IP Library › Assignment 035055/0683
Patent Assignment
Reel/Frame 035055/0683

Assignment of Assignor's Interest

Recorded: 2015-02-18 Pages: 30
Assignor
TOKYO ELECTRON LIMITED
Executed: 2015-01-13
Assignee
KLA-TENCOR CORPORATION
ONE TECHNOLOGY DRIVE, MILPITAS, CALIFORNIA, 95035
Covered Properties (52)
Determination of Material Optical Properties for Optical Metrology of Structures
Computation Efficiency by Iterative Spatial Harmonics Order Truncation
Method for Automated Determination of an Optimally Parameterized Scatterometry Model
Method of Determining an Asymmetric Property of a Structure
Wide Process Range Library for Metrology
Accurate and Fast Neural Network Training for Library-Based Critical Dimension (Cd) Metrology
Method of Optimizing an Optical Parametric Model for Structural Analysis Using Optical Critical Dimension (Ocd) Metrology
Process Variation-Based Model Optimization for Metrology
Library Generation with Derivatives in Optical Metrology
Techniques for Optimized Scatterometry
Numerical Aperture Integration in Raleigh Wavelengths for Optical Critical Dimension (Ocd) Metrology
Model Optimization Approach Based on Spectral Sensitivity
Method of Electromagnetic Modeling of Finite Structures and Finite Illumination for Metrology and Inspection
Dynamic Removal of Correlation of Highly Correlated Parameters for Optical Metrology
Automatic Wavelength or Angle Pruning for Optical Metrology
Automatic Determination of Fourier Harmonic Order for Computation of Spectral Information for Diffraction Structures
Neural Network Based Hermite Interpolator for Scatterometry Parameter Estimation
Patent: 8,108,328 →
Application: 12/175,271 →
Publication: US 2010/0017351
Computation Efficiency by Diffraction Order Truncation
Patent: 9,625,937 →
Application: 12/193,341 →
Publication: US 2010/0042388
Rational Approximation and Continued-Fraction Approximation Approaches for Computation Efficiency of Diffraction Signals
Patent: 8,560,270 →
Application: 12/331,192 →
Publication: US 2010/0145655
Hybrid Diffraction Modeling of Diffracting Structures
Patent: 8,195,435 →
Application: 12/340,421 →
Publication: US 2010/0157315
Determination of Material Optical Properties for Optical Metrology of Structures
Application: 12/775,392 →
Publication: US 2011/0276319
Computation Efficiency by Iterative Spatial Harmonics Order Truncation
Patent: 9,523,800 →
Application: 12/785,310 →
Publication: US 2011/0288822
Determination of Training Set Size for a Machine Learning System
Patent: 8,452,718 →
Application: 12/813,431 →
Publication: US 2011/0307424
Method for Automated Determination of an Optimally Parameterized Scatterometry Model
Patent: 8,666,703 →
Application: 12/841,932 →
Publication: US 2012/0022836
Method of Determining an Asymmetric Property of a Structure
Patent: 9,239,522 →
Application: 12/900,863 →
Publication: US 2012/0086940
Wide Process Range Library for Metrology
Patent: 8,381,140 →
Application: 13/025,654 →
Publication: US 2012/0210289
Accurate and Fast Neural network Training for Library-Based Critical Dimension (CD) Metrology
Patent: 8,577,820 →
Application: 13/041,253 →
Publication: US 2012/0226644
Optimizing an Optical Parametric Model for Structural Analysis Using Optical Critical Dimension (Ocd) Metrology
Patent: 9,310,296 →
Application: 13/164,398 →
Publication: US 2012/0323356
Process Variation-Based Model Optimization for Metrology
Application: 13/286,079 →
Publication: US 2013/0110477
Numerical Aperture Integration for Optical Critical Dimension (Ocd) Metrology
Patent: 8,762,100 →
Application: 13/371,317 →
Library Generation with Derivatives in Optical Metrology
Application: 13/610,613 →
Publication: US 2013/0158957
Numerical Aperture Integration for Optical Critical Dimension (Ocd) Metrology
Patent: 8,670,948 →
Application: 13/656,487 →
Publication: US 2013/0211760
Techniques for Optimized Scatterometry
Patent: 9,127,927 →
Application: 13/712,734 →
Publication: US 2013/0158948
Model Optimization Approach Based on Spectral Sensitivity
Application: 13/781,474 →
Publication: US 2013/0262044
Optical Parametric Model Optimization
Patent: 9,435,735 →
Application: 13/889,655 →
Accurate and Fast Neural Network Training for Library-Based Critical Dimension (Cd) Metrology
Patent: 9,607,265 →
Application: 14/044,729 →
Publication: US 2014/0032463
