Conformal coating of highly structured surfaces
Method of applying a conformal coating to a highly structured substrate and devices made by the disclosed methods are disclosed. An example method includes the deposition of a substantially contiguous layer of a material upon a highly structured surface within a deposition process chamber. The highly structured surface may be associated with a substrate or another layer deposited on a substrate. The method includes depositing a material having an amorphous structure on the highly structured surface at a deposition pressure of equal to or less than about 3 mTorr. The method may also include removing a portion of the amorphous material deposited on selected surfaces and depositing additional amorphous material on the highly structured surface.
1. A method of applying a conformal coating to a highly structured substrate comprising:
providing a deposition process chamber comprising a deposition source;
associating a surface with the deposition process chamber wherein the surface comprises a direct deposition surface having a substantial surface area not shaded from the deposition source and the surface further comprises an indirect deposition surface having a substantial surface area at least partially shaded from the deposition source;
depositing a substantially contiguous layer of a material having an amorphous structure on the direct deposition surface and the indirect deposition surface at a deposition pressure of equal to or less than about 3 mTorr;
removing a portion of the amorphous material deposited on the direct deposition surface; and
depositing additional amorphous material on the direct deposition surface and the indirect deposition surface.
2. The method of applying a conformal coating to a highly structured surface of claim 1 wherein the amorphous material is deposited at a deposition pressure of equal to or less than about 0.5 mTorr.
3. The method of applying a conformal coating to a highly structured surface of claim 1 wherein the amorphous material is deposited by RF-DC mixed sputtering.
4. The method of applying a conformal coating to a highly structured surface of claim 1 further comprising depositing the amorphous material without supplemental heating of the highly structured surface.
5. The method of applying a conformal coating to a highly structured surface of claim 1 further comprising depositing a substantially contiguous layer of a transparent conducting oxide having an amorphous structure on the direct deposition surface and the indirect deposition surface.
6. The method of applying a conformal coating to a highly structured surface of claim 5 further comprising depositing an InZnO alloy having amorphous structure.
7. The method of applying a conformal coating to a highly structured surface of claim 1 further comprising removing a portion of the amorphous material deposited on the direct deposition surface by ion milling.
8. The method of applying a conformal coating to a highly structured surface of claim 1 further comprising applying a protective coating to the indirect deposition surface.
9. The method of applying a conformal coating to a highly structured surface of claim 8 further comprising removing a portion of the amorphous material deposited on the direct deposition surface by one of ion milling and chemical etching.
10. A method of applying a conformal coating to a highly structured surface comprising:
providing a deposition process chamber comprising a deposition source;
associating a surface with the deposition process chamber wherein the surface comprises multiple direct deposition surfaces having a substantial surface area not shaded from the deposition source and the surface further comprises multiple indirect deposition surfaces having a substantial surface area at least partially shaded from the deposition source;
depositing a substantially contiguous layer of a material having a substantially amorphous structure on the direct deposition surface and the indirect deposition surface;
removing a portion of the amorphous material deposited on the direct deposition surface; and
depositing additional amorphous material on the direct deposition surface and the indirect deposition surface.
11. The method of applying a conformal coating to -a highly structured surface of claim 10 further comprising removing a portion of the amorphous material deposited on the direct deposition surface by ion milling.
12. The method of applying a conformal coating to a highly structured surface of claim 10 further comprising applying a protective coating to the indirect deposition surface.
13. The method of applying a conformal coating to a highly structured surface of claim 12 further comprising removing a portion of the amorphous material deposited on the direct deposition surface by one of ion milling and chemical etching.
14. The method of applying a conformal coating to a highly structured surface of claim 10 wherein the amorphous material is deposited at a deposition pressure of equal to or less than about 0.5 mTorr.
15. The method of applying a conformal coating to a highly structured surface of claim 10 wherein the amorphous material is deposited by RF-DC mixed sputtering.
16. The method of applying a conformal coating to a highly structured surface of claim 10 further comprising depositing the amorphous material without supplemental heating of the highly structured surface.
17. The method of applying a conformal coating to a highly structured surface of claim 10 further comprising depositing a substantially contiguous layer of a transparent conducting oxide having an amorphous structure on the direct deposition surface and the indirect deposition surface.
18. The method of applying a conformal coating to a highly structured surface of claim 17 further comprising depositing an InZnO alloy having a substantially amorphous structure.