Broad band referencing reflectometer
A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized. Array based detection instrumentation may be exploited to permit the simultaneous collection of larger wavelength regions.
1. A reflectometer, comprising:
a light source that creates light including wavelengths below deep ultra-violet (DUV) wavelengths, the light being utilized to create at least one light beam in the reflectometer;
a region in which the light beam travels, the region sharing, at least at times, an environment with at least a portion of a process tool sample chamber so as to create a shared environment with the process tool sample chamber, the shared environment being sufficiently controlled so as to allow the transmission and measurement of light wavelengths below DUV wavelengths;
a detector configured to receive reflectance data from a sample located inside the process tool sample chamber during measurement of the reflectance, the detector detecting data for wavelengths at least below DUV wavelengths; and
at least one coupling mechanism interfacing the reflectometer with the process tool sample chamber and configured to permit the light from the light source to pass from the region into the sample chamber and to permit the light reflected from the sample to pass from the sample chamber to the first region so as to be received by the detector.
2. The reflectometer of claim 1 , wherein the region is external to the process tool sample chamber.
3. The reflectometer of claim 1 , and comprising a referencing mechanism configured to provide reference information to adjust reflectance data obtained from a sample in the process tool sample chamber to account for system or environmental changes.
4. The reflectometer of claim 1 , wherein the coupling mechanism is configured to interface with a planar portion of the process tool sample chamber.
5. The reflectometer of claim 1 , wherein the light source, the region, and the detector do not physically protrude into the process tool sample chamber.
6. A reflectometer, comprising:
a light source that creates light including wavelengths below deep ultra-violet (DUV) wavelengths, the light being utilized to create at least one light beam in the reflectometer;
a region in which the light beam travels, the region being external to a process tool sample chamber and sharing, at least at times, an environment with at least a portion of the process tool sample chamber so as to create a shared environment with the process tool sample chamber, the shared environment being sufficiently controlled so as to allow the transmission and measurement of light wavelengths below DUV wavelengths; and
a detector configured to receive reflectance data from a sample located inside the process tool sample chamber during measurement of the reflectance, the detector detecting data for wavelengths at least below DUV wavelengths.
7. The reflectometer of claim 6 , and comprising a referencing mechanism configured to provide reference information to adjust reflectance data obtained from a sample in the process tool sample chamber to account for system or environmental changes.
8. The reflectometer of claim 7 , wherein the referencing mechanism is configured to reference system or environmental changes in the shared environment between a reflectometer calibration time and the time when reflectance data from the sample is obtained.
9. The reflectometer of claim 7 , wherein the referencing mechanism comprises a reference beam light path.
10. The reflectometer of claim 9 , wherein at least a portion of the reference beam light path is located in the shared environment.
11. An optical reflectometer, comprising:
a light source providing a light beam including light below DUV wavelengths;
a plurality of optical elements configured to direct the light beam to and from a sample area;
a spectrometer that receives the light beam from the two-dimensional sample area, the spectrometer separating the light beam into multiple spatially separated wavelengths of light at an exit of the spectrometer; and
a two-dimensional array detector that receives the multiple spatially separated wavelengths of light, the array detector comprising pixels arranged as rows and columns so as to simultaneously measure a respective spectrum of reflectance below DUV wavelengths from each of multiple sites within the sample area.
12. The reflectometer of claim 11 , wherein at least one of the optical elements is a reflective optic.
13. The reflectometer of claim 11 , wherein at least one of the optical elements is coated with a broad-band reflective coating to enhance reflectivity below DUV wavelengths.
14. The reflectometer of claim 11 , wherein the array detector is a charge coupled device (CCD).
15. The reflectometer of claim 11 , and comprising a beam conditioning module, which is introduced in the light beam for the purposes of modifying the spectral, spatial or temporal characteristics of the light beam.
16. The reflectometer of claim 11 , wherein the array detector comprises a two-dimensional array of pixels, and wherein the wavelengths of the light and the locations of the sites are mapped across the array in respective, mutually-perpendicular directions.
17. The reflectometer of claim 11 , wherein the reflectance spectra include data for wavelengths less than 140 nm.
18. A method of analyzing reflectance characteristics of a sample, the method comprising:
directing a light beam including light below DUV wavelengths onto an area of a sample;
receiving at least a portion of the light beam reflected from the sample within an imaging spectrometer, which separates the reflected light beam into multiple spatially separated wavelengths of light at an exit plane of the spectrometer; and
receiving the multiple spatially separated wavelengths of light with a two-dimensional array detector in order to simultaneously measure a respective spectrum of reflectance below DUV wavelengths from each of multiple sites within the area of the sample.
19. The method of claim 18 , and comprising applying pattern recognition to the reflectance spectra.
20. The method of claim 18 , wherein the array detector comprises a two-dimensional array of pixels, and wherein the wavelengths of the light and the locations of the sites are mapped across the array in respective, mutually-perpendicular directions.