Method of Electromagnetic Modeling of Finite Structures and Finite Illumination for Metrology and Inspection
Patent: 9,291,554 →
Application: 14/170,150 →
Publication: US 2014/0222380
Dynamic Removal of Correlation of Highly Correlated Parameters for Optical Metrology
Application: 14/293,221 →
Publication: US 2014/0358488
Automatic Wavelength or Angle Pruning for Optical Metrology
Application: 14/293,625 →
Publication: US 2014/0358485
Automatic Determination of Fourier Harmonic Order for Computation of Spectral Information for Diffraction Structures
Application: 14/293,809 →
Publication: US 2014/0358476
Optimized Spatial Modeling for Optical Cd Metrology
Patent: 9,915,522 →
Application: 14/294,540 →
Automatic Selection of Sample Values for Optical Metrology
Application: 14/542,546 →
Publication: US 2015/0142395
Library Generation with Derivatives in Optical Metrology
Application: 61/576,817 →
Hybrid Derivatives in Optical Scatterometry
Application: 61/576,825 →
Model Optimization Method Based on Spectral Sensitivity
Application: 61/616,971 →
Method of Optimizing Optical Parametric Models
Application: 61/644,147 →
Method of Electromagnetic Modeling of Finite Structures and Finite Illumination for Metrology and Inspection
Application: 61/761,146 →
Dynamically removing correlation of highly-correlated parameters in optical metrology
Application: 61/830,533 →
Optimized spatial modeling for optical CD metrology
Application: 61/830,536 →
Automatic Wavelength and/or Angle Pruning for More Accurate Optical Metrology
Application: 61/830,543 →
Fast Automatic Determination of Fourier Harmonic Order for RCWA
Application: 61/831,085 →
Recommended Sampling Shape and Auto-selection of Populated Parameter Space
Application: 61/904,625 →
Related Assignments (15)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Jul 21, 2008
From: HENCH, JOHN J.
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 021263/0951 →
Assignment of Assignor's Interest Nov 10, 2008
From: BISCHOFF, JOERG; LI, SHIFANG; YANG, WEIDONG; CHU, HANYOU
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 021808/0949 →
Assignment of Assignor's Interest Dec 9, 2008
From: CHU, HANYOU
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 021950/0129 →
Assignment of Assignor's Interest Jan 12, 2009
From: BISCHOFF, JOERG
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 022091/0857 →
Assignment of Assignor's Interest Jun 9, 2010
From: MADSEN, JONATHAN MICHAEL; YANG, WEIDONG
To: KLA-TENCOR CORPORATION; TOKYO ELECTRON LIMITED
Reel/Frame 024511/0711 →
Assignment of Assignor's Interest Jun 9, 2010
From: VELDMAN, ANDREI; HENCH, JOHN J.
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 024511/0325 →
Assignment of Assignor's Interest Jul 16, 2010
From: JIN, WEN; VUONG, VI; MIEHER, WALTER DEAN
To: KLA - TENCOR CORPORATION; TOKYO ELECTRON LIMITED
Reel/Frame 024699/0063 →
Assignment of Assignor's Interest Sep 14, 2010
From: FERNS, JASON; HENCH, JOHN J.; KOMAROV, SERGUEI; DZIURA, THADDEUS
To: KLA - TENCOR CORPORATION; TOKYO ELECTRON LIMITED
Reel/Frame 024986/0590 →
Assignment of Assignor's Interest Dec 28, 2010
From: SHIH, MENG-FU; KIM, IN-KYO; ZHANG, XIAFANG; POSLAVSKY, LEONID
To: TOKYO ELECTRON LIMITED
Reel/Frame 025544/0964 →
Assignment of Assignor's Interest Apr 27, 2011
From: HENCH, JOHN J.; JIN, WEN; BAO, JUNWEI
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 026189/0176 →
Assignment of Assignor's Interest May 4, 2011
From: JIN, WEN; VUONG, VI; BAO, JUNWEI; LEE, LIE-QUAN
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 026222/0331 →
Assignment of Assignor's Interest May 11, 2011
From: SHIH, MENG-FU; KIM, IN-KYO; ZHANG, XIAFANG; POSLAVSKY, LEONID
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 026261/0483 →
Assignment of Assignor's Interest Aug 30, 2011
From: DZIURA, THADDEUS G.; CHUANG, YUNG-HO; TSAI, BIN-MING BENJAMIN; LIU, XUEFENG
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 026830/0964 →
Assignment of Assignor's Interest Jun 30, 2014
From: ILORETA, JONATHAN; AOYAGI, PAUL; CHU, HANYOU; CHARD, JEFFREY
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 033210/0033 →
Corrective Assignment to Correct the Conveying Party Name Previously Recorded at Reel: 033210 Frame: 0033. Assignor(S) Hereby Confirms the Assignment. Jan 23, 2015
From: ILORETA, JONATHAN; AOYAGI, PAUL; CHU, HANYOU; CHARD, JEFFREY
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 034806/0983 →