Composition, resist film, pattern forming method, and inkjet recording method

1. A composition comprising:

any of compounds of the formula A-LG in which A represents any of residues of general formula (A-1) below and LG represents any of groups that are cleaved to generate acids of the formula A-H when acted on by an acid; and

at least one of a compound that generates an acid when exposed to actinic rays or radiation and a compound that generates an acid when heated,

in which

each of R 20 and R 21 independently represents an organic group, provided that R 20 and R 21 may be bonded to each other to form a ring, and

G represents a carbon atom, a sulfur atom or S═O,

wherein the formula A-LG is represented by any of general formulae (1) (2), (3) and (5) below,

in the formulae,

each of R 1 to R 4 , R 7 to R 11 and R 15 to R 19 independently represents a hydrogen atom or a monovalent substituent,

each of R 5 and R 6 independently represents a monovalent substituent, and

A represents any of residues of the general formula (A-1).

2. The composition according to claim 1 , wherein A is any of residues of general formula (A-2) below,

in which

each of R 20 and R 21 independently represents an organic group, provided that R 20 and R 21 may be bonded to each other to thereby form a ring.

3. The composition according to claim 2 , wherein A is any of residues of general formula (A-3) below,

in which

each of Xf's independently represents a fluorine atom or an alkyl group having at least one hydrogen atom thereof substituted with a fluorine atom, and

each of m and n independently is an integer of 1 to 20.

4. The composition according to claim 1 , wherein the formula A-LG is represented by the general formula (1).

5. The composition according to claim 1 , which contains the compound that generates an acid when exposed to actinic rays or radiation, and further contains a resin that is decomposed to thereby increase its solubility in an alkali developer when acted on by an acid.

6. The composition according to claim 5 to be exposed to electron beams, X-rays or EUV light.

7. A resist film formed by the composition according to claim 5 .

8. A method of forming a pattern, comprising:

forming the composition of claim 5 into a film,

exposing the film, and

developing the exposed film.

9. The composition according to claim 1 , further comprising at least one of an acid crosslinking agent and a cationically polymerizable compound.

10. The composition according to claim 9 , which contains the compound that generates an acid when exposed to actinic rays or radiation.

11. A method of inkjet recording, comprising:

discharging the composition of claim 10 onto a recording medium, and

exposing the discharged composition to actinic rays or radiation to harden the composition.

12. Compounds of general formula (A1-1) below,

in which

each of R 20 and R 21 independently represents an organic group, provided that R 20 and R 21 may be bonded to each other to thereby form a ring,

G represents a carbon atom, a sulfur atom or S═O,

each of R 1 to R 4 independently represents a hydrogen atom or a monovalent substituent, and

each of R 5 and R 6 independently represents a monovalent substituent.

13. A composition comprising:

any of compounds of the formula A-LG in which A represents any of residues of general formula (A-4) below and LG represents any of groups that are cleaved to generate acids of the formula A-H when acted on by an acid; and

at least one of a compound that generates an acid when exposed to actinic rays or radiation and a compound that generates an acid when heated,

in which

each of Xf's independently represents a fluorine atom or an alkyl group having at least one hydrogen atom thereof substituted with a fluorine atom,

each of R's independently represents a hydrogen atom, a fluorine atom, an alkyl group, or an alkyl group having at least one hydrogen atom thereof substituted with a fluorine atom,

L, or when z≧2 each of L's independently, represents a single bond or a bivalent connecting group,

E represents a group with a cyclic structure,

each of n and x independently is an integer of 1 to 20,

y is an integer of 0 to 10, and

z is an integer of 0 to 10.

14. The composition according to claim 13 , which contains the compound that generates an acid when exposed to actinic rays or radiation, and further contains a resin that is decomposed to thereby increase its solubility in an alkali developer when acted on by an acid.

15. The composition according to claim 13 , wherein the formula A-LG is represented by any of general formulae (1) (2), (3) and (5) below,

in the formulae,

each of R 1 to R 4 , R 7 to R 11 and R 15 to R 19 independently represents a hydrogen atom or a monovalent substituent,

each of R 5 and R 6 independently represents a monovalent substituent, and

A represents any of residues of the general formula (A-1).