IP Library Granted Patent US 8,281,270
Granted Patent B2
US 8,281,270 · App. 12/870,559 · Granted Oct 2, 2012

Method and system for proximity-aware circuit design

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Quick Facts
Patent No.
US 8,281,270
App. No.
12/870,559
Granted
Oct 2, 2012
Kind
B2
Abstract

A method for proximity-aware circuit design where a set of layout constraint values that satisfy predetermined performance or yield goals is determined in accordance with a layout effect model. One of the layout constraint values is then selected as a constraint input to layout design, and a design layout is performed with the selected layout constraint value to provide a semiconductor circuit design for the semiconductor circuit. The set of layout constraint values can be determined by varying an instance parameter of the layout effect model to determine a set of instance parameters that satisfy the at least one predetermined performance or yield goal in accordance with the layout effect model, and determining layout constraints associated with each instance parameter of the set of instance parameters, thus providing a number of candidates in a design space that can be evaluated according to performance and/or yield tradeoffs.

Claims (46)

1. A computer-implemented method of proximity-aware circuit design for a selected circuit topology for a semiconductor circuit having at least one predetermined performance or yield goal, comprising:

for each device in the selected circuit topology, determining a set of layout constraint values that satisfy the at least one predetermined performance or yield goal in accordance with a layout effect model;

selecting one of the set of layout constraint values as a constraint input to layout a design for said each device; and

performing a design layout in accordance with the selected one of the set of layout constraint values for said each device to provide a semiconductor circuit design for the semiconductor circuit.

2. The method as claimed in claim 1 further comprising:

placing and routing each of devices in the selected circuit topology in accordance with its respective selected one of the set of layout constraint values to optimize the semiconductor circuit design in accordance with circuit specifications; and

verifying the semiconductor circuit design.

3. The method as claimed in claim 1 wherein the selecting one of the set of layout constraint values as a constraint input to layout a design comprises:

selecting the one of the set of layout constraint values in view of trade-offs between performance and yield goals.

4. The method as claimed in claim 1 wherein the layout effect model comprises at least one of a well proximity effect model, and a shallow trench isolation (STI) stress model.

5. The method as claimed in claim 1 wherein the determining a set of layout constraint values that satisfy the at least one predetermined performance or yield goal in accordance with a layout effect model comprises:

varying an instance parameter of the layout effect model to determine a set of instance parameters that satisfy the at least one predetermined performance or yield goal in accordance with the layout effect model; and

determining layout constraints associated with each instance parameter of the set of instance parameters to provide the set of layout constraint values.

6. The method as claimed in claim 1 wherein the determining a set of layout constraint values that satisfy the at least one predetermined performance or yield goal in accordance with a layout effect model comprises:

determining a set of minimum well distance values that satisfy the at least one predetermined performance or yield goal in accordance with a well proximity effect model.

7. The method as claimed in claim 6 wherein the determining a set of minimum well distance values that satisfy the at least one predetermined performance or yield goal in accordance with a well proximity effect model comprises:

varying an instance parameter (SCA) representing an integral of a first distribution function for scattered well dopants to determine a set of instance parameters that satisfy the at least one predetermined performance or yield goal in accordance with the well proximity effect model; and

determining well keep-out constraints associated with each instance parameter of the set of instance parameters to provide the set of minimum well distance values.

8. The method as claimed in claim 7 wherein the selecting one of the set of layout constraint values as a constraint input to layout a design comprises:

selecting one of the set of instance parameters in view of trade-offs between performance and yield goals; and

inputting minimum well distances corresponding to the selected one of the set of instance parameters as the constraint input.

9. The method as claimed in claim 7 wherein the well proximity effect model models at least one of threshold voltage (V th ), a second-order body bias coefficient (K2) and effective mobility (μ eff ) as a function of SCA.

10. The method as claimed in claim 1 wherein sizing devices in the selected circuit topology and the determining a set of layout constraint values that satisfy the at least one predetermined performance or yield goal in accordance with a layout effect model are performed together.

11. A non-transitory computer-readable medium storing instructions, which, when executed by a processor, cause the processor to execute a method of proximity-aware circuit design for a selected circuit topology for a semiconductor circuit having at least one predetermined performance or yield goal, the method comprising:

for each device in the selected circuit topology, determining a set of layout constraint values that satisfy the at least one predetermined performance or yield goal in accordance with a layout effect model;

selecting one of the set of layout constraint values as a constraint input to layout a design for said each device; and

performing a design layout in accordance with the selected one of the set of layout constraint values for said each device to provide the semiconductor circuit design for a semiconductor circuit.

