , wherein the semiconductor die is disposed over the contact pad.

Assignments (8)
CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE PREVIOUSLY RECORDED AT REEL: 047422 FRAME: 0464. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER. Recorded Mar 6, 2019
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 048883/0702 →
MERGER Recorded Oct 5, 2018
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 047422/0464 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS Recorded Feb 3, 2017
From: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 041710/0001 →
PATENT SECURITY AGREEMENT Recorded Feb 11, 2016
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 037808/0001 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032851-0001) Recorded Feb 2, 2016
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 037689/0001 →
PATENT SECURITY AGREEMENT Recorded May 8, 2014
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 032851/0001 →
MERGER Recorded May 7, 2013
From: AVAGO TECHNOLOGIES WIRELESS IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 030369/0471 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 27, 2010
From: RAILKAR, TARAK A.; ALAWANI, ASHISH; PARKHURST, RAY
To: AVAGO TECHNOLOGIES WIRELESS IP (SINGAPORE) PTE. LTD.
Reel/Frame 024896/0943 →