Method of determining an asymmetric property of a structure
Methods of determining asymmetric properties of structures are described. A method includes measuring, for a grating structure, a first signal and a second, different, signal obtained by optical scatterometry. A difference between the first signal and the second signal is then determined. An asymmetric structural parameter of the grating structure is determined based on a calculation using the first signal, the second signal, and the difference.
1. A method of determining and applying an asymmetric property of a structure, the method comprising:
measuring for a grating structure, a first signal and a second, different, signal obtained by optical scatterometry of the grating structure, the measurement of the first signal and second signal being performed by an optical metrology tool of an optical metrology system;
calculating with a processor of the optical metrology system:
a differential signal, the differential signal being a mathematical difference between the first signal and the second signal calculated by subtracting one of the first signal and the second signal from the other of the first signal and the second signal, and
a value of an asymmetric structural parameter of the grating structure based on a calculation using the first signal, the second signal, and the calculated differential signal; and
altering one or more parameters or settings for fabrication based at least in part on the calculated asymmetric structural parameter of the grating structure;
wherein the first signal and the second signal are measured according to one of the following:
the first signal and the second signal are measured at first and second azimuth angles, respectively, of the grating structure,
the first signal and the second signal are measured for first and second angles of incidence, respectively, of the grating structure,
the first signal and the second signal are measured at first and second polarizer/analyzer angles, respectively, of the grating structure, or
the first signal and the second signal are measured for first and second measurement targets, respectively, of the grating structure.
2. The method of claim 1 , wherein the calculation of the asymmetric structural parameter using the first signal, the second signal, and the calculated differential signal is a regression calculation.
3. The method of claim 2 , wherein calculating the value of the asymmetric structural parameter further comprises simultaneously using one or more non-differential signals in the calculation, the one or more non-differential signals selected from the group consisting of signals determined using azimuth angles, angles of incidence, polarizer/analyzer angles, and additional measurement targets.
4. The method of claim 1 , wherein the optical scatterometry performed by the optical metrology system is a technique selected from the group consisting of optical spectroscopic ellipsometry (SE), beam profile reflectometry (BPR), and enhanced ultra-violet reflectrometry (eUVR).
5. The method of claim 1 , wherein calculating the asymmetric structural parameter of the grating structure based on the calculation using the first signal, the second signal, and the calculated differential signal comprises solving for Asymmetric Factor
η
=
∑
i
=
1
n
d
i
2
,
where d i is a differential signal with i=1, . . . , n.
6. The method of claim 1 , wherein calculating the value of the asymmetric structural parameter of the grating structure based on the calculation using the first signal, the second signal, and the calculated differential signal includes solving for η=Σ i=1 n Δα 2 (λ i )+Σ i=1 n Δβ 2 (λ i ).
7. A non-transitory machine-accessible storage medium having instructions stored thereon which cause a data processing system to perform a method of determining and applying an asymmetric property of a structure, the method comprising:
measuring, for a grating structure, a first signal and a second, different, signal obtained by optical scatterometry of the grating structure, the measurement of the first signal and second signal being performed by an optical metrology tool of an optical metrology system;
calculating with a processor of the optical metrology system:
a differential signal, the differential signal being a mathematical difference between the first signal and the second signal calculated by subtracting one of the first signal and the second signal from the other of the first signal and the second signal, and
a value of an asymmetric structural parameter of the grating structure based on a calculation using the first signal, the second signal, and the calculated differential signal; and
altering one or more parameters or settings for fabrication based at least in part on the calculated asymmetric structural parameter of the grating structure;
wherein the first signal and the second signal are measured according to one of the following:
the first signal and the second signal are measured at first and second azimuth angles, respectively, of the grating structure,
the first signal and the second signal are measured for first and second angles of incidence, respectively, of the grating structure,
the first signal and the second signal are measured at first and second polarizer/analyzer angles, respectively, of the grating structure, or
the first signal and the second signal are measured for first and second measurement targets, respectively, of the grating structure.
8. The storage medium as in claim 7 , wherein the calculation of the asymmetric structural parameter is a regression calculation.
9. The storage medium as in claim 8 , wherein determining the structural parameter further comprises simultaneously using one or more non-differential signals in the calculation, the one or more non-differential signals selected from the group consisting of signals determined using azimuth angles, angles of incidence, polarizer/analyzer angles, and additional measurement targets.
10. The storage medium as in claim 7 , wherein the optical scatterometry performed by the optical metrology system is a technique selected from the group consisting of optical spectroscopic ellipsometry (SE), beam profile reflectometry (BPR), and enhanced ultra-violet reflectrometry (eUVR).
11. The storage medium as in claim 7 , wherein calculating the asymmetric structural parameter of the grating structure based on the calculation using the first signal, the second signal, and the calculated differential signal comprises solving for Asymmetric Factor
η
=
∑
i
=
1
n
d
i
2
,
where d i is a differential signal with i=1, . . . , n.