12. The non-transitory computer-readable medium as claimed in claim 11 wherein the method further comprises:

placing and routing each of devices in the selected circuit topology in accordance with its respective selected one of the set of layout constraint values to optimize the semiconductor circuit design in accordance with circuit specifications; and

verifying the semiconductor circuit design.

13. The non-transitory computer-readable medium as claimed in claim 11 wherein the selecting one of the set of layout constraint values as a constraint input to layout a design comprises:

selecting the one of the set of layout constraint values in view of trade-offs between performance and yield goals.

14. The non-transitory computer-readable medium as claimed in claim 11 wherein the layout effect model comprises at least one of a well proximity effect model, and a shallow trench isolation (STI) stress model.

15. The non-transitory computer-readable medium as claimed in claim 11 wherein the determining a set of layout constraint values that satisfy the at least one predetermined performance or yield goal in accordance with a layout effect model comprises:

varying an instance parameter of the layout effect model to determine a set of instance parameters that satisfy the at least one predetermined performance or yield goal in accordance with the layout effect model; and

determining layout constraints associated with each instance parameter of the set of instance parameters to provide the set of layout constraint values.

16. The non-transitory computer-readable medium as claimed in claim 11 wherein the determining a set of layout constraint values that satisfy the at least one predetermined performance or yield goal in accordance with a layout effect model comprises:

determining a set of minimum well distance values that satisfy the at least one predetermined performance or yield goal in accordance with a well proximity effect model.

17. The non-transitory computer-readable medium as claimed in claim 16 wherein the determining a set of minimum well distance values that satisfy the at least one predetermined performance or yield goal in accordance with a well proximity effect model comprises:

varying an instance parameter (SCA) representing an integral of a first distribution function for scattered well dopants to determine a set of instance parameters that satisfy the at least one predetermined performance or yield goal in accordance with the well proximity effect model; and

determining well keep-out constraints associated with each instance parameter of the set of instance parameters to provide the set of minimum well distance values.

18. The non-transitory computer-readable medium as claimed in claim 17 wherein the selecting one of the set of layout constraint values as a constraint input to layout a design comprises:

selecting one of the set of instance parameters in view of trade-offs between performance and yield goals; and

inputting minimum well distances corresponding to the selected one of the set of instance parameters as the constraint input.

19. The non-transitory computer-readable medium as claimed in claim 17 wherein the well proximity effect model models at least one of threshold voltage (V th ), a second-order body bias coefficient (K2) and effective mobility (μ eff ) as a function of SCA.

20. The non-transitory computer-readable medium as claimed in claim 11 wherein the determining a set of layout constraint values that satisfy the at least one predetermined performance or yield goal in accordance with a layout effect model is performed at the same time as sizing devices in the selected circuit topology.

Assignments (7)
MERGER AND CHANGE OF NAME Recorded Jun 9, 2021
From: MENTOR GRAPHICS CORPORATION; SIEMENS INDUSTRY SOFTWARE INC.
To: SIEMENS INDUSTRY SOFTWARE INC.
Reel/Frame 056526/0054 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 14, 2019
From: MENTOR GRAPHICS (CANADA) ULC
To: MENTOR GRAPHICS CORPORATION
Reel/Frame 047992/0327 →
CHANGE OF NAME Recorded Jan 14, 2019
From: MENTOR GRAPHICS (CANADA) LIMITED
To: MENTOR GRAPHICS (CANADA) ULC
Reel/Frame 048071/0691 →
MERGER AND CHANGE OF NAME Recorded May 7, 2018
From: SOLIDO DESIGN AUTOMATION INC.; MENTOR GRAPHICS (CANADA) LIMITED
To: MENTOR GRAPHICS (CANADA) LIMITED
Reel/Frame 045730/0583 →
FULL DISCHARGE OF SECURITY INTEREST Recorded Nov 28, 2017
From: COMERICA BANK
To: SOLIDO DESIGN AUTOMATION INC.
Reel/Frame 044837/0405 →
SECURITY AGREEMENT Recorded Jun 18, 2012
From: SOLIDO DESIGN AUTOMATION INC.
To: COMERICA BANK
Reel/Frame 028397/0236 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 15, 2010
From: DRENNAN, PATRICK G.; SILK, RYAN; COOPER, JOEL; DYCK, JEFFREY; SALLAM, SAMER; MCCONAGHY, TRENT LORNE
To: SOLIDO DESIGN AUTOMATION INC.
Reel/Frame 025363/0068 →