LIGHT-EMITTING DEVICE WITH A SEMI-REMOTE PHOSPHOR COATING
A complex lens and a light-emitting device comprising a complex lens are disclosed. At least one semiconductor die is disposed on a substrate. The complex lens is created by forming a first lens comprising a clear transparent material directly on a surface of each of at least one die, and by forming an outer lens comprising a clear transparent material filled uniformly with phosphor, directly encapsulating the substrate and the at least one die with the formed first lens. The outer lens is in contact with the substrate either directly or through an intervening reflective layer of the light-emitting device.
1 . A light-emitting device, comprising:
a sub-assembly, comprising
a substrate;
at least one semiconductor die disposed on the substrate; and
a first lens, comprising clear transparent material, formed directly on each of the at least one semiconductor die; and
a second lens comprising a phosphor filled transparent material disposed directly on the sub-assembly.
2 . The apparatus according to claim 1 , wherein the first lens is formed directly on the upper surface of each of the at least one semiconductor die.
3 . The apparatus according to claim 1 , wherein the first lens is formed directly on the exposed surfaces of each of the at least one semiconductor die.
4 . The apparatus according to claim 1 , wherein the first lens formed directly on each of the at least one semiconductor die is hemispherical shape.
5 . The apparatus according to claim 1 wherein the second lens is hemispherical shape.
6 . The apparatus according to claim 1 , wherein the upper face of the substrate is treated by polishing and/or buffing to acquire specific reflectivity.
7 . The apparatus according to claim 6 , further comprising:
a specular reflective layer applied on selected regions on the substrate; and
wherein the at least one semiconductor die is disposed on reserved regions on the substrate.
8 . The apparatus according to claim 1 , further comprising:
a diffusive reflective layer applied on selected regions on the substrate; and
wherein the at least one semiconductor die is disposed on reserved regions on the substrate.
9 . The apparatus according to claim 8 , wherein the diffusive reflective layer comprises titanium oxide.
10 . The apparatus according to claim 8 , wherein the diffusive reflective layer comprises oxide phases or compositions of titanium.
11 . A method for producing a light-emitting device, the method comprising:
disposing at least one semiconductor die on a substrate;
forming a first lens comprising clear transparent material directly on each of the at least one semiconductor die; and
forming a second lens comprising a phosphor filled transparent material directly encapsulating the substrate and the at least one semiconductor die with the formed first lens.
12 . The method according to claim 11 , wherein the forming a first lens comprises:
forming a first lens directly on the upper surface of each of the at least one semiconductor die.
13 . The method according to claim 11 , wherein the forming a first lens comprises:
forming a first lens directly on the exposed surfaces of each of the at least one semiconductor die.
14 . The method according to claim 11 , wherein the first lens formed directly on each of the at least one semiconductor die is hemispherical shape.
15 . The method according to claim 11 wherein the second lens is hemispherical shape.
16 . The method according to claim 11 , further comprising:
treating the upper face of the substrate by polishing and/or buffing to acquire specific reflectivity.
17 . The method according to claim 11 , further comprising:
applying a specular reflective layer on selected regions on the substrate; and
wherein the at least one semiconductor die is disposed on reserved regions on the substrate.
18 . The method according to claim 11 , further comprising:
applying a diffusive reflective layer on selected regions on the substrate; and
wherein the at least one semiconductor die is disposed on reserved regions on the substrate.
19 . The method according to claim 18 , wherein the diffusive reflective layer comprises titanium oxide.
20 . The method according to claim 18 , wherein the diffusive reflective layer comprises oxide phases or compositions of titanium.