IP Library Granted Patent US 8,107,281
Granted Patent B2
US 8,107,281 · App. 12/879,544 · Granted Jan 31, 2012

Magnetoresistive element and magnetic memory

Assignees: Kabushiki Kaisha Toshiba; National Institute of Advanced Industrial Science and Technology
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Quick Facts
Patent No.
US 8,107,281
App. No.
12/879,544
Granted
Jan 31, 2012
Kind
B2
Abstract

According to one embodiment, a magnetoresistive element includes a first magnetic layer with a variable magnetization and an easy-axis in a perpendicular direction to a film surface, a second magnetic layer with an invariable magnetization and an easy-axis in the perpendicular direction, and a first nonmagnetic layer between the first and second magnetic layers. The first magnetic layer comprises a ferromagnetic material including an alloy in which Co and Pd, or Co and Pt are alternately laminated on an atomically close-packed plane thereof. The first magnetic layer has C-axis directing the perpendicular direction. And a magnetization direction of the first magnetic layer is changed by a current flowing through the first magnetic layer, the first nonmagnetic layer and the second magnetic layer.

Claims (37)

1. A magnetoresistive element comprising:

a first magnetic layer with a variable magnetization and an easy-axis in a perpendicular direction to a film surface;

a second magnetic layer with an invariable magnetization and an easy-axis in the perpendicular direction; and

a first nonmagnetic layer between the first and second magnetic layers,

wherein the first magnetic layer comprises a ferromagnetic material including an alloy in which Co and Pd, or Co and Pt are alternately laminated on an atomically close-packed plane thereof, the first magnetic layer has C-axis directing the perpendicular direction, and a magnetization direction of the first magnetic layer is changed by a current flowing through the first magnetic layer, the first nonmagnetic layer and the second magnetic layer.

2. The element of claim 1 ,

wherein the first magnetic layer further comprises nickel (Ni) or vanadium (V).

3. The element of claim 1 ,

wherein the first nonmagnetic layer is a magnesium oxide.

4. The element of claim 1 , further comprising:

a third magnetic layer which reduces or adjusts a leakage magnetic field from the second magnetic layer; and

a second nonmagnetic layer between the second and third magnetic layers,

wherein the third magnetic layer has an easy-axis in the perpendicular direction.

5. The element of claim 4 ,

wherein saturated magnetization M S2 and a film thickness t 2 of the second magnetic layer and saturated magnetization M S3 and a film thickness t 3 of the third magnetic layer satisfy a relationship of M S2 ×t 2 <M S3 ×t 3 , and

the magnetization directions of the second and third magnetic layers maintain an anti-parallel state.

6. The element of claim 1 , further comprising:

an interface layer between the second magnetic layer and the first nonmagnetic layer,

wherein the interface layer is an alloy (Co 100-x —Fe x ) 100-y B y including Co, Fe and B, where x≧20 at % and 0<y≦30 at %.

7. The element of claim 6 ,

wherein the interface layer has one of a cubic structure and a tetragonal structure, and is (100)-oriented.

8. The element of claim 1 , further comprising:

an interface layer between the first magnetic layer and the first nonmagnetic layer,

wherein the interface layer is an alloy (Co 100-x —Fe x ) 100-y B y including Co, Fe and B, where x≧20 at % and 0<y≦30 at %.

9. The element of claim 8 ,

wherein the interface layer has one of a cubic structure and a tetragonal structure, and is (100)-oriented.

10. A magnetic memory comprising:

a memory cell array having memory cells,

wherein each of the memory cells comprises:

the magnetoresistive element of claim 1 ; and

first and second electrodes sandwiching the magnetoresistive element and applying a current to the magnetoresistive element.

11. The memory of claim 10 , further comprising:

a first wiring line which is electrically connected to the first electrode;

a second wiring line which is electrically connected to the second electrode; and

a write circuit which is electrically connected to the first and second wiring lines and supplies the current to the magnetoresistive element.

12. The memory of claim 11 ,

wherein each of the memory cells includes a selective transistor which is electrically connected between the second electrode and the second wiring line.

Assignments (4)
CONFIRMATORY ASSIGNMENT Recorded Feb 7, 2020
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 051841/0432 →
CHANGE OF NAME Recorded Feb 7, 2020
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 051842/0789 →
MERGER AND CHANGE OF NAME Recorded Feb 7, 2020
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 051855/0531 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 16, 2010
From: KAI, TADASHI; NISHIYAMA, KATSUYA; NAGASE, TOSHIHIKO; YOSHIKAWA, MASATOSHI; KITAGAWA, EIJI; DAIBOU, TADAOMI; NAGAMINE, MAKOTO; NAKAYAMA, MASAHIKO; SHIMOMURA, NAOHARU; YODA, HIROAKI; YAKUSHIJI, KEI; YUASA, SHINJI; KUBOTA, HITOSHI; NAGAHAMA, TARO; FUKUSHIMA, AKIO; ANDO, KOJI
To: KABUSHIKI KAISHA TOSHIBA; NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
Reel/Frame 025369/0384 →
Priority Claims (1)
JP 2009-221569 · Sep 25, 2009 · national
Continuity (1)
Related Publication 20110073970A1 · Mar 31, 2011