Method and system for configurable contacts for implementing different bias designs of an integrated circuit device
View Patent ↗In a computer implemented synthesis system, a fabrication method for an integrated circuit device. The method includes receiving a circuit netlist representing a first form of an integrated circuit design to be realized in physical form. A plurality of contacts of the netlist are accessed. The plurality of contacts are configured to implement a second form of the integrated circuit design.
1. A method comprising:
using a computer to generate a circuit layout including a circuit element;
if a state of the circuit element in the circuit layout is a first state, allowing the circuit element in a mask generation process for fabrication of the circuit layout; and
if the state is a second state, omitting the circuit element from the mask generation process for fabrication of the circuit layout.
2. The method of claim 1 , wherein the circuit element comprises a contact.
3. The method of claim 2 , wherein the first state is a closed state.
4. The method of claim 3 , wherein the circuit layout includes a bias format independent of a substrate body bias arrangement.
5. The method of claim 2 , wherein the second state is an open state.
6. The method of claim 5 , wherein the circuit layout includes a bias format dependent on a substrate body bias arrangement.
7. The method of claim 1 further comprising:
if the state is the first state, forming a first version of the circuit layout; and
if the state is the second state, forming a second version of the circuit layout.
8. A method comprising:
using a computer to generate a circuit layout including a first version of a circuit element and a second version of the circuit element;
if a state of the first version of the circuit element is a first state, allowing the first version of the circuit element and the second version of the circuit element in a mask generation process for fabrication of the circuit layout; and
if the state of the first version is a second state, omitting the first version of the circuit element from the mask generation process for fabrication of the circuit layout and allowing the second version of the circuit element in the mask generation process for fabrication of the circuit layout.
9. The method of claim 8 , wherein the circuit element comprises a contact.
10. The method of claim 9 , wherein the first state is a closed state.
11. The method of claim 10 , wherein the circuit layout includes a bias format independent of a substrate body bias arrangement.
12. The method of claim 9 , wherein the second state is an open state.
13. The method of claim 12 , wherein the circuit layout includes a bias format dependent on a substrate body bias arrangement.
14. The method of claim 8 further comprising:
if the state of the first version is the first state, forming a first fabrication version of the circuit layout; and
if the state of the first version is the second state, forming a second fabrication version of the circuit layout.
15. A computer-readable storage device comprising computer-executable instructions stored therein, the computer-executable instructions comprising:
instructions to allow a circuit element of a circuit layout in a mask generation process for fabrication of the circuit layout if a state of the circuit element is a first state; and
instructions to omit the circuit element from the mask generation process for fabrication of the circuit layout if the state is a second state.
16. The computer-readable storage device of claim 15 , wherein the circuit element comprises a contact.
17. The computer-readable storage device of claim 16 , wherein the first state is a closed state.
18. The computer-readable storage device of claim 17 , wherein the circuit layout includes a bias format independent of a substrate body bias arrangement.
19. The computer-readable storage device of claim 16 , wherein the second state is an open state.
20. The computer-readable storage device of claim 19 , wherein the circuit layout includes a bias format dependent on a substrate body bias arrangement.