Plasma Resistant Processing Apparatus
There is provided a processing apparatus undergoing various treatments using plasma and protected from plasma so as not to be damaged. The processing apparatus is one using plasma and having a protective layer comprising a fluorine-containing elastomer on the whole or a part of a surface exposed to plasma in the processing apparatus.
1 . A processing apparatus using plasma, which has a protective layer comprising a fluorine-containing elastomer (A) on the whole or a part of surfaces exposed to plasma in the processing apparatus.
2 . The processing apparatus of claim 1 , wherein the fluorine-containing elastomer (A) is a not-crosslinked fluorine-containing elastomer.
3 . The processing apparatus of claim 1 , wherein the fluorine-containing elastomer (A) is a crosslinked fluorine-containing elastomer.
4 . The processing apparatus of claim 1 , wherein the fluorine-containing elastomer (A) further comprises a filler.
5 . The processing apparatus of claim 1 , wherein the fluorine-containing elastomer (A) is a perfluoroelastomer.
6 . The processing apparatus of claim 1 , wherein the protective layer is provided at least on a surface of an edge portion exposed to plasma in the processing apparatus.
7 . The processing apparatus of claim 1 , wherein the protective layer is provided at least on a surface profiling a small space exposed to plasma in the processing apparatus.
8 . The processing apparatus of claim 1 , wherein the processing apparatus using plasma is a plasma etching equipment.
9 . The processing apparatus of claim 1 , wherein the processing apparatus using plasma is a plasma CVD equipment.
10 . The processing apparatus of claim 1 , wherein the processing apparatus using plasma is an ashing equipment.