IP Library Patent Application 13610613
Patent Application
App. No. 13/610,613

LIBRARY GENERATION WITH DERIVATIVES IN OPTICAL METROLOGY

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Quick Facts
Patent No.
US None
App. No.
13/610,613
Abstract

Methods of library generation with derivatives for optical metrology are described. For example, a method of generating a library for optical metrology includes determining a function of a parameter data set for one or more repeating structures on a semiconductor substrate or wafer. The method also includes determining a first derivative of the function of the parameter data set. The method also includes providing a spectral library based on both the function and the first derivative of the function.

Claims (38)

1 . A method of generating a library for optical metrology, the method comprising:

determining a function of a parameter data set for one or more repeating structures on a semiconductor substrate or wafer;

determining a first derivative of the function of the parameter data set; and

providing a spectral library based on both the function and the first derivative of the function.

2 . The method of claim 1 , wherein determining the first derivative comprises determining an analytical derivative of the function of the parameter data set.

3 . The method of claim 1 , wherein determining the first derivative comprises determining a numerical derivative of the function of the parameter data set.

4 . The method of claim 1 , the method further comprising:

determining a higher order derivative of the function of the parameter data set, wherein providing the spectral library is further based on the higher order derivative of the function.

5 . The method of claim 1 , wherein determining the first derivative comprises determining both an analytical derivative and a numerical derivative of the function of the parameter data set.

6 . The method of claim 1 , wherein determining the function of the parameter data set comprises determining a function of a shape profile of the one or more repeating structures.

7 . The method of claim 1 , wherein determining the function of the parameter data set comprises determining a function of a material composition of the one or more repeating structures.

8 . The method of claim 1 , wherein providing the spectral library comprises training a neural network using both the function and the first derivative of the function.

9 . The method of claim 1 , wherein the spectral library comprises a simulated spectrum, the method further comprising:

comparing the simulated spectrum to a sample spectrum.

10 . A non-transitory machine-accessible storage medium having instructions stored thereon which cause a data processing system to perform a method of generating a library for optical metrology, the method comprising:

determining a function of a parameter data set for one or more repeating structures on a semiconductor substrate or wafer;

determining a first derivative of the function of the parameter data set; and

providing a spectral library based on both the function and the first derivative of the function.

11 . The non-transitory storage medium as in claim 10 , wherein determining the first derivative comprises determining an analytical derivative of the function of the parameter data set.

12 . The non-transitory storage medium as in claim 10 , wherein determining the first derivative comprises determining a numerical derivative of the function of the parameter data set.

13 . The non-transitory storage medium as in claim 10 , the method further comprising:

determining a higher order derivative of the function of the parameter data set, wherein providing the spectral library is further based on the higher order derivative of the function.

14 . The non-transitory storage medium as in claim 10 , wherein determining the first derivative comprises determining both an analytical derivative and a numerical derivative of the function of the parameter data set.

15 . The non-transitory storage medium as in claim 10 , wherein determining the function of the parameter data set comprises determining a function of a shape profile of the one or more repeating structures.

16 . The non-transitory storage medium as in claim 10 , wherein determining the function of the parameter data set comprises determining a function of a material composition of the one or more repeating structures.

17 . The non-transitory storage medium as in claim 10 , wherein providing the spectral library comprises training a neural network using both the function and the first derivative of the function.

18 . The non-transitory storage medium as in claim 10 , wherein the spectral library comprises a simulated spectrum, the method further comprising:

comparing the simulated spectrum to a sample spectrum.

19 . A system to generate a simulated diffraction signal to determine process parameters of a wafer application to fabricate a structure on a wafer using optical metrology, the system comprising:

a fabrication cluster configured to perform a wafer application to fabricate a structure on a wafer, wherein one or more process parameters characterize behavior of structure shape or layer thickness when the structure undergoes processing operations in the wafer application performed using the fabrication cluster;

an optical metrology system configured to determine the one or more process parameters of the wafer application, the optical metrology system comprising:

a beam source and detector configured to measure a diffraction signal of the structure;

a spectral library of simulated diffraction signals, the spectral library based on both a function and a first derivative of the function of a parameter data set of a plurality of model structures; and

a processor configured to determine, from the plurality of model structures, a model of the structure.

20 . The system of claim 19 , wherein the first derivative is an analytical derivative.

21 . The system of claim 19 , wherein the first derivative is a numerical derivative.

22 . The system of claim 19 , wherein the spectral library is further based on a higher order derivative of the function of the parameter data set.

23 . The system of claim 19 , wherein the processor is further configured to compare a simulated spectrum of the spectral library with a sample spectrum of the structure.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 18, 2015
From: TOKYO ELECTRON LIMITED
To: KLA-TENCOR CORPORATION
Reel/Frame 035055/0683 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 6, 2012
From: LEE, LIE-QUAN; POSLAVSKY, LEONID
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 029247/0944 →