12. The medium of claim 7 , wherein calculating the value of the asymmetric structural parameter of the grating structure based on the calculation using the first signal, the second signal, and the calculated differential signal includes solving for η=Σ i=1 n Δα 2 (λ i )+Σ i=1 n Δβ 2 (λ i ).
13. A method of determining and applying an asymmetric property of a structure, the method comprising:
measuring for a grating structure, a first signal and a second, different, signal obtained by optical scatterometry of the grating structure, the measurement of the first signal and second signal being performed by an optical metrology tool of an optical metrology system;
calculating with a processor of the optical metrology system:
a differential signal, the differential signal being a mathematical difference between the first signal and the second signal calculated by subtracting one of the first signal and the second signal from the other of the first signal and the second signal, and
a value of an asymmetric structural parameter of the grating structure based on a calculation using the first signal, the second signal, and the calculated differential signal; and
altering one or more parameters or settings for fabrication based at least in part on the calculated asymmetric structural parameter of the grating structure;
wherein the asymmetric structural parameter is either:
a sidewall angle of the grating structure, and wherein the grating structure has a first sidewall with a first sidewall angle and a second sidewall with a second, different, sidewall angle, or
selected from the group consisting of top corner roundings, bottom footings, critical dimension (CD) pitch shifts of the grating structure.
14. A method of determining and applying an asymmetric property of a structure, the method comprising:
measuring for a grating structure, a first signal and a second, different, signal obtained by optical scatterometry of the grating structure, the measurement of the first signal and second signal being performed by an optical metrology tool of an optical metrology system;
calculating with a processor of the optical metrology system:
a differential signal, the differential signal being a mathematical difference between the first signal and the second signal calculated by subtracting one of the first signal and the second signal from the other of the first signal and the second signal, and
a value of an asymmetric structural parameter of the grating structure based on a calculation using the first signal, the second signal, and the calculated differential signal; and
altering one or more parameters or settings for fabrication based at least in part on the calculated asymmetric structural parameter of the grating structure;
wherein the grating structure is either:
composed of a first material and further comprises sidewall spacers composed of a second, different material, and wherein the asymmetric structural parameter is selected from the group consisting of sidewall spacer width and sidewall spacer height of the grating structure, or
composed of a first material and further comprises a first sidewall spacer composed of a second material and a second sidewall spacer composed of a third material and on an opposite sidewall from the first sidewall spacer, and wherein the asymmetric structural parameter is the composition difference between the second and third materials.
15. A non-transitory machine-accessible storage medium having instructions stored thereon which cause a data processing system to perform a method of determining and applying an asymmetric property of a structure, the method comprising:
measuring, for a grating structure, a first signal and a second, different, signal obtained by optical scatterometry of the grating structure, the measurement of the first signal and second signal being performed by an optical metrology tool of an optical metrology system;
calculating with a processor of the optical metrology system:
a differential signal, the differential signal being a mathematical difference between the first signal and the second signal calculated by subtracting one of the first signal and the second signal from the other of the first signal and the second signal, and
a value of an asymmetric structural parameter of the grating structure based on a calculation using the first signal, the second signal, and the calculated differential signal; and
altering one or more parameters or settings for fabrication based at least in part on the calculated asymmetric structural parameter of the grating structure;
wherein the asymmetric structural parameter is either:
a sidewall angle of the grating structure, and wherein the grating structure has a first sidewall with a first sidewall angle and a second sidewall with a second, different, sidewall angle, or
selected from the group consisting of top corner roundings, bottom footings, and critical dimension (CD) pitch shifts of the grating structure.
16. A non-transitory machine-accessible storage medium having instructions stored thereon which cause a data processing system to perform a method of determining and applying an asymmetric property of a structure, the method comprising:
measuring, for a grating structure, a first signal and a second, different, signal obtained by optical scatterometry of the grating structure, the measurement of the first signal and second signal being performed by an optical metrology tool of an optical metrology system;
calculating with a processor of the optical metrology system:
a differential signal, the differential signal being a mathematical difference between the first signal and the second signal calculated by subtracting one of the first signal and the second signal from the other of the first signal and the second signal, and
a value of an asymmetric structural parameter of the grating structure based on a calculation using the first signal, the second signal, and the calculated differential signal; and
altering one or more parameters or settings for fabrication based at least in part on the calculated asymmetric structural parameter of the grating structure;
wherein the grating structure is either:
composed of a first material and further comprises sidewall spacers composed of a second, different material, and wherein the asymmetric structural parameter is selected from the group consisting of sidewall spacer width and sidewall spacer height, or
composed of a first material and further comprises a first sidewall spacer composed of a second material and a second sidewall spacer composed of a third material and on an opposite sidewall from the first sidewall spacer, and wherein the asymmetric structural parameter is the composition difference between the second and third materials.