Cerium salt, producing method thereof, cerium oxide and cerium based polishing slurry
View Patent ↗A cerium salt wherein, when 20 g of the cerium salt is dissolved in a mixed liquid of 12.5 g of 6N nitric acid and 12.5 g of a 30% hydrogen peroxide aqueous solution, a concentration of an insoluble component present in the solution is 5 ppm or less by mass ratio to the cerium salt before dissolution and cerium oxide produced by processing the cerium salt at high temperatures. Scratch on a surface to be polished can be reduced when a cerium based polishing slurry containing the cerium oxide particles is used, since an amount of impurities in cerium oxide particles and cerium salt particles, raw material thereof, is reduced for high purification.
1. A producing method of a cerium based polishing slurry, which comprises
preparing a cerium salt,
dissolving the cerium salt in 6N nitric acid to obtain a solution,
separating and removing an insoluble component in the solution,
adding a precipitating agent to obtain a precipitate of a purified cerium salt after said removing, and
oxidizing the purified cerium salt to obtain cerium oxide.
2. The producing method of a cerium based polishing slurry according to claim 1 , wherein said separating and removing is executed so that when 20 g of the cerium salt is dissolved in a mixed liquid of 12.5 g of 6N nitric acid and 12.5 g of a 30% hydrogen peroxide aqueous solution, a concentration of an insoluble component present in the solution is 5 ppm or less by mass ratio.
3. The producing method of a cerium based polishing slurry according to claim 1 , wherein the insoluble component is a substance containing silicon.
4. The producing method of a cerium based polishing slurry according to claim 1 , which comprises further following steps before preparing the cerium salt:
obtaining cerium-containing intermediate solution from a cerium compound,
adding a precipitating agent to the cerium-containing intermediate solution to obtain a precipitate of a cerium salt.
5. The producing method of a cerium based polishing slurry according to claim 4 , wherein an insoluble component in the precipitating agent is previously separated and removed.
6. The producing method of a cerium based polishing slurry according to claim 4 , wherein the precipitating agent is in a solution state where the precipitating agent is dissolved in advance in a solvent and the insoluble component is separated and removed.
7. The producing method of a cerium based polishing slurry according to claim 1 , which comprises
subjecting said purified cerium salt to a high temperature process of 250° C. or more.
8. The producing method of a cerium based polishing slurry according to claim 1 , which further comprises pulverizing the cerium oxide mechanically.
9. The producing method of a cerium based polishing slurry according to claim 1 , which further comprises dispersing the cerium oxide in water.
10. The producing method of a cerium based polishing slurry according to claim 9 , which further comprises adding a dispersing agent.
11. The producing method of a cerium based polishing slurry according to claim 10 , wherein a weight average molecular weight of the dispersing agent is in the range of 100 to 50,000.
12. The producing method of a cerium based polishing slurry according to claim 9 , which further comprises adjusting a median value of secondary particle diameters of the cerium oxide particles in the cerium based polishing slurry to a range of 0.01 to 1.0 μm.
13. The producing method of a cerium based polishing slurry according to claim 1 , wherein the cerium salt includes cerium carbonate.